Patents by Inventor Jan Evert Van Der Werp

Jan Evert Van Der Werp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: RE42741
    Abstract: Liquid is supplied to a space between a projection system of a lithographic apparatus and a substrate, but there is a space between the liquid and the substrate. An evanescent field may be formed between the liquid and the substrate allowing some photons to expose the substrate. Due to the refractive index of the liquid, the resolution of the system may be improved and liquid on the substrate may be avoided.
    Type: Grant
    Filed: March 11, 2008
    Date of Patent: September 27, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Jan Evert Van Der Werp