Patents by Inventor Jan Zwier
Jan Zwier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190037704Abstract: A maintenance unit for an inkjet system with a print head assembly having at least one print head being an integral unit configured to eject droplets of ink fluid from nozzles arranged in a surface of the at least one print head towards a substrate includes a wiper to wipe along the surface of the at least one print head; a force actuator to apply a force to the wiper in a direction perpendicular to the surface of the at least one print head; a force measuring unit configured to determine a wiping force with which the wiper is pressed against the surface of the at least one print head; and a controller configured to control the force applied by the force actuator in dependency of an output of the force measuring unit in order to press the wiper against the surface of a print head with a predetermined wiping force.Type: ApplicationFiled: October 4, 2018Publication date: January 31, 2019Applicant: MUTRACX INTERNATIONAL B.V.Inventors: Henk Jan ZWIERS, Jacobus Hendricus Johannes JANSSEN, Joost Anne VEERMAN
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Patent number: 10123427Abstract: A printing process for printing an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout. The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image for allocating dot positions of the ink pattern is generated. The printing process includes a step of comparing a scan image with the input image to carry out a quality inspection to detect any print defects in the printed ink pattern. The printing process includes a step of providing a decision on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station to finalise the substrate. In case of a rejection, the substrate including print defects can be recycled.Type: GrantFiled: August 15, 2017Date of Patent: November 6, 2018Assignee: MUTRACX INTERNATIONAL B.V.Inventors: Henk Jan Zwiers, Jacobus Hendricus Johannes Janssen, Joost Anne Veerman
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Publication number: 20170347461Abstract: A printing process for printing an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout. The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image for allocating dot positions of the ink pattern is generated. The printing process includes a step of comparing a scan image with the input image to carry out a quality inspection to detect any print defects in the printed ink pattern. The printing process includes a step of providing a decision on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station to finalise the substrate. In case of a rejection, the substrate including print defects can be recycled.Type: ApplicationFiled: August 15, 2017Publication date: November 30, 2017Applicant: MUTRACX INTERNATIONAL B.V.Inventors: Henk Jan ZWIERS, Jacobus Hendricus Johannes JANSSEN, Joost Anne VEERMAN
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Patent number: 9769932Abstract: A printing process for printing an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout. The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image for allocating dot positions of the ink pattern is generated. The printing process includes a step of comparing a scan image with the input image to carry out a quality inspection to detect any print defects in the printed ink pattern. The printing process includes a step of providing a decision on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station to finalize the substrate. In case of a rejection, the substrate including print defects can be recycled.Type: GrantFiled: May 6, 2016Date of Patent: September 19, 2017Assignee: MUTRACX INTERNATIONAL B.V.Inventors: Henk Jan Zwiers, Jacobus Hendricus Johannes Janssen, Joost Anne Veerman
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Publication number: 20160255727Abstract: A printing process for printing an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout. The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image for allocating dot positions of the ink pattern is generated. The printing process includes a step of comparing a scan image with the input image to carry out a quality inspection to detect any print defects in the printed ink pattern. The printing process includes a step of providing a decision on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station to finalise the substrate. In case of a rejection, the substrate including print defects can be recycled.Type: ApplicationFiled: May 6, 2016Publication date: September 1, 2016Applicant: MUTRACX INTERNATIONAL B.V.Inventors: Henk Jan ZWIERS, Jacobus Hendricus Johannes JANSSEN, Joost Anne VEERMAN
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Patent number: 9363899Abstract: A printing process for printing (P) an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout (R). The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image (rii) for allocating dot positions of the ink pattern is generated. The printing process comprises a step of comparing a scan (S) image (rsi) with the input image to carry out a quality inspection (Q) to detect any print defects in the printed ink pattern. The printing process comprises a step of providing a decision (os) on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station (E) to finalize the substrate. In case of a rejection, the substrate including print defects can be recycled (D).Type: GrantFiled: December 28, 2012Date of Patent: June 7, 2016Assignee: MUTRACX INTERNATIONAL B.V.Inventors: Henk Jan Zwiers, Jacobus Hendricus Johannes Janssen, Joost Anne Veerman
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Publication number: 20140374375Abstract: A printing process for printing (P) an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout (R). The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image (rii) for allocating dot positions of the ink pattern is generated. The printing process comprises a step of comparing a scan (S) image (rsi) with the input image to carry out a quality inspection (Q) to detect any print defects in the printed ink pattern. The printing process comprises a step of providing a decision (os) on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station (E) to finalise the substrate. In case of a rejection, the substrate including print defects can be recycled (D).Type: ApplicationFiled: December 28, 2012Publication date: December 25, 2014Inventors: Henk Jan Zwiers, Jacobus Hendricus Johannes Janssen, Joost Anne Veerman
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Patent number: 7568852Abstract: A printer including: a frame, a bearing assembly mounted to said frame, a platen rotatably supported in the bearing assembly for advancing a sheet of a recording medium, a guide rail mounted to the frame and extending in parallel with an axial direction (Y) of the platen, a ruler extending in parallel with the guide rail, a carriage driven to reciprocate along the guide rail and carrying a printhead, and a detector arranged to detect the position of the carriage relative to the ruler, wherein, in said axial direction (Y), the ruler is rigidly fixed at a location of the bearing assembly independently of the guide rail.Type: GrantFiled: December 21, 2005Date of Patent: August 4, 2009Assignee: OCE' -Technologies B.V.Inventors: Frank J. H. Nottelman, Barry B. Goeree, Henk-Jan Zwiers, Bas W. J. J. A. Van Dorp, Luc G. T. Dircks
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Patent number: 7438488Abstract: A printer including: a frame composed of a lower frame and an upper frame supported on the lower frame, a platen rotatably supported in the upper frame for advancing a recording medium, a guide rail extending in parallel with an axial direction (Y) of the platen, a carriage guided at the guide rail and carrying a printhead, and a drive mechanism adapted to drive the carriage reciprocatingly along the guide rail, wherein the drive mechanism is directly supported in said axial direction (Y) by the lower frame.Type: GrantFiled: December 21, 2005Date of Patent: October 21, 2008Assignee: OCE-Technologies B.V.Inventors: Barry B. Goeree, Henk-Jan Zwiers, Frank J. H. Nottelman, Luc G. T. Dircks, Bas W. J. J. A. Van Dorp
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Patent number: 7401991Abstract: A printer including a frame, a feed roller rotatably supported in the frame for advancing a recording medium, a sheet support plate for supporting said recording medium, a guide rail extending in parallel with an axial direction (Y) of the feed roller, and a carriage guided at the guide rail and carrying a printhead facing the recording medium on the sheet support plate, the frame being composed of a support structure and two plate-like function blocks, which are supported on said support structure at both ends of the feed roller so as to extend in respective planes (X-Z) normal to said axial direction (Y), and which support the guide rail and the sheet support plate, wherein the feed roller is rotatably supported in two bearings, each of which has a bearing case, each bearing case being supported on a member of the support structure, each of the function blocks defining a downwardly open V-shaped notch which is supported on the peripheral surface of one of the bearing cases at exactly two points, and the guiType: GrantFiled: December 21, 2005Date of Patent: July 22, 2008Assignee: Oce-Technologies B.V.Inventors: Barry B. Goeree, Henk-Jan Zwiers, Frank J. H. Nottelman, Luc G. T. Dircks
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Publication number: 20060133880Abstract: A printer including: a frame composed of a lower frame and an upper frame supported on the lower frame, a platen rotatably supported in the upper frame for advancing a recording medium, a guide rail extending in parallel with an axial direction (Y) of the platen, a carriage guided at the guide rail and carrying a printhead, and a drive mechanism adapted to drive the carriage reciprocatingly along the guide rail, wherein the drive mechanism is directly supported in said axial direction (Y) by the lower frame.Type: ApplicationFiled: December 21, 2005Publication date: June 22, 2006Inventors: Barry Goeree, Henk-Jan Zwiers, Frank Nottelman
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Publication number: 20060133883Abstract: A printer including a frame, a feed roller rotatably supported in the frame for advancing a recording medium, a sheet support plate for supporting said recording medium, a guide rail extending in parallel with an axial direction (Y) of the feed roller, and a carriage guided at the guide rail and carrying a printhead facing the recording medium on the sheet support plate, the frame being composed of a support structure and two plate-like function blocks, which are supported on said support structure at both ends of the feed roller so as to extend in respective planes (X-Z) normal to said axial direction (Y), and which support the guide rail and the sheet support plate, wherein the feed roller is rotatably supported in two bearings, each of which has a bearing case, each bearing case being supported on a member of the support structure, each of the function blocks defining a downwardly open V-shaped notch which is supported on the peripheral surface of one of the bearing cases at exactly two points, and the guiType: ApplicationFiled: December 21, 2005Publication date: June 22, 2006Inventors: Barry Goeree, Henk-Jan Zwiers, Frank Nottelman
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Publication number: 20060120789Abstract: A printer including: a frame, a bearing assembly mounted to said frame, a platen rotatably supported in the bearing assembly for advancing a sheet of a recording medium, a guide rail mounted to the frame and extending in parallel with an axial direction (Y) of the platen, a ruler extending in parallel with the guide rail, a carriage driven to reciprocate along the guide rail and carrying a printhead, and a detector arranged to detect the position of the carriage relative to the ruler, wherein, in said axial direction (Y), the ruler is rigidly fixed at a location of the bearing assembly independently of the guide rail.Type: ApplicationFiled: December 21, 2005Publication date: June 8, 2006Inventors: Frank Nottelman, Barry Goeree, Henk-Jan Zwiers, Bas Van Dorp
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Patent number: 5013384Abstract: An inlet opening in an evacuatable vacuum system is substantially enlarged and closed off by a porous plate so that the ingress of dust is avoided and a very uniform inflow of gas is realized. A similar plate can be used for closing off a gas outlet opening of the vacuum chamber.Type: GrantFiled: June 22, 1990Date of Patent: May 7, 1991Assignee: U.S. Philips CorporationInventors: Willem F. Mellink, Peter J. G. M. Janssen, Jan Zwier, Harm Lotterman
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Patent number: 4890031Abstract: The stability of semiconductor cathodes is improved by reducing the effective emitting surface area. This is effected by producing emission patterns by means of separate emission regions, whose overall surface area is much smaller than that of the actual emission patter. Due to the higher emission current and adjustment current, adsorbed particles, which adversely affect the stability of the emission, are rapidly drained.Type: GrantFiled: January 18, 1989Date of Patent: December 26, 1989Assignee: U.S. Philips Corp.Inventor: Jan Zwier
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Patent number: 4766350Abstract: The invention relates to an electric arrangement for operating a an electric discharge lamp (13) which is connected in series with a coil (14) and a switch (15) to a pulsatory direct voltage source. The combination of the lamp and the coil is shunted by a rectifier. The lamp is shunted by a capacitor (18) and the switch is periodically rendered conductive at an instant when the instantaneous voltage of the pulsatory direct voltage source is between 0.5 and 0.8 times the then required re-ignition voltage of the lamp. The voltage build up across the capacitor (18) after the switch has become conducting causes the lamp to reignite. The luminous efficacy of the lamp is comparatively high.Type: GrantFiled: September 10, 1982Date of Patent: August 23, 1988Assignee: U.S. Philips CorporationInventors: Theo Husgen, Hubert Raets, Gerd Schiefer, Jan Zwier
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Patent number: 4743794Abstract: Positive ions which are generated in a vacuum tube (1) and can adversely affect the electron emission of a cathode (3) are collected for the major part by a screen grid or diaphragm (5), which forms part of a positive electron lens (4,5). In the case of a semiconductor cathode having a circular emission region (13) having a diameter larger than that of the opening in the screen grid (5), this emission region (13) is struck only by positive ions generated in a small region between the cathode (3) and a first grid (4). These ions moreover have a comparatively low energy so that the emission behavior is to only a limited extent adversely affected by sputtering by positive ions which would remove cathode material (33), such as cesium.Type: GrantFiled: May 26, 1987Date of Patent: May 10, 1988Assignee: U.S. Philips CorporationInventors: Martinus H. L. M. Van Den Broek, Jan Zwier
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Patent number: 4736135Abstract: In order to improve the stability of a cold cathode (5) of the reverse biased junction type, a vacuum space (2) is coupled with a reservoir (10), within which a source (21) of material reducing the work function, for example caesium, is present. By influencing the vapor pressure and the temperature in component parts (13, 16) of the reservoir (10) and in the source (21), loss of caesium due to adsorption or other phenomena occurring at the emitting surface (8) of the cathode (5) can be compensated for by an incident flow of caesium (25).Type: GrantFiled: June 18, 1986Date of Patent: April 5, 1988Assignee: U.S. Philips CorporationInventors: Jan Zwier, Johannes H. A. Vasterink, Johannes Van Esdonk
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Patent number: 4717855Abstract: The efficiency of a semiconductor cathode can be increased by bombarding the electron-emitting regions (8) with an electron beam (8), which frees the surface from adhered oxygen particles. The electron beam preferably originates from a second semiconductor cathode (42), which has an opening (42) for passing the electron beam (20) of the first semiconductor cathode (20). Alternatively, both semiconductor cathodes can be realized in one semiconductor body.Type: GrantFiled: February 26, 1986Date of Patent: January 5, 1988Assignee: U.S. Philips CorporationInventors: Jan Zwier, Johannes H. A. Vasterink