Patents by Inventor Jan Olmen

Jan Olmen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dual damascene patterning method
    Publication number: 20060264033
    Abstract: A method for patterning a dual damascene structure in a semiconductor substrate is disclosed. The patterning is a metal hardmask based pattering eliminating at least resist poisoning and further avoiding or at least minimizing low-k damage. The method can be used as a full-via-first patterning method or a partial-via-first patterning method.
    Type: Application
    Filed: April 10, 2006
    Publication date: November 23, 2006
    Inventors: Jan Olmen, Marleen Hove, Herbert Struyf, Dirk Hendrickx, Serge Vanhaelemeersch, Werner Boullart