Patents by Inventor Jan-Michael STEPPER

Jan-Michael STEPPER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11767387
    Abstract: Copolymers for use in a digital manufacturing process, in particular support materials for use in a digital manufacturing process comprising such copolymers. More particularly, the invention is directed to a copolymer, a support material based on the the copolymer, the use of the copolymer in a digital manufacturing process, a method for preparing the copolymer and a method for building a 3D-model by using a support material comprising the copolymer.
    Type: Grant
    Filed: February 12, 2021
    Date of Patent: September 26, 2023
    Assignee: ISQUARED AG
    Inventors: Christoph Jung, Gerhard Maier, Jürgen Stebani, Jan-Michael Stepper
  • Publication number: 20210253763
    Abstract: Copolymers for use in a digital manufacturing process, in particular support materials for use in a digital manufacturing process comprising such copolymers. More particularly, the invention is directed to a copolymer, a support material based on the the copolymer, the use of the copolymer in a digital manufacturing process, a method for preparing the copolymer and a method for building a 3D-model by using a support material comprising the copolymer.
    Type: Application
    Filed: February 12, 2021
    Publication date: August 19, 2021
    Inventors: Christoph JUNG, Gerhard MAIER, Jürgen STEBANI, Jan-Michael STEPPER
  • Patent number: 10336052
    Abstract: A photocurable resin composition for support regions for use in photochemical fabrication by an inkjet method, which has low viscosity and outstanding photocurability, and where the support regions, formed by the photocuring, have good supporting performance and, following the end of the photochemical fabrication, can readily be removed from the main body by dissolving in water and/or by a weak external force such as a water jet. The photocurable resin composition for support regions for use in photochemical 3D fabrication by the inkjet method contains, based on the total mass of photocurable resin composition, from 2 to 20 mass % of N-hydroxyalkyl (meth) acrylamide, from 2 to 20 mass % of (meth) acryloyl morpholine, from 3 to 30 mass % of (meth) acrylate compound having at least one (meth) acryloyloxy group, from 40 to 90 mass % of polyhydroxy compound containing two or more hydroxyl groups, and from 0.1 to 5 mass % of a photo-radical polymerization initiator.
    Type: Grant
    Filed: March 25, 2015
    Date of Patent: July 2, 2019
    Assignee: ISQUARED GmbH
    Inventors: Jan-Michael Stepper, Tsuneo Hagiwara
  • Publication number: 20170001382
    Abstract: A photocurable resin composition for support regions for use in photochemical fabrication by an inkjet method, which has low viscosity and outstanding photocurability, and where the support regions, formed by the photocuring, have good supporting performance and, following the end of the photochemical fabrication, can readily be removed from the main body by dissolving in water and/or by a weak external force such as a water jet. The photocurable resin composition for support regions for use in photochemical 3D fabrication by the inkjet method contains, based on the total mass of photocurable resin composition, from 2 to 20 mass % of N-hydroxyalkyl (meth) acrylamide, from 2 to 20 mass % of (meth) acryloyl morpholine, from 3 to 30 mass % of (meth) acrylate compound having at least one (meth) acryloyloxy group, from 40 to 90 mass % of polyhydroxy compound containing two or more hydroxyl groups, and from 0.1 to 5 mass % of a photo-radical polymerization initiator.
    Type: Application
    Filed: March 25, 2015
    Publication date: January 5, 2017
    Inventors: Jan-Michael STEPPER, Tsuneo HAGIWARA