Patents by Inventor Jan Werschnik

Jan Werschnik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230142104
    Abstract: A method for generating a camera image from which a welding contour can be derived along which an assembly is to be welded in an image processing-supported laser transmission welding method. The transparent component of the assembly is illuminated from a side facing away from the camera. The invention also relates to a device which is suitable to carry out the method and wherein an illumination device has at least one light source, the light source being arranged in a workpiece holder in which the assembly to be welded is received in a receiving area and being directed into the receiving area.
    Type: Application
    Filed: March 22, 2021
    Publication date: May 11, 2023
    Inventors: Stefan FRANZ, Jan WERSCHNIK, Steffen REINL, Sebastian TASCHNER, Benedikt BRANDAU
  • Patent number: 11463675
    Abstract: A method characterizes a scanning light source configured to emit illumination propagating in any one of a plurality of directions spanning an angular range. The method includes (i) detecting, with a camera, illumination propagating at each of the plurality of directions; (ii) storing image data corresponding to a response of the camera to the detected illumination. The method also includes (iii) processing the image data to characterize at least one of the angular range, pointing accuracy, pointing jitter, a divergence of the illumination, a uniformity of the illumination, and a fidelity of a scanning pattern, formed by the scanning light source, to a predetermined pattern.
    Type: Grant
    Filed: April 19, 2021
    Date of Patent: October 4, 2022
    Assignee: JENOPTIK OPTICAL SYSTEMS, LLC
    Inventors: Marc D. Himel, Gunnar H. Gunnarsson, Andrea Koertvelyessy, James J. Kumler, Jan Werschnik
  • Publication number: 20210268602
    Abstract: An apparatus (112) for focus adjustment for a device (100) for laser material processing, which has a movably arranged first lens unit (124), which comprises a first lens (108), and a movably arranged second lens unit (126), which comprises a second lens (110), has an adjustment device (114) which is designed to move the first lens unit (124) in a first direction (116) and to move the second lens unit (126) in a second direction (118) opposite to the first direction (116) in order to adjust a distance between the first lens (108) and the second lens (110) for the focus adjustment.
    Type: Application
    Filed: September 3, 2019
    Publication date: September 2, 2021
    Applicant: JENOPTIK Optical Systems GmbH
    Inventors: Jan WERSCHNIK, Stefan FRANZ, Achmed ESSELBACH
  • Publication number: 20210258559
    Abstract: A method characterizes a scanning light source configured to emit illumination propagating in any one of a plurality of directions spanning an angular range. The method includes (i) detecting, with a camera, illumination propagating at each of the plurality of directions; (ii) storing image data corresponding to a response of the camera to the detected illumination. The method also includes (iii) processing the image data to characterize at least one of the angular range, pointing accuracy, pointing jitter, a divergence of the illumination, a uniformity of the illumination, and a fidelity of a scanning pattern, formed by the scanning light source, to a predetermined pattern.
    Type: Application
    Filed: April 19, 2021
    Publication date: August 19, 2021
    Inventors: Marc D. Himel, Gunnar H. Gunnarsson, Andrea Koertvelyessy, James J. Kumler, Jan Werschnik
  • Patent number: 11019326
    Abstract: A method characterizes a scanning light source configured to emit illumination propagating in any one of a plurality of directions spanning an angular range. The method includes (i) detecting, with a camera, illumination propagating at each of the plurality of directions; (ii) storing image data corresponding to a response of the camera to the detected illumination. The method also includes (iii) processing the image data to characterize at least one of the angular range, pointing accuracy, pointing jitter, a divergence of the illumination, a uniformity of the illumination, and a fidelity of a scanning pattern, formed by the scanning light source, to a predetermined pattern.
    Type: Grant
    Filed: February 8, 2019
    Date of Patent: May 25, 2021
    Assignee: JENOPTIK OPTICAL SYSTEMS, LLC
    Inventors: Marc D. Himel, Gunnar H. Gunnarsson, Andrea Koertvelyessy, James J. Kumler, Jan Werschnik
  • Patent number: 10732423
    Abstract: The invention relates to a device (102) for optical beam expansion of an optical system having a guide tube (220), a first guide cylinder (222) having a first lens (226), wherein the first guide cylinder (202) is arranged within the guide tube (220) so as to be displaceable along the longitudinal axis of the guide tube (220), and a second guide cylinder (224) having a second lens (228), wherein the second guide cylinder (224) is arranged within the guide tube (220) so as to be displaceable along the longitudinal axis of the guide tube (220). A first displacement device is provided to displace the first guide cylinder (222) along the longitudinal axis (340) of the guide tube (220), and a second displacement device is provided to displace the second guide cylinder (224) along the longitudinal axis of the guide tube (220).
    Type: Grant
    Filed: June 22, 2016
    Date of Patent: August 4, 2020
    Assignee: JENOPTIK Optical Systems GmbH
    Inventors: Juergen Weise, Birgit Massino, Joerg Wunderlich, Tim Baldsiefen, Jan Werschnik
  • Publication number: 20200218067
    Abstract: The invention relates to a mirror device for simultaneously viewing one's own mirror image and additional information. The mirror device comprises a mirror (2) which is partially permeable to visible light, and an optical system (3) which is arranged on a side of the partially permeable mirror (2) facing away from the viewer (1) and which images an electronic display (3.1) enlarged by a lens (3.2) into an intermediate image plane (ZBE) that appears to be at a same distance from the viewer as his or her mirror image.
    Type: Application
    Filed: June 4, 2018
    Publication date: July 9, 2020
    Inventor: Jan WERSCHNIK
  • Publication number: 20190253701
    Abstract: A method characterizes a scanning light source configured to emit illumination propagating in any one of a plurality of directions spanning an angular range. The method includes (i) detecting, with a camera, illumination propagating at each of the plurality of directions; (ii) storing image data corresponding to a response of the camera to the detected illumination. The method also includes (iii) processing the image data to characterize at least one of the angular range, pointing accuracy, pointing jitter, a divergence of the illumination, a uniformity of the illumination, and a fidelity of a scanning pattern, formed by the scanning light source, to a predetermined pattern.
    Type: Application
    Filed: February 8, 2019
    Publication date: August 15, 2019
    Inventors: Marc D. Himel, Gunnar H. Gunnarsson, Andrea Koertvelyessy, James J. Kumler, Jan Werschnik
  • Publication number: 20190155038
    Abstract: The invention relates to a device (102) for optical beam expansion of an optical system having a guide tube (220), a first guide cylinder (222) having a first lens (226), wherein the first guide cylinder (202) is arranged within the guide tube (220) so as to be displaceable along the longitudinal axis of the guide tube (220), and a second guide cylinder (224) having a second lens (228), wherein the second guide cylinder (224) is arranged within the guide tube (220) so as to be displaceable along the longitudinal axis of the guide tube (220). A first displacement device is provided to displace the first guide cylinder (222) along the longitudinal axis (340) of the guide tube (220), and a second displacement device is provided to displace the second guide cylinder (224) along the longitudinal axis of the guide tube (220).
    Type: Application
    Filed: June 22, 2016
    Publication date: May 23, 2019
    Applicant: JENOPTIK Optical Systems GmbH
    Inventors: Juergen WEISE, Birgit MASSINO, Joerg WUNDERLICH, Tim BALDSIEFEN, Jan WERSCHNIK
  • Patent number: 9971149
    Abstract: The invention relates to a method for producing a wavefront-corrected optical arrangement comprising at least two optical elements. Using the method, a total wavefront error in the optical arrangement is determined and compared to a permissible tolerance range for the total wavefront error. To perform the method, the optical elements are individualized by assigning an individual identifier to each of them, such that individualized optical elements are obtained, individual surface defects are measured with correct coordinates on all the individualized optical elements and the measured individual surface defects are stored with correct coordinates assigned to the appropriate individualized optical element. The optical arrangement comprising the individualized optical elements is produced virtually as a virtual optical arrangement and a total wavefront error is calculated for the virtual optical arrangement.
    Type: Grant
    Filed: December 13, 2013
    Date of Patent: May 15, 2018
    Assignee: Jenoptik Optical Systems GmbH
    Inventors: Jan Werschnik, Markus Augustin
  • Patent number: 9964730
    Abstract: Mount assembly with a monolithic mount formed by a mount ring with a plurality of retaining arms with free ends and an element, which retaining arms are arranged concentrically around the axis of symmetry of the mount ring and extend at least partially in axial direction. Three of the retaining arms contact an end face formed at the element and hold the element axially, while the other retaining arms are bonded to a circumferential surface formed at the element and prevent the element in particular from rotating.
    Type: Grant
    Filed: February 26, 2015
    Date of Patent: May 8, 2018
    Assignee: JENOPTIK Optical Systems GmbH
    Inventors: Torsten Erbe, Jan Werschnik
  • Patent number: 9829702
    Abstract: The invention relates to an adjustable, deformable mirror for compensating irregularities of a beam with a mirror element for reflecting incident rays of the beam, a base body for securing the mirror element and at least one actuating element for applying forces to the mirror element, wherein the mirror element is a planar element with a thickness of at least 1 mm, and the actuating element is a lever mechanism with lever elements. The invention also relates to a method for compensating irregularities of a beam as well as an optical arrangement with a mirror according to the invention.
    Type: Grant
    Filed: March 10, 2015
    Date of Patent: November 28, 2017
    Assignee: JENOPTIK Optical Systems GmbH
    Inventors: Torsten Erbe, Jan Werschnik
  • Publication number: 20170075111
    Abstract: The invention relates to an adjustable, deformable mirror for compensating irregularities of a beam with a mirror element for reflecting incident rays of the beam, a base body for securing the mirror element and at least one actuating element for applying forces to the mirror element, wherein the mirror element is a planar element with a thickness of at least 1 mm, and the actuating element is a lever mechanism with lever elements. The invention also relates to a method for compensating irregularities of a beam as well as an optical arrangement with a mirror according to the invention.
    Type: Application
    Filed: March 10, 2015
    Publication date: March 16, 2017
    Applicant: JENOPTIK Optical Systems GmbH
    Inventors: Torsten ERBE, Jan WERSCHNIK
  • Publication number: 20170031126
    Abstract: Mount assembly with a monolithic mount formed by a mount ring with a plurality of retaining arms with free ends and an element, which retaining arms are arranged concentrically around the axis of symmetry of the mount ring and extend at least partially in axial direction. Three of the retaining arms contact an end face formed at the element and hold the element axially, while the other retaining arms are bonded to a circumferential surface formed at the element and prevent the element in particular from rotating.
    Type: Application
    Filed: February 26, 2015
    Publication date: February 2, 2017
    Applicant: JENOPTIK Optical Systems GmbH
    Inventors: Torsten ERBE, Jan WERSCHNIK
  • Publication number: 20150346488
    Abstract: The invention relates to a method for producing a wavefront-corrected optical arrangement comprising at least two optical elements. Using the method, a total wavefront error in the optical arrangement is determined and compared to a permissible tolerance range for the total wavefront error. To perform the method, the optical elements are individualized by assigning an individual identifier to each of them, such that individualized optical elements are obtained, individual surface defects are measured with correct coordinates on all the individualized optical elements and the measured individual surface defects are stored with correct coordinates assigned to the appropriate individualized optical element. The optical arrangement comprising the individualized optical elements is produced virtually as a virtual optical arrangement and a total wavefront error is calculated for the virtual optical arrangement.
    Type: Application
    Filed: December 13, 2013
    Publication date: December 3, 2015
    Applicant: JENOPTIK Optical Systems GmbH
    Inventors: Jan WERSCHNIK, Markus AUGUSTIN
  • Patent number: 9110380
    Abstract: The invention relates to an exposure device (14) for the structured exposure of a wafer, having at least one exposure arrangement with which a beam that is separated into two sub-beams is modulated via two micromirror arrays in order to increase the throughput speed during the exposure of wafers.
    Type: Grant
    Filed: March 8, 2012
    Date of Patent: August 18, 2015
    Assignee: JENOPTIK Optical Systems GmbH
    Inventors: Jan Werschnik, Markus Augustin, Lutz Reichmann
  • Publication number: 20140118711
    Abstract: The invention relates to an exposure device (14) for the structured exposure of a wafer, having at least one exposure arrangement with which a beam that is separated into two sub-beams is modulated via two micromirror arrays in order to increase the throughput speed during the exposure of wafers.
    Type: Application
    Filed: March 8, 2012
    Publication date: May 1, 2014
    Inventors: Jan Werschnik, Markus Augustin, Lutz Reichmann
  • Publication number: 20130094221
    Abstract: A light integrator having four parallelepipedal glass plates which have an identical width. Each plate has an inner side and an outer side with a length, as well as a first and a second longitudinal side and two end faces with a height, the plates are arranged relative to one another such that they enclose a parallelepipedal open cavity extending over the length, the glass plates being bonded to one another. The inner sides of the plates are subdivided into, in each case, a mirror-coated, optically active surface and an adhesive surface, and the inner side bearing with its adhesive surface of in each case one glass plate indirectly via adhesive against the first longitudinal side of another glass plate. The inner side of said glass plates have a groove running in a longitudinal direction and acting as an adhesive trap adjoining the optically active surface.
    Type: Application
    Filed: May 24, 2011
    Publication date: April 18, 2013
    Inventors: Torsten Goletz, Joerg-Peter Schmidt, Jan Werschnik