Abstract: The present invention relates to sputter targets for electrochemical device layer deposition comprising a lithium-containing target material with near-metallic electrical conductivity which includes (a) at least one metal and (b) a lithium-containing material, the lithium-containing material being selected from the group consisting of lithium metal and a lithium-containing salt, wherein the at least one metal and the lithium-containing material are formed into the lithium-containing target material and wherein the lithium-containing target material is configured with a composition sufficient for physical vapor deposition of a lithium-containing electrode of the electrochemical device in a single step, the lithium-containing electrode as deposited requiring no further lithium doping. Furthermore, the composition of the metallic lithium-containing target material may be configured to provide a low enough electrical resistance to permit DC sputtering.

Abstract: Electrochromic film with the general formula: ApBqOxXy wherein: —A is one or more of the elements from the group consisting of Ni, Ir, Cr, V, Mn, Fe, W, Mo, Ti, Co, Ce, Pr and Hf; —B is one or more of the elements from the group consisting of Mg, Ca, Sr, Ba, Nb, Al, Zr, Ta and Si; —O is oxygen; —X is an element from the group consisting of: H, F and N; and the ratio q/p is greater than 0.2 and less than 3.5, x is greater than 0.5 (p+q) and less than 5 (p+q), and y is equal to or greater than 0 and less than 2x. The film may further comprise an amount of Li, Na or K. The invention further relates to an electrochromic device comprising at least one layer of said electrochromic film.