Patents by Inventor Jan Dirk Broer

Jan Dirk Broer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for preparing a polymeric relief structure
    Patent number: 8568962
    Abstract: The invention relates to a photo-embossing process for the preparation of a polymeric relief structure comprising the steps of: a) coating a substrate with a coating composition comprising one or more radiation-sensitive ingredients and less than 30 wt % polymeric binder material; b) locally treating the coated substrate with electromagnetic radiation having a periodic, non-periodic or random radiation-intensity pattern, forming a latent image, at a temperature below a transition temperature of the coating composition; and c) polymerizing and/or crosslinking the resulting coated substrate, at a temperature above said transition temperature, wherein the transition temperature is a temperature that defines a transition of the coating composition between a state of high viscosity and low viscosity and wherein the coating composition comprises a compound A comprising at least one radiation curable group and a photoinitiator, the coating composition having a transition temperature between 30° C. and 120° C.
    Type: Grant
    Filed: April 7, 2009
    Date of Patent: October 29, 2013
    Assignee: Stichting Dutch Polymer Institute
    Inventors: Ko Hermans, Itsuro Tomatsu, Rintje Pieter Sijbesma, Cornelis Wilhelmus Maria Bastiaansen, Jan Dirk Broer
  • PROCESS FOR PREPARING A POLYMERIC RELIEF STRUCTURE
    Publication number: 20110104445
    Abstract: The invention relates to a photo-embossing process for the preparation of a polymeric relief structure comprising the steps of: a) coating a substrate with a coating composition comprising one or more radiation-sensitive ingredients and less than 30 wt % polymeric binder material; b) locally treating the coated substrate with electromagnetic radiation having a periodic, non-periodic or random radiation-intensity pattern, forming a latent image, at a temperature below a transition temperature of the coating composition; and c) polymerizing and/or crosslinking the resulting coated substrate, at a temperature above said transition temperature, wherein the transition temperature is a temperature that defines a transition of the coating composition between a state of high viscosity and low viscosity and wherein the coating composition comprises a compound A comprising at least one radiation curable group and a photoinitiator, the coating composition having a transition temperature between 30° C. and 120° C.
    Type: Application
    Filed: April 7, 2009
    Publication date: May 5, 2011
    Inventors: Ko Hermans, Itsuro Tomatsu, Rintje Pieter Sijbesma, Cornelis Wilhelmus Maria Bastiaansen, Jan Dirk Broer