Patents by Inventor Jan Eijk

Jan Eijk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus
    Publication number: 20050157285
    Abstract: A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.
    Type: Application
    Filed: May 19, 2004
    Publication date: July 21, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Gerard Schothorst, Fransiscus Van Deuren, Jan Eijk, Erik Loopstra, Robert-Han Munnig Schmidt, Felix Peters