Patents by Inventor Jan STRATE

Jan STRATE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METALORGANIC CHEMICAL VAPOR PHASE EPITAXY OR VAPOR PHASE DEPOSITION APPARATUS
    Publication number: 20230212787
    Abstract: A Metalorganic chemical vapor phase epitaxy or vapor phase deposition apparatus, having a first gas source system, a reactor, an exhaust gas system, and a control unit, wherein the first gas source system has a carrier gas source, a bubbler with an organometallic starting compound, and a first supply section leading to the reactor either directly or through a first control valve, the carrier gas source is connected to an inlet of the bubbler through a first mass flow controller by a second supply section, an outlet of the bubbler is connected to the first supply section, and the carrier gas source is connected to the first supply section through a second mass flow controller by a third supply section, the first supply section is connected to an inlet of the reactor through a third mass flow controller.
    Type: Application
    Filed: March 15, 2023
    Publication date: July 6, 2023
    Applicant: AZUR SPACE Solar Power GmbH
    Inventors: Clemens WAECHTER, Jan STRATE
  • Metalorganic chemical vapor phase deposition apparatus having bubbler with first supply section leading to reactor, first, second and third mass flow controller and pressure sensor
    Patent number: 11629432
    Abstract: A Metalorganic chemical vapor phase epitaxy or vapor phase deposition apparatus, having a first gas source system, a reactor, an exhaust gas system, and a control unit, wherein the first gas source system has a carrier gas source, a bubbler with an organometallic starting compound, and a first supply section leading to the reactor either directly or through a first control valve, the carrier gas source is connected to an inlet of the bubbler through a first mass flow controller by a second supply section, an outlet of the bubbler is connected to the first supply section, and the carrier gas source is connected to the first supply section through a second mass flow controller by a third supply section, the first supply section is connected to an inlet of the reactor through a third mass flow controller.
    Type: Grant
    Filed: March 24, 2021
    Date of Patent: April 18, 2023
    Assignee: AZUR SPACE Solar Power GmbH
    Inventors: Clemens Waechter, Jan Strate
  • METALORGANIC CHEMICAL VAPOR PHASE EPITAXY OR VAPOR PHASE DEPOSITION APPARATUS
    Publication number: 20210301423
    Abstract: A Metalorganic chemical vapor phase epitaxy or vapor phase deposition apparatus, having a first gas source system, a reactor, an exhaust gas system, and a control unit, wherein the first gas source system has a carrier gas source, a bubbler with an organometallic starting compound, and a first supply section leading to the reactor either directly or through a first control valve, the carrier gas source is connected to an inlet of the bubbler through a first mass flow controller by a second supply section, an outlet of the bubbler is connected to the first supply section, and the carrier gas source is connected to the first supply section through a second mass flow controller by a third supply section, the first supply section is connected to an inlet of the reactor through a third mass flow controller.
    Type: Application
    Filed: March 24, 2021
    Publication date: September 30, 2021
    Applicant: AZUR SPACE Solar Power GmbH
    Inventors: Clemens WAECHTER, Jan STRATE