Patents by Inventor Jan-Hendrik Peters

Jan-Hendrik Peters has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11970886
    Abstract: An actuator for motor vehicle applications, in particular a motor vehicle door actuator, includes a manually or electromotively operating drive. Furthermore, a flexible drive means which is connected to the drive and can be acted upon by the latter is realized. Additionally provided is an actuating member driven by the drive means. According to the invention, the drive means is produced predominantly from plastic.
    Type: Grant
    Filed: November 22, 2018
    Date of Patent: April 30, 2024
    Assignee: Kiekert AG
    Inventors: Jan Hendrik Peters, Thomas Welke
  • Publication number: 20210164269
    Abstract: An actuator for motor vehicle applications, in particular a motor vehicle door actuator, includes a manually or electromotiveiy operating drive. Furthermore, a flexible drive means which is connected to the drive and can be acted upon by the latter is realized. Additionally provided is an actuating member driven by the drive means. According to the invention, the drive means is produced predominantly from plastic.
    Type: Application
    Filed: November 22, 2018
    Publication date: June 3, 2021
    Inventors: Jan Hendrik Peters, Thomas Welke
  • Patent number: 10108085
    Abstract: In a method for localizing defects on a substrate for EUV masks, a phase contrast optical unit having a phase mask is used for examining the substrate.
    Type: Grant
    Filed: January 6, 2017
    Date of Patent: October 23, 2018
    Assignees: Carl Zeiss SMT GmbH, Carl Zeiss AG
    Inventors: Jan Hendrik Peters, Jörg Frederik Blumrich, Dirk Seidel, Christoph Husemann
  • Patent number: 10055833
    Abstract: A reflective mask inspection system comprises a short wavelength radiation source for irradiating a reflective mask. A detector system detects the short wavelength radiation reflected from the reflective mask and a controller compares reflectance images of the reflective mask from the detector to characterize the mask. The system analyzes the spatially resolved reflectance characteristics of the substrate from different angles with respect to normal to the substrate and/or at different angles of rotation of the substrate. This information can be used to then analyze the mask for buried defects and then characterize those defects. This technique improves over current systems that rely on atomic force microscopes, which can only provide surface information.
    Type: Grant
    Filed: November 25, 2015
    Date of Patent: August 21, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Jan Hendrik Peters, Frederik Blumrich, Anthony Garetto, Thomas Scherübl, Renzo Capelli
  • Publication number: 20170176851
    Abstract: A method for producing a mask for the extreme ultraviolet wavelength range proceeding from a mask blank having defects is provided. The method includes classifying the defects into at least one first group and one second group; optimizing the arrangement of an absorber pattern on the mask blank in order to compensate for a maximum number of the defects of the first group by means of the arranged absorber pattern; and applying the optimized absorber pattern to the mask blank.
    Type: Application
    Filed: March 7, 2017
    Publication date: June 22, 2017
    Inventors: Jan-Hendrik Peters, Jörg Frederik Blumrich, Anthony Garetto, Renzo Capelli
  • Publication number: 20170115557
    Abstract: In a method for localizing defects on a substrate for EUV masks, a phase contrast optical unit having a phase mask is used for examining the substrate.
    Type: Application
    Filed: January 6, 2017
    Publication date: April 27, 2017
    Inventors: Jan Hendrik Peters, Frederick Blumrich, Dirk Seidel, Christoph Husemann
  • Patent number: 9519209
    Abstract: The present inventions relates to a substrate for a photolithographic mask comprising a coating deposited on a rear surface of the substrate, wherein the coating comprises (a) at least one electrically conducting layer, and (b) wherein a thickness of the at least one layer is smaller than 30 nm, preferably smaller than 20 nm, and most preferably smaller than 10 nm.
    Type: Grant
    Filed: October 12, 2012
    Date of Patent: December 13, 2016
    Assignees: Fundació Institut de Ciències Fotòniques, Cark Zeiss SMT GmbH
    Inventors: Valerio Pruneri, Albert Carrilero, Jan-Hendrik Peters
  • Publication number: 20160169816
    Abstract: A reflective mask inspection system comprises a short wavelength radiation source for irradiating a reflective mask. A detector system detects the short wavelength radiation reflected from the reflective mask and a controller compares reflectance images of the reflective mask from the detector to characterize the mask. The system analyzes the spatially resolved reflectance characteristics of the substrate from different angles with respect to normal to the substrate and/or at different angles of rotation of the substrate. This information can be used to then analyze the mask for buried defects and then characterize those defects. This technique improves over current systems that rely on atomic force microscopes, which can only provide surface information.
    Type: Application
    Filed: November 25, 2015
    Publication date: June 16, 2016
    Inventors: Jan Hendrik Peters, Frederik Blumrich, Anthony Garetto, Thomas Scherübl, Renzo Capelli
  • Publication number: 20140295330
    Abstract: The present inventions relates to a substrate for a photolithographic mask comprising a coating deposited on a rear surface of the substrate, wherein the coating comprises (a) at least one electrically conducting layer, and (b) wherein a thickness of the at least one layer is smaller than 30 nm, preferably smaller than 20 nm, and most preferably smaller than 10 nm.
    Type: Application
    Filed: October 12, 2012
    Publication date: October 2, 2014
    Applicant: Institucio Catalana de Recerca I Estudis Avancats
    Inventors: Valerio Pruneri, Albert Carrilero, Jan-Hendrik Peters
  • Publication number: 20140292056
    Abstract: A head restraint for a vehicle seat has a holding element whih, in the fitted state, is fastenable to a backrest of the vehicle seat. A support element for holding a pad formed from a foamed material is fastened to the holding element. The support element is formed from a repeatedly bent and/or folded material.
    Type: Application
    Filed: July 3, 2012
    Publication date: October 2, 2014
    Inventors: Jan-Hendrik Peters, Lars Hennig, Reiner Pietrus, Martin Gottwald