Patents by Inventor Jan Hopman

Jan Hopman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8476167
    Abstract: The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.
    Type: Grant
    Filed: February 3, 2011
    Date of Patent: July 2, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Hubert Adriaan Van Mierlo, Erik Leonardus Ham, Hendricus Johannes Maria Meijer, Hendrik Antony Johannes Neerhof, Joost Jeroen Ottens, Johannes Adrianus Petrus Leijtens, Marco Le Kluse, Jan Hopman, Johannes Hubertus Josephina Moors
  • Publication number: 20110126406
    Abstract: The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.
    Type: Application
    Filed: February 3, 2011
    Publication date: June 2, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Hubert Adriaan VAN MIERLO, Erik Leonardus Ham, Hendricus Johannes Maria Meijer, Hendrik Antony Johannes Neerhof, Joost Jeroen Ottens, Johannes Adrianus Petrus Leijtens, Marco Le Kluse, Jan Hopman, Johannes Hubertus Josephina Moors
  • Publication number: 20100230581
    Abstract: Light sensor, comprising a non-translucent layer (1) having a translucent aperture (2), and a sensor array layer (3), comprising an array of op to-electrical sensor elements (3a-d), as well as a translucent solid first carrier layer (4) to which said non-translucent layer is applied at one side and said sensor array layer at the other side. A multitude of such light sensors can be manufactured by taking a first substrate (4) which is suitable as a translucent solid first carrier layer for said multitude of light sensors, applying the non-translucent layers (1) including an aperture (2) in each of them for said multitude of light sensors at one side of the first substrate and applying the sensor array layers (3) for said multitude of light sensors at the other side of the first substrate and, finally, separating the individual light sensors (7a-b). The light sensor may comprise an integrated opto-electric power supply (8, 9).
    Type: Application
    Filed: March 26, 2007
    Publication date: September 16, 2010
    Applicant: NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNO
    Inventors: Johannes Adrianus Petrus Leijtens, Jan Hopman
  • Patent number: 7528935
    Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.
    Type: Grant
    Filed: December 21, 2005
    Date of Patent: May 5, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Koen Jacobus Johannes Maria Zaal, Tjarko Adriaan Rudolf Van Empel, Hendricus Johannes Maria Meijer, Joost Jeroen Ottens, Marco Le Kluse, Jan Hopman
  • Patent number: 7327439
    Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to condition a radiation beam, and an article support configured to support an article to be placed in a beam path of the radiation beam. The article support includes a plurality of bonded layers. At least one of the bonded layers includes a plurality of recesses facing another of the bonded layers, so as to reduce a bonding surface between the bonded layers.
    Type: Grant
    Filed: November 16, 2004
    Date of Patent: February 5, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens, Jan Hopman
  • Publication number: 20070139855
    Abstract: The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.
    Type: Application
    Filed: December 21, 2005
    Publication date: June 21, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hubert Van Mierlo, Erik Ham, Hendricus Meijer, Hendrik Neerhof, Joost Ottens, Johannes Leijtens, Marco Kluse, Jan Hopman, Johannes Moors
  • Patent number: 7110091
    Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation, and at least one clamping electrode for generating an electrostatic clamping force for clamping the article against the article holder. The clamping electrode includes an electric field changer for locally changing the electrostatic clamping force for leveling local height variations of the substrate.
    Type: Grant
    Filed: July 22, 2004
    Date of Patent: September 19, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Koen Jacobus Johannes Maria Zaal, Tjarko Adriaan Rudolf Van Empel, Joost Jeroen Ottens, Jan Hopman
  • Publication number: 20060158638
    Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.
    Type: Application
    Filed: December 21, 2005
    Publication date: July 20, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Koen Maria Zaal, Tjarko Adriaan Rudolf Van Empel, Hendricus Meijer, Joost Ottens, Marco Kluse, Jan Hopman
  • Publication number: 20060102277
    Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to condition a radiation beam, and an article support configured to support an article to be placed in a beam path of the radiation beam. The article support includes a plurality of bonded layers. At least one of the bonded layers includes a plurality of recesses facing another of the bonded layers, so as to reduce a bonding surface between the bonded layers.
    Type: Application
    Filed: November 16, 2004
    Publication date: May 18, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Koen Jacobus Maria Zaal, Joost Ottens, Jan Hopman
  • Publication number: 20050030512
    Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation, and at least one clamping electrode for generating an electrostatic clamping force for clamping the article against the article holder. The clamping electrode includes an electric field changer for locally changing the electrostatic clamping force for leveling local height variations of the substrate.
    Type: Application
    Filed: July 22, 2004
    Publication date: February 10, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Koen Jacobus Maria Zaal, Tjarko Van Empel, Joost Ottens, Jan Hopman
  • Patent number: 6290275
    Abstract: Robotically drivable interface mechanism for coupling to a device and for coupling to an end effector attachable to the end of a robot arm. The interface mechanism having a first coupler to couple with an associated second coupler on the device and a third coupler to couple with an associate fourth coupler on the end effector. The first coupler is connectable to an actuator included in the end effector, when the interface mechanism is coupled to the end effector. The first coupler has at least one first roller for cooperating with the second coupler formed by at least one slot in the device.
    Type: Grant
    Filed: July 19, 1999
    Date of Patent: September 18, 2001
    Assignee: Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek TNO
    Inventors: Bernardus Carolus Braam, Jan Hopman
  • Patent number: 5663486
    Abstract: A mechanical linear guide for making a body move in an axial direction, comprising a system which is preferably made up of reinforced leaf springs and/or hole-type hinges, and which is rotationally symmetrical about an axial direction and mirror-symmetrical about a plane perpendicular to the axial direction. The system is connected to a fixed base at six points (A, D, I, L, M, P), and a body (18) is suspended between two points (F, G) in such a way that it can carry out only movement in the axial direction, and not in the lateral direction.
    Type: Grant
    Filed: August 7, 1995
    Date of Patent: September 2, 1997
    Assignee: Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno
    Inventors: Bernardus Carolus Braam, Jan Hopman, Marinus Pieter Koster