Patents by Inventor Jan Vandendriesshe

Jan Vandendriesshe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation-sensitive resin composition with admixtures of O-quinone diazide and acid esters having nitrobenzyl or cyanobenzyl group
    Patent number: 4963463
    Abstract: A radiation-sensitive resin composition comprising a quinonediazide-type radiation-sensitive resin and a compound generating an acid upon irradiation. Said radiation-sensitive resin composition can be used as a resist suitable for dry development by plasma etching and enables one to obtain an etching image having high precision with high reproducibility at a high degree of resolution and selectivity.
    Type: Grant
    Filed: February 15, 1989
    Date of Patent: October 16, 1990
    Assignees: Japan Synthetic Rubber Co., Ltd., UCB Societe Anonyme
    Inventors: Mitsunobu Koshiba, Keiichi Yamada, Yoshiyuki Harita, Bruno Roland, Jan Vandendriesshe