Patents by Inventor Jan Pieter VAN DE POEL

Jan Pieter VAN DE POEL has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Support table for a lithographic apparatus, method of loading a substrate, lithographic apparatus and device manufacturing method
    Patent number: 11898601
    Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.
    Type: Grant
    Filed: August 20, 2021
    Date of Patent: February 13, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Siegfried Alexander Tromp, Antonie Hendrik Verweij, Abraham Alexander Soethoudt, Jan Pieter Van De Poel, Mark Constant Johannes Baggen
  • SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, METHOD OF LOADING A SUBSTRATE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20210381548
    Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.
    Type: Application
    Filed: August 20, 2021
    Publication date: December 9, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Siegfried Alexander TROMP, Antonie Hendrik VERWEIJ, Abraham Alexander SOETHOUDT, Jan Pieter VAN DE POEL
  • Support table for a lithographic apparatus, method of loading a substrate, lithographic apparatus and device manufacturing method
    Patent number: 11098759
    Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.
    Type: Grant
    Filed: January 6, 2020
    Date of Patent: August 24, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Siegfried Alexander Tromp, Antonie Hendrik Verweij, Abraham Alexander Soethoudt, Jan Pieter Van De Poel, Mark Constant Johannes Baggen
  • SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, METHOD OF LOADING A SUBSTRATE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20200141445
    Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.
    Type: Application
    Filed: January 6, 2020
    Publication date: May 7, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Siegfried Alexander TROMP, Antonie Hendrik VERWEIJ, Abraham Alexander SOETHOUDT, Jan Pieter VAN DE POEL, Mark Constant Johannes BAGGEN
  • Support table for a lithographic apparatus, method of loading a substrate, lithographic apparatus and device manufacturing method
    Patent number: 10527092
    Abstract: A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess. The localized build-up of pressure provides a localized gas cushioning effect during the lowering of the substrate.
    Type: Grant
    Filed: October 7, 2015
    Date of Patent: January 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Siegfried Alexander Tromp, Antonie Hendrik Verweij, Abraham Alexander Soethoudt, Jan Pieter Van De Poel, Mark Constant Johannes Baggen
  • SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, METHOD OF LOADING A SUBSTRATE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170292566
    Abstract: A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess.
    Type: Application
    Filed: October 7, 2015
    Publication date: October 12, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Siegfried Alexander TROMP, Antonie Hendrik VERWEIJ, Abraham Alexander SOETHOUDT, Jan Pieter VAN DE POEL, Mark Constant Johannes BAGGEN