Patents by Inventor Jan Bruining

Jan Bruining has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 7148952
    Abstract: The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (7), such that a projection beam of radiation (4) can be shifted around a central position. This ensures that inhomogeneities in the intensity distribution in the projection beam (4) will be smeared out, which in turn provides an improved homogeneity of the exposure of a surface to be illuminated by the system, such as a wafer or other substrate. The optical element (7) may comprise a motor movable mirror, prism, filter, lens, axicon, diffuser, diffractive optical array, optical integrator, etc. The invention further provides a device manufacturing method, using a lithographic apparatus according to the invention, wherein the optical element is moved, in order to provide an optimum homogeneity for the projection beam of radiation.
    Type: Grant
    Filed: October 29, 2004
    Date of Patent: December 12, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Markus Franciscus Antonius Eurlings, Johannes Jacobus Matheus Baselmans, Hako Botma, Jan Bruining, Marcel Mathijs Theodore Marie Dierichs, Antonius Johannes Josephus Van Dijsseldonk, Judocus Marie Dominicus Stoeldraijer
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050146702
    Abstract: The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (7), such that a projection beam of radiation (4) can be shifted around a central position. This ensures that inhomogeneities in the intensity distribution in the projection beam (4) will be smeared out, which in turn provides an improved homogeneity of the exposure of a surface to be illuminated by the system, such as a wafer or other substrate. The optical element (7) may comprise a motor movable mirror, prism, filter, lens, axicon, diffuser, diffractive optical array, optical integrator, etc. The invention further provides a device manufacturing method, using a lithographic apparatus according to the invention, wherein the optical element is moved, in order to provide an optimum homogeneity for the projection beam of radiation.
    Type: Application
    Filed: October 29, 2004
    Publication date: July 7, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Markus Eurlings, Johannes Baselmans, Hako Botma, Jan Bruining, Marcel Mathijs Dierichs, Antonius Johannes Dijsseldonk, Judocus Stoeldraijer