Patents by Inventor Jan Jaap Krikke

Jan Jaap Krikke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method
    Patent number: 7030958
    Abstract: An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.
    Type: Grant
    Filed: December 31, 2003
    Date of Patent: April 18, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Cornelis Petrus Andreas Marie Luijkx, Vadim Yevgenyevich Banine, Hako Botma, Martinus Van Duijnhoven, Markus Franciscus Antonius Eurlings, Heine Melle Mulder, Johannes Hendrik Everhardus Aldegonda Muijderman, Cornelis Jacobus Van Duijn, Jan Jaap Krikke
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Patent number: 6583855
    Abstract: A lithographic projection system has an optical element provided in the illumination system for changing an elliptically symmetric intensity anomaly of the projection beam in a pupil of the projection apparatus, the optical element being rotated about the optical axis of the projection apparatus such that the change in intensity anomaly introduced by it counteracts an elliptically symmetric intensity anomaly present in the projection beam or introduced by another optical element traversed by the projection beam.
    Type: Grant
    Filed: July 3, 2001
    Date of Patent: June 24, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Jaap Krikke, Markus Franciscus Antonius Eurlings, Jan Hoegee, Paul van der Veen
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Publication number: 20020036763
    Abstract: A lithographic projection system has an optical element provided in the illumination system for changing an elliptically symmetric intensity anomaly of the projection beam in a pupil of the projection apparatus, the optical element being rotated about the optical axis of the projection apparatus such that the change in intensity anomaly introduced by it counteracts an elliptically symmetric intensity anomaly present in the projection beam or introduced by another optical element traversed by the projection beam.
    Type: Application
    Filed: July 3, 2001
    Publication date: March 28, 2002
    Inventors: Jan Jaap Krikke, Markus Franciscus Antonius Eurlings, Jan Hoegee, Paul van der Veen