Patents by Inventor Jan J Krikke

Jan J Krikke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus
    Patent number: 6833907
    Abstract: An illuminator for controlling a beam of radiation for a lithographic projection apparatus includes a plurality of optical elements and an exchanger for inserting and removing the optical elements from the beam path. The intensity distribution of the beam at a pupil plane of the illuminator is determined by the optical elements. Different illumination settings (intensity distributions) can be obtained by the exchanger swapping between different optical elements, without the need for a zoom-axicon module.
    Type: Grant
    Filed: June 19, 2003
    Date of Patent: December 21, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Markus F Eurlings, Jan J Krikke
  • Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus
    Patent number: 6671035
    Abstract: An illuminator for controlling a beam of radiation for a lithographic projection apparatus includes a plurality of optical elements and an exchanger for inserting and removing the optical elements from the beam path. The intensity distribution of the beam at a pupil plane of the illuminator is determined by the optical elements. Different illumination settings (intensity distributions) can be obtained by the exchanger swapping between different optical elements, without the need for a zoom-axicon module.
    Type: Grant
    Filed: December 12, 2000
    Date of Patent: December 30, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Markus F Eurlings, Jan J Krikke
  • Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus
    Publication number: 20030214643
    Abstract: An illuminator for controlling a beam of radiation for a lithographic projection apparatus comprises a plurality of optical elements and an exchanger for inserting and removing the optical elements from the beam path. The intensity distribution of the beam at a pupil plane of the illuminator is determined by the optical elements. Different illumination settings (intensity distributions) can be obtained by the exchanger swapping between different optical elements, without the need for a zoom-axicon module.
    Type: Application
    Filed: June 19, 2003
    Publication date: November 20, 2003
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Markus F. Eurlings, Jan J. Krikke