Patents by Inventor Jan-Jaco Marco Wieland
Jan-Jaco Marco Wieland has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8525134Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.Type: GrantFiled: November 3, 2009Date of Patent: September 3, 2013Assignee: Mapper Lithography IP B.V.Inventors: Jan-Jaco Marco Wieland, Johannes Christiaan van 't Spijker, Remco Jager, Pieter Kruit
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Publication number: 20120043457Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.Type: ApplicationFiled: October 28, 2011Publication date: February 23, 2012Inventors: Jan-Jaco Marco Wieland, Johannes Christian van ' t Spijker, Remco Jager, Pieter Kruit
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Publication number: 20100045958Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.Type: ApplicationFiled: November 3, 2009Publication date: February 25, 2010Inventors: Jan-Jaco Marco Wieland, Johannes Christiaan van 't Spijker, Remco Jager, Pieter Kruit
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Patent number: 7612866Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.Type: GrantFiled: November 1, 2007Date of Patent: November 3, 2009Assignee: Mapper Lithography IP B.V.Inventors: Jan-Jaco Marco Wieland, Johannes Christiaan van't Spijker, Remco Jager, Pieter Kruit
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Publication number: 20080158536Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.Type: ApplicationFiled: March 3, 2008Publication date: July 3, 2008Inventors: Jan-Jaco Marco Wieland, Johannes Christiaan van 't Spijker, Remco Jager, Pieter Kruit
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Publication number: 20080158537Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.Type: ApplicationFiled: March 3, 2008Publication date: July 3, 2008Inventors: Jan-Jaco Marco Wieland, Johannes Christiaan Van 't Spijker, Remco Jager, Pieter Kruit
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Patent number: 7173263Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator generates a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls each of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.Type: GrantFiled: September 12, 2005Date of Patent: February 6, 2007Assignee: Mapper Lighography IP B.V.Inventors: Jan-Jaco Marco Wieland, Johannes Christiaan van 't Spijker, Remco Jager, Pieter Kruit
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Patent number: 6958804Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.Type: GrantFiled: October 24, 2003Date of Patent: October 25, 2005Assignee: Mapper Lithography IP B.V.Inventors: Jan-Jaco Marco Wieland, Johannes Christiaan van 't Spijker, Remco Jager, Pieter Kruit
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Publication number: 20040135983Abstract: The invention relates to a maskless lithography system for transferring a pattern onto the surface of a target, comprising at least one beam generator for generating a plurality of beamlets, modulation means comprising a plurality of modulators for modulating the magnitude of a beamlet, and a control unit for controling each of the modulators, wherein the control unit generates and delivers pattern data to said modulation means for controlling the magnitude of each individual beamlet, the control unit comprising at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting said at least one modulated light beam to said modulation means.Type: ApplicationFiled: October 24, 2003Publication date: July 15, 2004Inventors: Jan-Jaco Marco Wieland, Johannes Christiaan van 't Spijker, Remco Jager, Pieter Kruit