Patents by Inventor Jan Elp

Jan Elp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050132750
    Abstract: A method for joining at least two members of a lithographic apparatus is disclosed. The method includes providing a first member, providing a second member, direct-bonding the first member and the second member to form a direct-bond, and anodically bonding the first member and the second member. At least one of the members includes ultra low expansion glass and/or ultra low expansion glass ceramics.
    Type: Application
    Filed: December 22, 2003
    Publication date: June 23, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Jan Elp
  • Publication number: 20050128459
    Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system for providing a beam of radiation on a flat article to be placed in a beam path of the beam of radiation, and an article handler for handling the article during placement or removal of the article. The article handler includes an electrode and a dielectric layer in order to form an electrostatic clamp for electrostatically clamping the article.
    Type: Application
    Filed: December 15, 2003
    Publication date: June 16, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erwin Zwet, Jan Elp, Johannes Hubertus Moors, Hendrik Neerhof, Joost Ottens, Adrianus Mathijs De Groof, Leo Wilhelmus Kuipers, Peter Theodorus Giesen, Marco Le Kluse