Patents by Inventor Jan Van Eijk

Jan Van Eijk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11121115
    Abstract: A positioning table, for example for a wire bonder has first and second arms, each of said first and second arms being independently drivable linearly along a first axis, and a stage that is engaged with both the first and second arms. The stage engages with each of the first and second arms via a respective engagement mechanism such that the stage is movable both linearly along the first axis, and rotatable about a rotary axis coincident with a center-point of the stage, the rotary axis being orthogonal to the first axis. Each engagement mechanism is configured to permit a respective distance between the center-point of the stage and an end of each of the first and second arms to vary during movement of an arm along the first axis.
    Type: Grant
    Filed: September 20, 2018
    Date of Patent: September 14, 2021
    Assignee: ASM TECHNOLOGY SINGAPORE PTE LTD.
    Inventors: Jan Van Eijk, Ronald Maarten Schneider, Jasper Anne Frido Marikus Simons, Timotheus Hubertus Christiaan Groothuijsen
  • Publication number: 20200098722
    Abstract: A positioning table, for example for a wire bonder has first and second arms, each of said first and second arms being independently drivable linearly along a first axis, and a stage that is engaged with both the first and second arms. The stage engages with each of the first and second arms via a respective engagement mechanism such that the stage is movable both linearly along the first axis, and rotatable about a rotary axis coincident with a center-point of the stage, the rotary axis being orthogonal to the first axis. Each engagement mechanism is configured to permit a respective distance between the center-point of the stage and an end of each of the first and second arms to vary during movement of an arm along the first axis.
    Type: Application
    Filed: September 20, 2018
    Publication date: March 26, 2020
    Inventors: Jan VAN EIJK, Ronald Maarten SCHNEIDER, Jasper Anne Frido Marikus SIMONS, Timotheus Hubertus Christiaan GROOTHUIJSEN
  • Patent number: 10095123
    Abstract: A control system for a positioning system, for positioning a driven object, e.g. in a lithographic apparatus, in N dimensions has M sensors, where M>N. A transformation module converts the M measurements by the sensors into a positional estimate in N dimensions taking into account compliance of the driven object.
    Type: Grant
    Filed: April 1, 2015
    Date of Patent: October 9, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Marinus Maria Johannes Van De Wal, Wilhelmus Henricus Theodorus Maria Aangenent, Jeroen Johannes Theodorus Hendrikus De Best, Jan Van Eijk
  • Patent number: 10061213
    Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.
    Type: Grant
    Filed: July 20, 2015
    Date of Patent: August 28, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johannes Antonius Gerardus Akkermans, Ruud Antonius Catharina Maria Beerens, Sander Christiaan Broers, Jeroen Johannes Theodorus Hendrikus De Best, Adrianus Marinus Wouter Heeren, George Alois Leonie Leenknegt, Bo Lenssen, Hendrikus Johannes Schellens, Peter Van Der Krieken, Theodorus Petrus Maria Cadee, Jan Van Eijk, Richard Henricus Adrianus Van Lieshout
  • Patent number: 10012914
    Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.
    Type: Grant
    Filed: July 20, 2015
    Date of Patent: July 3, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johannes Antonius Gerardus Akkermans, Ruud Antonius Catharina Maria Beerens, Sander Christiaan Broers, Jeroen Johannes Theodorus Hendrikus De Best, Adrianus Marinus Wouter Heeren, George Alois Leonie Leenknegt, Bo Lenssen, Hendrikus Johannes Schellens, Peter Van Der Krieken, Theodorus Petrus Maria Cadee, Jan Van Eijk, Richard Henricus Adrianus Van Lieshout
  • Patent number: 9897926
    Abstract: A stage positioning system, includes a first body, a second body and a coupling arranged to couple the first body and the second body to each other. The coupling includes a visco-elastic element arranged to couple the first body and the second body to each other. The stage positioning system may further include a sensor to provide a signal representative of a position of the first body. The stage positioning system may further include an actuator to move the first body. The second body may be arranged to couple the actuator and the coupling to each other.
    Type: Grant
    Filed: January 20, 2015
    Date of Patent: February 20, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Wilhelmus Henricus Theodorus Maria Aangenent, Lucas Franciscus Koorneef, Theo Anjes Maria Ruijl, Stanley Constant Johannes Martinus Van Den Berg, Stan Henricus Van Der Meulen, Jan Van Eijk, Pieter Hubertus Godefrida Wullms, Richard Henricus Adrianus Van Lieshout
  • Publication number: 20170277042
    Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.
    Type: Application
    Filed: July 20, 2015
    Publication date: September 28, 2017
    Inventors: Johannes Antonius Gerardus AKKERMANS, Ruud Antonius Catharina Maria BEERENS, Sander Christiaan BROERS, Jeroen Johannes Theodorus Hendrikus DE BEST, Adrianus Marinus Wouter HEEREN, George Alois Leonie LEENKNEGT, Bo LENSSEN, Hendrikus Johannes SCHELLENS, Peter VAN DER KRIEKEN, Theodorus Petrus Maria CADEE, Jan VAN EIJK, Richard Henricus Adrianus VAN LIESHOUT
  • Publication number: 20170212431
    Abstract: A control system for a positioning system, for positioning a driven object, e.g. in a lithographic apparatus, in N dimensions has M sensors, where M>N. A transformation module converts the M measurements by the sensors into a positional estimate in N dimensions taking into account compliance of the driven object.
    Type: Application
    Filed: April 1, 2015
    Publication date: July 27, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Marinus Maria Johannes VAN DE WAL, Wilhelmus Henricus Theodorus Maria AANGENENT, Jeroen Johannes Theodorus Hendrikus DE BEST, Jan VAN EIJK
  • Publication number: 20170010543
    Abstract: A stage positioning system, includes a first body, a second body and a coupling arranged to couple the first body and the second body to each other. The coupling includes a visco-elastic element arranged to couple the first body and the second body to each other. The stage positioning system may further include a sensor to provide a signal representative of a position of the first body. The stage positioning system may further include an actuator to move the first body. The second body may be arranged to couple the actuator and the coupling to each other.
    Type: Application
    Filed: January 20, 2015
    Publication date: January 12, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Wilhelmus Henricus Theodorus Maria AANGENENT, Lucas Franciscus KOORNEEF, Theo Anjes Maria RUIJL, Stanley Constant Johannes Martinus VAN DEN BERG, Stan Henricus VAN DER MEULEN, Jan VAN EIJK, Pieter Hubertus Godefrida WULLMS, Richard Henricus Adrianus VAN LIESHOUT
  • Patent number: 9329501
    Abstract: A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.
    Type: Grant
    Filed: June 12, 2012
    Date of Patent: May 3, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Yang-Shan Huang, Hans Butler, Jan Van Eijk, Sven Antoin Johan Hol, Engelbertus Antonius Fransiscus Van Der Pasch, Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Johannes Petrus Martinus Bernardus Vermeulen, Theodorus Petrus Maria Cadee, Robbert Edgar Van Leeuwen
  • Patent number: 9268211
    Abstract: The invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and an encoder-type measurement system configured to at least during projection of the patterned radiation beam onto a target portion of the substrate continuously determine a position quantity of a patterning device supported on the patterning device support using a grid or grating provided on the patterning device.
    Type: Grant
    Filed: September 26, 2013
    Date of Patent: February 23, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jan Van Eijk, Engelbertus Antonius Fransiscus Van Der Pasch, Johannes Petrus Martinus Bernardus Vermeulen
  • Patent number: 9192271
    Abstract: The invention relates to a suction unit and relates to a vacuum cleaner. The suction unit comprises a drive system for driving the suction unit over a surface to be treated; a chassis supporting the drive system; a nozzle for removing particles from a surface to be treated which nozzle is configured to move with relation to the chassis in a direction away from the surface to be treated, the nozzle having an interior space defining an opening that faces the surface to be treated; and an outlet communicating with the interior space, the outlet being arranged for communication with a fan unit in operating conditions. The suction unit further comprises coupling means for coupling the nozzle to the chassis, wherein the coupling means is arranged to exert a force that is directed away from the surface to be treated when the under pressure in the interior space increases. In this manner the problem of the suction unit getting stuck on the floor can be overcome or at least be reduced.
    Type: Grant
    Filed: August 18, 2008
    Date of Patent: November 24, 2015
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Jeroen Dekkers, Theo Anjes Maria Ruijl, Silvester Matheus Reijnders, Jan Van Eijk, Hubert Gerard Jean Joseph Amaury Vroomen, Thomas Petrus Hendricus Warmerdam, Robertus Mathijs Gerardus Rijs
  • Patent number: 9110387
    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.
    Type: Grant
    Filed: May 22, 2012
    Date of Patent: August 18, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Jan Van Eijk, Sven Antoin Johan Hol, Johannes Petrus Martinus Bernardus Vermeulen, Yang-Shan Huang
  • Patent number: 9019470
    Abstract: The invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and an encoder-type measurement system configured to at least during projection of the patterned radiation beam onto a target portion of the substrate continuously determine a position quantity of a patterning device supported on the patterning device support using a grid or grating provided on the patterning device.
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: April 28, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Van Eijk, Engelbertus Antonius Fransiscus Van Der Pasch, Johannes Petrus Martinus Bernardus Vermeulen
  • Patent number: 8982359
    Abstract: A system for detecting motion of a body, the system comprising: a body; a first grating mounted substantially stationary relative to a frame of reference; a second grating mounted on the body; a detector arranged to receive one or more radiation beams diffracted at the first and second gratings thereby to detect motion of the body relative to the frame of reference; wherein the detector is coupled to the body and moveable relative to the body.
    Type: Grant
    Filed: August 1, 2012
    Date of Patent: March 17, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Van Eijk, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Johannes Petrus Martinus Bernardus Vermeulen
  • Patent number: 8896811
    Abstract: A method for positioning a substage, supported by a main stage, relative to a reference object, the substage moveable in a direction between a first and second position relative to the main stage. The method includes positioning the first stage using a passive force system that is activated by positioning the main stage. The passive force system includes two magnet systems, each magnet system being configured to apply a force in the direction to the first stage with respect to the second stage in a non-contact manner, the forces resulting in a resultant force applied to the first stage in the direction by the passive force system. A magnitude and/or a direction of the resultant force depends on the position of the first stage relative to the second stage, and the first stage has a zero-force position between the first and second position in which the resultant force is zero.
    Type: Grant
    Filed: August 10, 2010
    Date of Patent: November 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Sven Antoin Johan Hol, Jan Van Eijk, Antonius Franciscus Johannes De Groot, Johannes Petrus Martinus Bernardus Vermeulen, Geert-Jan Petrus Naaijkens, Marijn Kessels, Daniƫl Godfried Emma Hobbelen
  • Patent number: 8687171
    Abstract: An electromagnetic actuator includes a first and second magnetic members that are displaceable relative to each other and are arranged to provide a magnetic circuit; and a coil configured to, in use, receive a current to generate a magnetic flux through the magnetic circuit, thereby generating a force between the first and second magnetic members in a first direction, the magnetic flux, in use, being transferred between the first and second magnetic members through a first surface of the first magnetic member and a second surface of the second magnetic member, the first and second surface being separated by an airgap, wherein the first surface and the second surface are arranged relative to each other such that an outer dimension of the first surface extends beyond an outer dimension of the second surface in a second direction substantially perpendicular to the first direction.
    Type: Grant
    Filed: February 21, 2012
    Date of Patent: April 1, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Sven Antoin Johan Hol, Jan Van Eijk, Johannes Petrus Martinus Bernardus Vermeulen, Gerard Johannes Pieter Nijsse, Simon Bernardus Cornelis Maria Martens, Yang-Shan Huang, Michael Wilhelmus Theodorus Koot, Jeroen De Boeij, Maarten Hartger Kimman, Wei Zhou
  • Publication number: 20140022526
    Abstract: The invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and an encoder-type measurement system configured to at least during projection of the patterned radiation beam onto a target portion of the substrate continuously determine a position quantity of a patterning device supported on the patterning device support using a grid or grating provided on the patterning device.
    Type: Application
    Filed: September 26, 2013
    Publication date: January 23, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jan VAN EIJK, Engelbertus Antonius Fransiscus Van Der Pasch, Johannes Petrus Martinus Bernardus Vermeulen
  • Publication number: 20130194586
    Abstract: A system for detecting motion of a body, the system comprising: a body; a first grating mounted substantially stationary relative to a frame of reference; a second grating mounted on the body; a detector arranged to receive one or more radiation beams diffracted at the first and second gratings thereby to detect motion of the body relative to the frame of reference; wherein the detector is coupled to the body and moveable relative to the body.
    Type: Application
    Filed: August 1, 2012
    Publication date: August 1, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Jan Van Eijk, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Johannes Petrus Martinus Bernardus Vermeulen
  • Patent number: 8482719
    Abstract: A positioning system to position a movable object having a body, the positioning system includes an object position measurement system, an object actuator, and an object controller, wherein the positioning system further includes a stiffener to increase the stiffness and/or to damp relative movements within the body of the object, the stiffener including; one or more sensors, wherein each sensor is arranged to determine a measurement signal representative of an internal strain or relative displacement in the body, one or more actuators, wherein each actuator is arranged to exert an actuation force on a part of the body, and at least one controller, configured to provide on the basis of the measurement signal of at least one of the sensors, an actuation signal to at least one of the actuators to increase the stiffness and/or to damp movements within the body.
    Type: Grant
    Filed: July 6, 2010
    Date of Patent: July 9, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Van Eijk, Engelbertus Antonius Fransiscus Van Der Pasch, Johannes Petrus Martinus Bernardus Vermeulen