Patents by Inventor Jan-Marius Schotsman

Jan-Marius Schotsman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus having a gas flushing device
    Patent number: 7136142
    Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes a gas flushing device for flushing a substantially laminar flow of gas across the beam of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet that has an inner rim at a downstream end of the gas outlet. The inner rim defines a total gas outlet area. The gas outlet is provided with a laminator that has an effective area out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings and is at least as large as the total gas outlet area.
    Type: Grant
    Filed: May 25, 2004
    Date of Patent: November 14, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Beckers, Ronald Johannes Hultermans, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Nicolaas Franciscus Koppelaars, Jan-Marius Schotsman, Ronald Van Der Ham, Johannes Antonius Maria Martina Van Uijtregt
  • Lithographic apparatus having a gas flushing device
    Publication number: 20050264773
    Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes a gas flushing device for flushing a substantially laminar flow of gas across the beam of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet that has an inner rim at a downstream end of the gas outlet. The inner rim defines a total gas outlet area. The gas outlet is provided with a laminator that has an effective area out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings and is at least as large as the total gas outlet area.
    Type: Application
    Filed: May 25, 2004
    Publication date: December 1, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcel Beckers, Ronald Hultermans, Nicolaas Kate, Nicolaas Kemper, Nicolaas Koppelaars, Jan-Marius Schotsman, Ronald Der Ham, Johannes Antonius Van Uijtregt