Patents by Inventor Jan-Nan Oue

Jan-Nan Oue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Immersion lithography process, and structure used for the same and patterning process
    Patent number: 7223527
    Abstract: An immersion lithography process is described. First, a photoresist layer on a material layer is formed. Then, an acid compensation layer is formed on the photoresist layer. An immersion exposure step is performed on the acid compensation layer and the photoresist layer. The acid compensation layer contains a photo-acid generator with a concentration of the photo-acid higher than that produced by a photo-acid generator in the photoresist layer after the immersion exposure step. Then, a development step is performed to pattern the acid compensation layer and the photoresist layer.
    Type: Grant
    Filed: April 21, 2005
    Date of Patent: May 29, 2007
    Assignee: Winbond Electronics Corp.
    Inventors: Kao-Tsair Tsai, Jan-Nan Oue
  • Immersion lithography process, and structure used for the same and patterning process
    Publication number: 20060238727
    Abstract: An immersion lithography process is described. First, a photoresist layer on a material layer is formed. Then, an acid compensation layer is formed on the photoresist layer. An immersion exposure step is performed on the acid compensation layer and the photoresist layer. The acid compensation layer contains a photo-acid generator with a concentration of the photo-acid higher than that produced by a photo-acid generator in the photoresist layer after the immersion exposure step. Then, a development step is performed to pattern the acid compensation layer and the photoresist layer.
    Type: Application
    Filed: April 21, 2005
    Publication date: October 26, 2006
    Inventors: Kao-Tsair Tsai, Jan-Nan Oue