Abstract: Described herein are methods and systems for customizing and personalizing eyewear. The methods and system consider optimal parameters for each wearer's personal visual situation and configures frames around them.

Abstract: Embodiments of this application relate to systems and methods which allow for 3-D printed objects, such as eyeglasses and wristwatches, for example, to be customized by users according to modification specifications that are defined and constrained by manufacturers based on factors relating to the printability of a modified design.

Abstract: Embodiments of this application relate to systems and methods which allow for 3-D printed objects, such as eyeglasses and wristwatches, for example, to be customized by users according to modification specifications that are defined and constrained by manufacturers based on factors relating to the printability of a modified design.

Abstract: Systems and methods for predicting shape are provided. A system for predicting shape can include a database, a training analysis module, a subject analysis module, and a prediction module. The database can store two sets of training models characterized by first and second parameters, respectively (e.g., bone and cartilage), as well as a subject model characterized by the first parameter (e.g., a bone model). The relationships between these models can be determined by a training analysis module and a subject module. Based on these relationships, the prediction module can generate a predicted shape characterized by the second parameter (e.g., a predicted cartilage model corresponding to the bone model).

Abstract: Embodiments of this application relate to systems and methods which allow for 3-D printed objects, such as eyeglasses and wristwatches, for example, to be customized by users according to modification specifications that are defined and constrained by manufacturers. These modification specifications may be constrained by the manufacturers based on factors relating to the printability of a modified design.

Abstract: Described herein are methods and systems for customizing and personalizing eyewear. The methods and system consider optimal parameters for each wearer's personal visual situation and configures frames around them.

Abstract: Systems and methods for predicting shape are provided. A system for predicting shape can include a database, a training analysis module, a subject analysis module, and a prediction module. The database can store two sets of training models characterized by first and second parameters, respectively (e.g., bone and cartilage), as well as a subject model characterized by the first parameter (e.g., a bone model). The relationships between these models can be determined by a training analysis module and a subject module. Based on these relationships, the prediction module can generate a predicted shape characterized by the second parameter (e.g., a predicted cartilage model corresponding to the bone model).

Abstract: Systems and methods for designing digital representations of 3-D objects and manufacturing such objects are disclosed herein. In some aspects, the systems and methods described relate to bending maps that define regions on a physical object that can be bent or manipulated in order to design the 3-D object.

Abstract: Systems and methods for predicting shape are provided. A system for predicting shape can include a database, a training analysis module, a subject analysis module, and a prediction module. The database can store two sets of training models characterized by first and second parameters, respectively (e.g., bone and cartilage), as well as a subject model characterized by the first parameter (e.g., a bone model). The relationships between these models can be determined by a training analysis module and a subject module. Based on these relationships, the prediction module can generate a predicted shape characterized by the second parameter (e.g., a predicted cartilage model corresponding to the bone model).

Abstract: Methods of treating metal-containing thin films, such as films comprising titanium carbide, with a silane/borane agent are provided. In some embodiments a film comprising titanium carbide is deposited on a substrate by an atomic layer deposition (ALD) process. The process may include a plurality of deposition cycles involving alternating and sequential pulses of a first source chemical that comprises titanium and at least one halide ligand, a second source chemical comprising metal and carbon, wherein the metal and the carbon from the second source chemical are incorporated into the thin film, and a third source chemical, wherein the third source chemical is a silane or borane that at least partially reduces oxidized portions of the titanium carbide layer formed by the first and second source chemicals. In some embodiments treatment forms a capping layer on the metal carbide film.

Abstract: Methods of treating metal-containing thin films, such as films comprising titanium carbide, with a silane/borane agent are provided. In some embodiments a film comprising titanium carbide is deposited on a substrate by an atomic layer deposition (ALD) process. The process may include a plurality of deposition cycles involving alternating and sequential pulses of a first source chemical that comprises titanium and at least one halide ligand, a second source chemical comprising metal and carbon, wherein the metal and the carbon from the second source chemical are incorporated into the thin film, and a third source chemical, wherein the third source chemical is a silane or borane that at least partially reduces oxidized portions of the titanium carbide layer formed by the first and second source chemicals. In some embodiments treatment forms a capping layer on the metal carbide film.

Abstract: Embodiments of this application relate to systems and methods which allow for 3-D printed objects, such as eyeglasses and wristwatches, for example, to be customized by users according to modification specifications that are defined and constrained by manufacturers. These modification specifications may be constrained by the manufacturers based on factors relating to the printability of a modified design.

Abstract: Systems and methods for predicting shape are provided. A system for predicting shape can include a database, a training analysis module, a subject analysis module, and a prediction module. The database can store two sets of training models characterized by first and second parameters, respectively (e.g., bone and cartilage), as well as a subject model characterized by the first parameter (e.g., a bone model). The relationships between these models can be determined by a training analysis module and a subject module. Based on these relationships, the prediction module can generate a predicted shape characterized by the second parameter (e.g., a predicted cartilage model corresponding to the bone model).

Abstract: Methods of treating metal-containing thin films, such as films comprising titanium carbide, with a silane/borane agent are provided. In some embodiments a film comprising titanium carbide is deposited on a substrate by an atomic layer deposition (ALD) process. The process may include a plurality of deposition cycles involving alternating and sequential pulses of a first source chemical that comprises titanium and at least one halide ligand, a second source chemical comprising metal and carbon, wherein the metal and the carbon from the second source chemical are incorporated into the thin film, and a third source chemical, wherein the third source chemical is a silane or borane that at least partially reduces oxidized portions of the titanium carbide layer formed by the first and second source chemicals. In some embodiments treatment forms a capping layer on the metal carbide film.

Abstract: Methods of treating metal-containing thin films, such as films comprising titanium carbide, with a silane or a borane agent are provided. In some embodiments a film comprising titanium carbide is deposited on a substrate by an atomic layer deposition (ALD) process. The process may include a plurality of deposition cycles involving alternating and sequential pulses of a first source chemical that comprises titanium and at least one halide ligand, a second source chemical comprising metal and carbon, wherein the metal and the carbon from the second source chemical are incorporated into the thin film, and a third source chemical, wherein the third source chemical is a silane or borane that at least partially reduces oxidized portions of the titanium carbide layer formed by the first and second source chemicals. In some embodiments treatment forms a capping layer on the metal carbide film.

Abstract: Methods of treating metal-containing thin films, such as films comprising titanium carbide, with a silane/borane agent are provided. In some embodiments a film comprising titanium carbide is deposited on a substrate by an atomic layer deposition (ALD) process. The process may include a plurality of deposition cycles involving alternating and sequential pulses of a first source chemical that comprises titanium and at least one halide ligand, a second source chemical comprising metal and carbon, wherein the metal and the carbon from the second source chemical are incorporated into the thin film, and a third source chemical, wherein the third source chemical is a silane or borane that at least partially reduces oxidized portions of the titanium carbide layer formed by the first and second source chemicals. In some embodiments treatment forms a capping layer on the metal carbide film.

Abstract: Systems and methods for designing digital representations of 3-D objects and manufacturing such objects are disclosed herein. In some aspects, the systems and methods described relate to bending maps that define regions on a physical object that can be bent or manipulated in order to design the 3-D object.

Abstract: High dielectric constant (high-k) materials are formed directly over oxidation-susceptible conductors such as silicon. A discontinuous layer is formed, with gaps between grains of the high-k material. Exposed conductor underneath the grain boundaries is oxidized or nitridized to form, e.g., silicon dioxide or silicon nitride, when exposed to oxygen or nitrogen source gases at elevated temperatures. This dielectric growth is preferential underneath the grain boundaries such that any oxidation or nitridation at the interface between the high-k material grains and covered conductor is not as extensive. The overall dielectric constant of the composite film is high, while leakage current paths between grains is reduced. Ultrathin high-k materials with low leakage current are thereby enabled.

Abstract: In one aspect, non-conformal layers are formed by variations of plasma enhanced atomic layer deposition, where one or more of pulse duration, separation, RF power on-time, reactant concentration, pressure and electrode spacing are varied from true self-saturating reactions to operate in a depletion-effect mode. Deposition thus takes place close to the substrate surface but is controlled to terminate after reaching a specified distance into openings (e.g., deep DRAM trenches, pores, etc.). Reactor configurations that are suited to such modulation include showerhead, in situ plasma reactors, particularly with adjustable electrode spacing.

Abstract: A method for forming an integrated circuit structure on a semiconductor substrate comprises depositing a high k gate dielectric material over the substrate using an atomic layer deposition process. A silicon oxide capping layer is deposited over the gate dielectric material in a rapid thermal chemical vapor deposition process. A gate electrode is formed over the silicon oxide capping layer.