Abstract: The invention has compositions of matter and process aspects.The compositions of matter aspect relate to two classes of new organic compounds, viz., A. intermediates which are sulfur-containing hydrocarbons covalently bonded to trialkoxysilane and B. that class of intermediates covalently bonded to an inorganic matrix, e.g., silica, silica gel, glass, glass fibers, alumina, nickel oxide, zirconia, and titania. The process aspect comprises two processes, viz., (1) a process for making the two new classes of compounds A and B, and (2) the process of removing and concentrating certain ions, such as noble metal ions and other transition metal ions, from solution thereof admixed with other ions which may be present in much higher concentrations by forming a complex of the desired ion(s) with a compound of class B, e.g., by flowing the solution through a chromatography column packed with the compound, breaking the complex, e.g.

Abstract: The invention has compositions of matter and process aspects.The compositions of matter aspect relate to two classes of new organic compounds, viz., A. intermediates which are sulfur-containing hydrocarbons covalently bonded to trialkoxysilane and B. that class of intermediates covalently bonded to silica, e.g., sand and silica gel.The process aspect comprises two processes, viz., (1) A process for making the two new classes of compounds A and B, and (2) the process of removing and concentrating certain ions, such as noble metal ions and other transition metal ions, from solutions thereof admixed with other ions which may be present in much higher concentrations by forming a complex of the desired ion(s) with a compound of class B, e.g., by flowing the solution through a chromatography column packed with the compound, breaking the complex, e.g.

Abstract: The process of the invention comprises removing and concentrating certain ions, such as the transition metal ions, from solutions thereof admixed with other ions which may be present in much higher concentrations by forming a complex of the desired ion(s) with a compound ##STR1## B and D are each a radical selected from the group of N(R.sup.3), N(R.sup.3)CH.sub.2, O, OCH.sub.2, S and SCH.sub.2, but B or D must be N(R.sup.3) or N(R.sup.3)CH.sub.2 ; E is a radical selected from the group consisting of H, NH(R.sup.3), SH, OH, lower alkyl, and Y and Z are radicals selected from the group of Cl, OCH.sub.3, OC.sub.2 H.sub.5, methyl, ethyl and halogenated substituents thereof, and O-matrix; R.sup.1 is a radical selected from the group consisting of H, SH, OH, lower alkyl and aryl such as phenyl, naphthyl and pyridyl; R.sup.2 is a radical selected from the group consisting of H or lower alkyl; R.sup.