Patents by Inventor Jan Van Elp
Jan Van Elp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8105457Abstract: A method for joining at least two members of a lithographic apparatus is disclosed. The method includes providing a first member, providing a second member, direct-bonding the first member and the second member to form a direct-bond, and anodically bonding the first member and the second member. At least one of the members includes ultra low expansion glass and/or ultra low expansion glass ceramics.Type: GrantFiled: December 22, 2003Date of Patent: January 31, 2012Assignee: ASML Netherlands B.V.Inventor: Jan Van Elp
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Patent number: 7630060Abstract: A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate.Type: GrantFiled: October 13, 2004Date of Patent: December 8, 2009Assignee: ASML Netherlands B.V.Inventors: Joost Jeroen Ottens, Levinus Pieter Bakker, Wilhelmus Josephus Box, Jan Van Elp, Frank Jeroen Pieter Schuurmans, Jan Evert Van Der Werf
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Patent number: 7486384Abstract: The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.Type: GrantFiled: March 31, 2004Date of Patent: February 3, 2009Assignee: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Edwin Johan Buis, Sjoerd Nicolaas Lambertus Donders, Jan Van Elp, Jan Frederik Hoogkamp, Aschwin Lodewijk Hendricus Johannes Van Meer, Patrick Johannes Cornelus Hendrik Smulders, Franciscus Andreas Cornelis Johannes Spanjers, Johannes Petrus Martinus Bernardus Vermeulen, Raimond Visser, Henricus Gerardus Tegenbosch, Johannes Charles Adrianus Van Den Berg, Henricus Johannes Adrianus Van De Sande, Thijs Vervoort
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Publication number: 20080297758Abstract: The invention relates to a transfer apparatus for transferring an object (W). the transfer apparatus comprises a gripper (15) for at least one of gripping the object (W) at a first position and then releasing the object (W) at a second position proximate to a receiver (20) and releasing the object (W) at a first position after gripping the object at a second position proximate to the receiver (20). The transfer apparatus is further provided with a measurement device (22) arranged to measure the relative position of the gripper (15) with respect to the receiver (20) in at least one dimension. Further, a relative position error is defined with respect to a desired relative position based on the relative position measured. The relative position of the gripper (15) and the receiver (20) are adjusted for minimizing the relative position error in the second position.Type: ApplicationFiled: June 26, 2008Publication date: December 4, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Edwin Johan Buis, Sjoerd Nicolaas Lambertus Donders, Jan Van Elp, Jan Frederik Hoogkamp, Aschwin Lodewijk Hendricus Van Meer, Patrick Johannes Cornelus Smulders, Franciscus Andreas Cornelis Spanjers, Johannes Petrus Martinus Ber Vermeulen, Raimond Visser, Henricus Gerardus Tegenbosch, Johannes Charles Adrianus Van Den Berg, Henricus Johannes Adrianus Van De Sande, Thijs Vervoort
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Publication number: 20080212053Abstract: A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate.Type: ApplicationFiled: October 13, 2004Publication date: September 4, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Joost Jeroen Ottens, Levinus Pieter Bakker, Wilhelmus Josephus Box, Jan Van Elp, Frank Jeroen Pieter Schuurmans, Jan Evert Van Der Werf
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Patent number: 7245357Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system for providing a beam of radiation on a flat article to be placed in a beam path of the beam of radiation, and an article handler for handling the article during placement or removal of the article. The article handler includes an electrode and a dielectric layer in order to form an electrostatic clamp for electrostatically clamping the article.Type: GrantFiled: December 15, 2003Date of Patent: July 17, 2007Assignee: ASML Netherlands B.V.Inventors: Erwin Van Zwet, Jan Van Elp, Johannes Hubertus Josephina Moors, Hendrik Antony Johannes Neerhof, Joost Jeroen Ottens, Adrianus Mathijs Maria De Groof, Leo Wilhelmus Maria Kuipers, Peter Theodorus Maria Giesen, Marco Le Kluse
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Publication number: 20070054497Abstract: The invention relates to a method for preventing contamination of the surfaces of reflective optical elements for the soft X-ray and EUV wavelength range during their irradiation at operating wavelength in an evacuated closed system having a residual gas atmosphere, said elements comprising a cover layer consisting of at least one transition metal. According to said method a residual gas atmosphere is adjusted. The aim of the invention is to prevent a degradation of the surfaces by deposition of carbon and by surface oxidation. For this purpose, both a reducing gas or gas mixture and a gas or gas mixture containing oxygen atoms are introduced.Type: ApplicationFiled: May 6, 2004Publication date: March 8, 2007Inventors: Markus Weiss, Marco Wedowski, Bas Mertens, Bas Wolschrijn, Bart Van Mierlo, Norbert Koster, Jan Van Elp, Anton Duiserwinkel, Annemieke Van De Runstraat
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Patent number: 6930760Abstract: In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation.Type: GrantFiled: November 20, 2003Date of Patent: August 16, 2005Assignee: ASML Netherlands B.V.Inventors: Jan Van Elp, Martinus Hendrikus Antonius Leenders, Vadim Yevgenyevich Banine, Hugo Matthieu Visser, Levinus Pieter Bakker
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Patent number: 6864957Abstract: A lithographic projection apparatus with a chuck in which a dielectric element of the electrostatic chuck has a specific resistivity of at least 1016 ?cm so that once the potential difference between electrodes of the chuck is removed the force on the article to be clamped reduces below a predetermined minimum level quickly. The dielectric element also has a coefficient of thermal expansion of less than 0.02×10?6K?1. A method of manufacturing a chuck includes joining a first glass ceramic element with a second glass element with an electrode therebetween in which a current is passed through the second glass element.Type: GrantFiled: April 29, 2003Date of Patent: March 8, 2005Assignee: ASML Netherlands B.V.Inventors: Jan Van Elp, Peter Giesen, Jacob Jan Van der Velde
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Publication number: 20040246459Abstract: The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.Type: ApplicationFiled: March 31, 2004Publication date: December 9, 2004Applicant: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Edwin Johan Buis, Sjoerd Nicolaas Lambertus Donders, Jan Van Elp, Jan Frederik Hoogkamp, Aschwin Lodewijk Hendricus Johannes Van Meer, Patrick Johannes Cornelus Hendrik Smulders, Franciscus Andreas Cornelis Johannes Spanjers, Johannes Petrus Martinus Bernardus Vermeulen, Raimond Visser, Henricus Gerardus Tegenbosch, Johannes Charles Adrianus Van Den Berg, Henricus Johannes Adrianus Van De Sande, Thijs Vervoort
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Publication number: 20040109149Abstract: In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation.Type: ApplicationFiled: November 20, 2003Publication date: June 10, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Jan Van Elp, Martinus Hendrikus Antonius Leenders, Vadim Yevgenyevich Banine, Hugo Matthieu Visser, Levinus Pieter Bakker
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Publication number: 20040012767Abstract: A lithographic projection apparatus with a chuck in which a dielectric element of the electrostatic chuck has a specific resistivity of at least 1016 SE cm so that once the potential difference between electrodes of the chuck is removed the force on the article to be clamped reduces below a predetermined minimum level quickly. The dielectric element also has a coefficient of thermal expansion of less than 0.02×10−6K−1. A method of manufacturing a chuck includes joining a first glass ceramic element with a second glass element with an electrode therebetween in which a current is passed through the second glass element.Type: ApplicationFiled: April 29, 2003Publication date: January 22, 2004Inventors: Jan Van Elp, Peter Giesen, Jacob Jan Van Der Velde
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Patent number: 6678037Abstract: In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation.Type: GrantFiled: October 9, 2001Date of Patent: January 13, 2004Assignee: ASML Netherlands B.V.Inventors: Jan Van Elp, Martinus Hendrikus Antonius Leenders, Vadim Yevgenyevich Banine, Hugo Matthieu Visser, Levinus Pieter Bakker
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Publication number: 20020097385Abstract: In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation.Type: ApplicationFiled: October 9, 2001Publication date: July 25, 2002Applicant: ASM Lithography B.V.Inventors: Jan Van Elp, Martinus Hendrikus Antonius Leenders, Vadim Yevgenyevich Banine, Hugo Matthieu Visser, Levinus Pieter Bakker