Abstract: The present invention provides biological molecules for use in detecting, identifying and/or removing microbes and microbial components; diagnostic, therapeutic and filtration devices comprising the biological molecules; and systems and methods for treating fluids using the biological molecules and devices of the invention.

Abstract: Detection devices comprising microbe-targeting molecules (MTMs) and engineered MTMs in the form of a lateral flow assay (LFA) are provided. Methods of using the detection devices in the detection and/or identification of microbes and microbe components in a sample are also provided.

Abstract: Compositions, devices and methods for capturing, detecting and identifying one or more microbes or microbe components and/or treating infectious disease using microbe-targeting molecules (MTMs) are provided.

Abstract: An injection molding apparatus for manufacturing an ophthalmic lens mold having a front surface comprising a lens forming portion and a rear surface, comprises a first molding tool and a second molding tool. The first and second molding tools are movable towards and away from each other between a closed position and an open position. In the closed position the first mold forming portion of the first molding tool and the second mold forming portion of the second molding tool define a cavity between them corresponding in shape to the shape of the ophthalmic lens mold. The surface of the second mold forming portion, at least in a central zone thereof, has a surface roughness Sa in the range of 0.3 ?m to 2 ?m, and a surface roughness Sz in the range of 10 ?m to 50 ?m.

Abstract: The present invention provides biological molecules for use in detecting, identifying and/or removing microbes and microbial components; diagnostic, therapeutic and filtration devices comprising the biological molecules; and systems and methods for treating fluids using the biological molecules and devices of the invention.

Abstract: Methods are described for preparing samples including biological, environmental, and food products for microbial analysis. Microbes and microbe components in the sample can be treated with antimicrobial compounds and a matrix solution to permit fast and accurate characterization using analysis techniques such as matrix-assisted laser desorption/ionization Time-of-Flight mass spectrometry (MALDI-TOF MS).

Abstract: A method for verifying whether a molding insert (1a, 1b) is accurately mounted to a tooling plate (2a, 2b) comprises the steps of: a) providing a confocal sensor (3a, 3b); b) arranging the confocal sensor (3a, 3b) such that a confocal sensor reference plane (32a, 32b) as well as a tooling plate reference plane (22a, 22b) are normal to a mounting axis (21a, 21b) of the tooling plate and spaced from each other by a predetermined first distance (d1, e1); c) measuring a second distance (d2, e2) between the confocal sensor reference plane (32a, 32b) and a central impingement location (11a, 11b) on a molding surface (12a, 12b) of the molding insert (1a, 1b); d) based on the measured second distance (d2, e2) as well as based on the predetermined first distance (d1, e1), determining a third distance (d3, e3) of the central impingement location (11a, 11b) relative to the tooling plate reference plane (22a, 22b); e) comparing the third distance (d3, e3) with a predetermined target distance, and f) determining that the

Abstract: A lithographic system comprises a radiation source and a lithographic apparatus. The radiation source provides radiation to the lithographic apparatus. The lithographic apparatus uses the radiation for imaging a pattern onto multiple target areas on a layer of photo-resist on a semiconductor substrate. The imaging requires a pre-determined dose of radiation. The system is controlled so as to set a level of a power of the radiation in dependence on a magnitude of the pre-determined dose.

Abstract: A mold unit (22) for molding ophthalmic lenses comprises: an adapter piece (220) comprising an opening (2200) extending around a longitudinal axis (2201); a sleeve (221) fixedly connected to the adapter piece (220) and extending through the opening (2200) of the adapter piece (220); a lens mold (222) rigidly mounted to the sleeve (221); an adjustment ring (224) firmly attached to the sleeve (221) to circumferentially surround a portion of the sleeve (221). The adjustment ring (224) comprises a flat circular outer engagement surface (2244), and the adapter piece (220) comprises at least one clamping block (2211) having a flat inner clamping surface (2214).

Abstract: A method of providing a male mold half (1) for molding a toric contact lens at a predetermined target rotational orientation is disclosed. The male mold half comprises a front face (10) having a toric convex lens-forming surface (100) and a rear face (11) The method comprises the steps of: providing the male mold half (1) at a predetermined rotational orientation (PROM), picking the male mold half (1) up with a gripper (5) having a central axis (55), rotating the gripper (5) with the male mold half (1) about the central axis (55) of the gripper (5) by a predetermined rotational angle (?) towards the predetermined target rotational orientation (TROM), and releasing the rotated male mold half (1) from the gripper (5). Prior to picking the male mold half (1) up, the method comprises centering the gripper (5) and the male mold half (1) relative to each other such that the central axis (55) of the gripper and a central axis (113) of the male mold (1) half coincide.

Abstract: An injection molding apparatus for manufacturing an ophthalmic lens mold having a front surface comprising a lens forming portion and a rear surface, comprises a first molding tool and a second molding tool. The first and second molding tools are movable towards and away from each other between a closed position and an open position. In the closed position the first mold forming portion of the first molding tool and the second mold forming portion of the second molding tool define a cavity between them corresponding in shape to the shape of the ophthalmic lens mold. The surface of the second mold forming portion, at least in a central zone thereof, has a surface roughness Sa in the range of 0.3 ?m to 2 ?m, and a surface roughness Sz in the range of 10 ?m to 50 ?m.

Abstract: A lithographic apparatus including a support structure constructed to support a mask having a patterned area which is capable of imparting an EUV radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the support structure is movable in a scanning direction, a substrate table constructed to hold a substrate, wherein the substrate table is movable in the scanning direction, and a projection system configured to project the patterned radiation beam onto an exposure region of the substrate, wherein the projection system has a demagnification in the scanning direction which is greater than a demagnification in a second direction which is perpendicular to the scanning direction and wherein the demagnification in the second direction is greater than 4×.

Abstract: A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics (550) operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors (530a, 530b) operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (570). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.

Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element.

Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

Abstract: A lithographic system including a lithographic apparatus with an anamorphic projection system, and a radiation source configured to generate an EUV radiation emitting plasma at a plasma formation location, the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis of the radiation source.

Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to a radiation generating plasma.

Abstract: A method of exposing a patterned area on a substrate using an EUV lithographic apparatus having a demagnification of about 5× and a numerical aperture of about 0.4 is disclosed. The method comprises exposing a first portion of the patterned area on the substrate using a first exposure, the first portion dimensions are significantly less than the dimensions of a conventional exposure, and exposing one or more additional portions of the patterned area on the substrate using one or more additional exposures, the additional portions having dimensions which are significantly less than the dimensions of a conventional exposure. The method further comprises repeating the above to expose a second patterned area on the substrate, the second patterned area being provided with the same pattern as the first patterned area, wherein a distance between center points of the first and second patterned areas corresponds with a dimension of a conventional exposure.

Abstract: A radiation source for generating EUV radiation includes a laser configured to fire laser pulses at a target area to which is supplied a stream of fuel droplets, which may be tin droplets that emit EUV radiation when excited by the laser beam. The EUV radiation is collected by a collector. The tin droplets may be pre-conditioned by a laser pre-pulse before the main laser pulse to change the shape of the droplets so that the droplets are in an optimum condition for receiving the main laser pulse. Embodiments of the invention take into account the effect of the vaporization of one fuel droplet on succeeding droplets and allow the timing of the main and/or pre-pulse to be adjusted to take into account any delay in arrival of the subsequent droplet or oscillations in the shape of the subsequent droplet which may be caused by vaporization of the preceding droplet.

Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element.