Patents by Inventor Jan Lasko

Jan Lasko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12000789
    Abstract: A system for positioning a sample in a charged particle apparatus (CPA) or an X-ray photoelectron spectroscopy (XPS) system includes a sample carrier coupled to a stage inside the vacuum chamber of the CPA or XPS system. The system allows transferring of the sample carrier among multiple CPAs, XPS systems and glove boxes in inert gas or in vacuum. The sample carrier is releasably coupled with the stage in the vacuum chamber of the CPA or the XPS. Multiple electrodes in a sample area of the sample carrier are electrically connectable with the stage by multiple spring contacts between the sample carrier and the stage.
    Type: Grant
    Filed: December 23, 2021
    Date of Patent: June 4, 2024
    Assignee: FEI Company
    Inventors: Libor Novak, Krishna Kanth Neelisetty, Veronika Hammerova, Jan Lasko
  • Publication number: 20230204525
    Abstract: A system for positioning a sample in a charged particle apparatus (CPA) or an X-ray photoelectron spectroscopy (XPS) system includes a sample carrier coupled to a stage inside the vacuum chamber of the CPA or XPS system. The system allows transferring of the sample carrier among multiple CPAs, XPS systems and glove boxes in inert gas or in vacuum. The sample carrier is releasably coupled with the stage in the vacuum chamber of the CPA or the XPS. Multiple electrodes in a sample area of the sample carrier are electrically connectable with the stage by multiple spring contacts between the sample carrier and the stage.
    Type: Application
    Filed: December 23, 2021
    Publication date: June 29, 2023
    Applicant: FEI Company
    Inventors: Libor NOVAK, Krishna Kanth NEELISETTY, Veronika HAMMEROVA, Jan LASKO
  • Patent number: 11335536
    Abstract: An embodiment of electron microscope system is described that comprises an electron column pole piece and a light guide assembly operatively coupled together. The light guide assembly also includes one or more detectors, and a mirror with a pressure limiting aperture through which an electron beam from an electron source passes. The mirror is also configured to reflect light, as well as to collect back scattered electrons and secondary electrons.
    Type: Grant
    Filed: September 3, 2020
    Date of Patent: May 17, 2022
    Assignee: FEI Company
    Inventors: Marek Uncovsky, Michal Geryk, Jan Lasko
  • Publication number: 20210082659
    Abstract: An embodiment of electron microscope system is described that comprises an electron column pole piece and a light guide assembly operatively coupled together. The light guide assembly also includes one or more detectors, and a mirror with a pressure limiting aperture through which an electron beam from an electron source passes. The mirror is also configured to reflect light, as well as to collect back scattered electrons and secondary electrons.
    Type: Application
    Filed: September 3, 2020
    Publication date: March 18, 2021
    Inventors: Marek Uncovsky, Michal Geryk, Jan Lasko