Patents by Inventor Jan M. Chabala

Jan M. Chabala has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6433348
    Abstract: A scanning lithography tool exposes a medium in a raster scan. The raster scan is a multi-pass scan in which the shape of the beam, while fixed for any one pass, is altered between passes. Thus, certain pixels are exposed in one or more scans using a Gaussian (round) beam while other pixels are exposed in separate scans using, for instance, a shaped (e.g., square or rectangular) shaped beam. Beam shape here refers to the cross-sectional shape of the beam as incident on the medium. This process, especially when the shaped beam is applied at the corners and slanted edges of a feature being exposed, has been found to substantially reduce the problem of edge blur otherwise typical of raster scan lithography. This process is applicable to both electron beam and laser beam raster scanning lithography.
    Type: Grant
    Filed: July 25, 2000
    Date of Patent: August 13, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Fayez E. Abboud, Jan M. Chabala