Abstract: A test device (40) has a patterned conductive layer (42 or 44) particularly adapted for use in an E-beam probe system (FIG. 3) to study how local electric fields influence probe voltage measurements. The layer is composed of two or more conductors (A and B.sub.J C and D.sub.J) separated from each other. Each conductor has a group of fingers. The fingers (F1.sub.p, F0.sub.p, F2, F0.sub.Q and F1.sub.Q) run parallel to one another and are at least partially interdigitated. The width of each finger is constant along its length. The widths of the fingers and the spacings between them vary from finger to finger according to a selected pattern.

Abstract: Selective plasma vapor etching process for performing operations on a solid body formed of at least two different materials capable of being vapor etched exposed at, at least, one surface of the body, with the body being disposed in a chamber having a partial vacuum therein. A gas plasma is created within the chamber to produce active species of atoms and molecules so that these species come into contact with the surface of the body to chemically react at least one of the materials with active species from the gas plasma to form a gas-non-gaseous chemical reaction by controlling the concentration and reaction kinetics of specific species, and by controlling the activation energy of the etching reactions to produce a difference in rates between the materials so that the etching is more selective to one material over the other. The species is also controlled by the frequency of the electromagnetic energy.