Abstract: Consistent with an example embodiment, devices comprise sensor arrangements with field detectors for detecting components of magnetic fields in planes of the field detectors. The sensor arrangements further include movable objects for, in response to tilting movements, changing at least parts of the components of the magnetic fields in the planes of the field detectors so that the sensor arrangements are made less sensitive to in-plane stray fields by providing the field detectors with saturated field-dependent elements. The movable object may comprise a movable field generator for generating the magnetic field, or the movable object and the field generator may be different objects. The magnetic field is such that the field-dependent element is saturated. The field generator is smaller than the field detector, and the movable object is larger than the field detector, to reduce alignment problems. The movable object has a pivoting point close to the field detector.

Abstract: In an example embodiment, a magnetic sensor has a magnet and a magneto-resistive element, arranged on a substrate such that magnetic field lines through the magneto-resistive element are substantially parallel to a plane of the substrate. Movement of a movable magnetically permeable element (MMPE) near the substrate is detected as it alters the number of field lines through the element. The MMPE can be more sensitive than devices arranged with perpendicular field lines, and can be easier to manufacture and integrate. Applications include analog pointers, pressure sensors and microphones. The MMPE can use magnets placed either side of the element to detect changes in size of a gap above the element. As the gap closes, less of the parallel oriented field passes through the magneto resistive element.

Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.