Patents by Inventor Jan Steven Christiaan WESTERLAKEN
Jan Steven Christiaan WESTERLAKEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20170160653Abstract: A lithographic apparatus including: a projection system with an optical axis; an enclosure with an ambient gas; and a physical component accommodated in the enclosure, wherein: the lithographic apparatus is configured to cause the physical component to undergo movement relative to the enclosure, in a predetermined direction and in a plane perpendicular to the optical axis; the lithographic apparatus is configured to let the physical component maintain a predetermined orientation with respect to the enclosure during the movement; the movement induces a flow of the ambient gas relative to the component; the physical component has a surface oriented perpendicularly to the optical axis; the component includes a flow direction system configured to direct the flow of ambient gas away from the surface.Type: ApplicationFiled: June 8, 2015Publication date: June 8, 2017Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Frank Johannes Jacobus VAN BOXTEL, Thomas Petrus Hendricus WARMERDAM, Jan Steven Christiaan WESTERLAKEN, Johannes Pieter KROES
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Publication number: 20170090304Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.Type: ApplicationFiled: October 18, 2016Publication date: March 30, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johanne De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum
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Publication number: 20170068175Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.Type: ApplicationFiled: November 17, 2016Publication date: March 9, 2017Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Jan Steven Christiaan WESTERLAKEN, Ruud Hendrikus Martinus Johannes BLOKS, Peter A. DELMASTRO, Thibault Simon Mathieu LAURENT, Martinus Hendrikus Antonius LEENDERS, Mark Josef SCHUSTER, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Justin Matthew VERDIRAME, Samir A. NAYFEH
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Patent number: 9529277Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.Type: GrantFiled: March 13, 2015Date of Patent: December 27, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Jan Steven Christiaan Westerlaken, Gerardus Arnoldus Hendricus Franciscus Janssen, Peter Paul Steijaert, Engelbertus Antonius Fransiscus Van Der Pasch, Franciscus Van De Mast
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Patent number: 9513568Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.Type: GrantFiled: June 5, 2013Date of Patent: December 6, 2016Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh
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Patent number: 9507275Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.Type: GrantFiled: May 17, 2013Date of Patent: November 29, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum
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Publication number: 20150355557Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.Type: ApplicationFiled: February 20, 2014Publication date: December 10, 2015Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Koen CUYPERS, Marcelo Henrique DE ANDRADE OLIVEIRA, Marinus Jan REMIE, Chattarbir SINGH, Laurentius Johannes Adrianus VAN BOKHOVEN, Henricus Anita Jozef Wilhemus VAN DE VEN, José Nilton FONSECA JUNIOR, Frank Johannes Jacobus VAN BOXTEL, Daniel Nathan BURBANK, Erik Roelof LOOPSTRA, Johannes ONVLEE, Mark Josef SCHUSTER, Robertus Nicodemus Jacobus VAN BALLEGOIJ, Christopher Charles WARD, Jan Steven Christiaan WESTERLAKEN
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Publication number: 20150227060Abstract: A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.Type: ApplicationFiled: August 19, 2013Publication date: August 13, 2015Applicant: ASML Netherlands B.V.Inventors: Ruud Antonius Catharina Maria Beerens, Rob Johan Theodoor Rutten, Jan Steven Christiaan Westerlaken, Koen Jacobus Johannes Maria Zaal, Richard Henricus Adrianus Van Lieshout, Engelbertus Antonius Fransiscus Van Der Pasch
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Publication number: 20150185624Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.Type: ApplicationFiled: March 13, 2015Publication date: July 2, 2015Inventors: Jan Steven Christiaan WESTERLAKEN, Gerardus Arnoldus Hendricus Franciscus JANSSEN, Peter Paul STEIJAERT, Engelbertus Antonius Fransiscus VAN DER PASCH, Franciscus VAN DE MAST
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Publication number: 20150168854Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.Type: ApplicationFiled: June 5, 2013Publication date: June 18, 2015Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh
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Publication number: 20150109599Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.Type: ApplicationFiled: May 17, 2013Publication date: April 23, 2015Applicant: ASML Netherlands B.V.Inventors: Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Raymond Wilhelmus Louis Laffarre, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum, Robert De Jong
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Patent number: 8988650Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.Type: GrantFiled: August 22, 2011Date of Patent: March 24, 2015Assignee: ASML Netherlands B.V.Inventors: Jan Steven Christiaan Westerlaken, Engelbertus Antonius Fransiscus Van Der Pasch, Peter Paul Steijaert, Franciscus Van De Mast, Gerardus Arnoldus Hendricus Franciscus Janssen
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Publication number: 20150077728Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.Type: ApplicationFiled: March 19, 2013Publication date: March 19, 2015Applicant: ASML Netherlands B.V.Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Haico Victor Kok, Yuri Johannes Gabriël Van De Vijver, Johannes Antonius Maria Van De Wal, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Jan Steven Christiaan Westerlaken, Johannes Hubertus Antonius Van De Rijdt, Allard Eelco Kooiker, Wilhelmina Margareta Jozef Hurkens-Mertens, Yohann Bruno Yvon Teillet
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Publication number: 20150070666Abstract: A thermal conditioning unit to thermally condition a substrate, the thermal conditioning unit including: a thermal conditioning element having a first layer, in use, facing the substrate and including a material having a thermal conductivity of 100 W/mK or more, a second layer and a heat transfer component positioned between the first and second layers; and a stiffening member which is stiffer than the thermal conditioning element and configured to support the thermal conditioning element so as to reduce mechanical deformation thereof, wherein the thermal conditioning element is thermally isolated from the stiffening member.Type: ApplicationFiled: April 16, 2013Publication date: March 12, 2015Applicant: ASML Netherlands B.V.Inventors: Johannes Henricus Wilhelmus Jacobs, Jan Steven Christiaan Westerlaken
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Publication number: 20130107236Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate; a compartment configured to receive the substrate table; a thermal conditioning unit arranged to receive a substrate to be exposed and thermally condition the substrate; and a transfer system for transferring a thermally conditioned substrate to the substrate table, wherein the substrate table and the thermal conditioning unit are arranged inside the compartment of the lithographic apparatus, at least during a transfer of the thermally conditioned substrate from the thermal conditioning unit to the substrate table.Type: ApplicationFiled: October 24, 2012Publication date: May 2, 2013Applicant: ASML Netherlands B.V.Inventors: Jan Steven Christiaan WESTERLAKEN, Rob Jansen, Erik Vervoort
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Publication number: 20130077078Abstract: A lithographic apparatus comprises a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes an electrostatic clamp arranged to clamp the substrate at a top side thereof. The electrostatic clamp is arranged to clamp at least part of a circumferential outer zone of a top surface of the substrate. The invention provides a substrate handling method including positioning the substrate by means of a gripper on a substrate table of a lithographic apparatus. The substrate is clamped at a top side thereof by using an electrostatic clamp of the gripper.Type: ApplicationFiled: August 29, 2012Publication date: March 28, 2013Applicant: ASML Netherlands B.V.Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus Donders, Antonius Franciscus Johannes De Groot, Hubert Marie Segers, Johannes Petrus Martinus Bernardus Vermeulen, Raimond Visser, Johannes Charles Adrianus Van Den Berg, Jan Steven Christiaan Westerlaken, Yang-Shan Huang, Christiaan Louis Valentin
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Publication number: 20120052447Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.Type: ApplicationFiled: August 22, 2011Publication date: March 1, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Jan Steven Christiaan WESTERLAKEN, Engelbertus Antonius Fransiscus VAN DER PASCH, Peter Paul STEIJAERT, Franciscus VAN DE MAST, Gerardus Arnoldus Hendricus Franciscus JANSSEN