Patents by Inventor Jan GERKENS

Jan GERKENS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for the generation of thin inorganic films
    Patent number: 11180852
    Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process for the generation of inorganic films comprising depositing the compound of general formula (I) onto a solid substrate (I), wherein M is Mn, Ni or Co, X is a ligand which coordinates M, n is 0, 1, 2, 3, or 4, R1 is an alkyl group, an alkenyl group, an aryl group, a halogen, or a silyl group, R2 is an alkyl group, an alkenyl group, an aryl group, or a silyl group, p and q are 1 or 2, wherein p+q=3, and m is 1, 2, or 3.
    Type: Grant
    Filed: August 23, 2017
    Date of Patent: November 23, 2021
    Assignee: BASF SE
    Inventors: Torben Adermann, Falko Abels, Carolin Limburg, Hagen Wilmer, Jan Gerkens, Sven Schneider
  • Process for the generation of thin inorganic films
    Patent number: 10669297
    Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein M is Mn, Ni or Co, X is a ligand which coordinates M, n is 0, 1, or 2, R1, R2 are an alkyl group, an alkenyl group, an aryl group or a silyl group, m is 1, 2, or 3, R3, R4, and R5 are an alkyl group, an alkenyl group, an aryl group, an alkoxy group, or an aryloxy group, and p is 1, 2 or 3.
    Type: Grant
    Filed: November 30, 2016
    Date of Patent: June 2, 2020
    Assignee: BASF SE
    Inventors: Torben Adermann, Daniel Loeffler, Hagen Wilmer, Kerstin Schierle-Arndt, Jan Gerkens, Christian Volkmann, Sven Schneider
  • PROCESS FOR THE GENERATION OF THIN INORGANIC FILMS
    Publication number: 20190177844
    Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process for the generation of inorganic films comprising depositing the compound of general formula (I) onto a solid substrate (I), wherein M is Mn, Ni or Co, X is a ligand which coordinates M, n is 0, 1, 2, 3, or 4, R1 is an alkyl group, an alkenyl group, an aryl group, a halogen, or a silyl group, R2 is an alkyl group, an alkenyl group, an aryl group, or a silyl group, p and q are 1 or 2, wherein p+q=3, and m is 1, 2, or 3.
    Type: Application
    Filed: August 23, 2017
    Publication date: June 13, 2019
    Applicant: BASF SE
    Inventors: Torben ADERMANN, Falko ABELS, Carolin LIMBURG, Hagen WILMER, Jan GERKENS, Sven SCHNEIDER
  • PROCESS FOR THE GENERATION OF THIN INORGANIC FILMS
    Publication number: 20180346501
    Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein M is Mn, Ni or Co, X is a ligand which coordinates M, n is 0, 1, or 2, R 1, R2 are an alkyl group, an alkenyl group, an aryl group or a silyl group, m is 1, 2, or 3, R3, R4, and R5 are an alkyl group, an alkenyl group, an aryl group, an alkoxy group, or an aryloxy group, and p is 1, 2 or 3.
    Type: Application
    Filed: November 30, 2016
    Publication date: December 6, 2018
    Applicant: BASF SE
    Inventors: Torben ADERMANN, Daniel LOEFFLER, Hagen WILMER, Kerstin SCHIERLE-ARNDT, Jan GERKENS, Christian VOLKMANN, Sven SCHNEIDER