Patents by Inventor Jan Zwier

Jan Zwier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190037704
    Abstract: A maintenance unit for an inkjet system with a print head assembly having at least one print head being an integral unit configured to eject droplets of ink fluid from nozzles arranged in a surface of the at least one print head towards a substrate includes a wiper to wipe along the surface of the at least one print head; a force actuator to apply a force to the wiper in a direction perpendicular to the surface of the at least one print head; a force measuring unit configured to determine a wiping force with which the wiper is pressed against the surface of the at least one print head; and a controller configured to control the force applied by the force actuator in dependency of an output of the force measuring unit in order to press the wiper against the surface of a print head with a predetermined wiping force.
    Type: Application
    Filed: October 4, 2018
    Publication date: January 31, 2019
    Applicant: MUTRACX INTERNATIONAL B.V.
    Inventors: Henk Jan ZWIERS, Jacobus Hendricus Johannes JANSSEN, Joost Anne VEERMAN
  • Patent number: 10123427
    Abstract: A printing process for printing an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout. The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image for allocating dot positions of the ink pattern is generated. The printing process includes a step of comparing a scan image with the input image to carry out a quality inspection to detect any print defects in the printed ink pattern. The printing process includes a step of providing a decision on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station to finalise the substrate. In case of a rejection, the substrate including print defects can be recycled.
    Type: Grant
    Filed: August 15, 2017
    Date of Patent: November 6, 2018
    Assignee: MUTRACX INTERNATIONAL B.V.
    Inventors: Henk Jan Zwiers, Jacobus Hendricus Johannes Janssen, Joost Anne Veerman
  • Publication number: 20170347461
    Abstract: A printing process for printing an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout. The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image for allocating dot positions of the ink pattern is generated. The printing process includes a step of comparing a scan image with the input image to carry out a quality inspection to detect any print defects in the printed ink pattern. The printing process includes a step of providing a decision on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station to finalise the substrate. In case of a rejection, the substrate including print defects can be recycled.
    Type: Application
    Filed: August 15, 2017
    Publication date: November 30, 2017
    Applicant: MUTRACX INTERNATIONAL B.V.
    Inventors: Henk Jan ZWIERS, Jacobus Hendricus Johannes JANSSEN, Joost Anne VEERMAN
  • Patent number: 9769932
    Abstract: A printing process for printing an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout. The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image for allocating dot positions of the ink pattern is generated. The printing process includes a step of comparing a scan image with the input image to carry out a quality inspection to detect any print defects in the printed ink pattern. The printing process includes a step of providing a decision on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station to finalize the substrate. In case of a rejection, the substrate including print defects can be recycled.
    Type: Grant
    Filed: May 6, 2016
    Date of Patent: September 19, 2017
    Assignee: MUTRACX INTERNATIONAL B.V.
    Inventors: Henk Jan Zwiers, Jacobus Hendricus Johannes Janssen, Joost Anne Veerman
  • Publication number: 20160255727
    Abstract: A printing process for printing an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout. The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image for allocating dot positions of the ink pattern is generated. The printing process includes a step of comparing a scan image with the input image to carry out a quality inspection to detect any print defects in the printed ink pattern. The printing process includes a step of providing a decision on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station to finalise the substrate. In case of a rejection, the substrate including print defects can be recycled.
    Type: Application
    Filed: May 6, 2016
    Publication date: September 1, 2016
    Applicant: MUTRACX INTERNATIONAL B.V.
    Inventors: Henk Jan ZWIERS, Jacobus Hendricus Johannes JANSSEN, Joost Anne VEERMAN
  • Patent number: 9363899
    Abstract: A printing process for printing (P) an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout (R). The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image (rii) for allocating dot positions of the ink pattern is generated. The printing process comprises a step of comparing a scan (S) image (rsi) with the input image to carry out a quality inspection (Q) to detect any print defects in the printed ink pattern. The printing process comprises a step of providing a decision (os) on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station (E) to finalize the substrate. In case of a rejection, the substrate including print defects can be recycled (D).
    Type: Grant
    Filed: December 28, 2012
    Date of Patent: June 7, 2016
    Assignee: MUTRACX INTERNATIONAL B.V.
    Inventors: Henk Jan Zwiers, Jacobus Hendricus Johannes Janssen, Joost Anne Veerman
  • Publication number: 20140374375
    Abstract: A printing process for printing (P) an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout (R). The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image (rii) for allocating dot positions of the ink pattern is generated. The printing process comprises a step of comparing a scan (S) image (rsi) with the input image to carry out a quality inspection (Q) to detect any print defects in the printed ink pattern. The printing process comprises a step of providing a decision (os) on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station (E) to finalise the substrate. In case of a rejection, the substrate including print defects can be recycled (D).
    Type: Application
    Filed: December 28, 2012
    Publication date: December 25, 2014
    Inventors: Henk Jan Zwiers, Jacobus Hendricus Johannes Janssen, Joost Anne Veerman
  • Patent number: 7568852
    Abstract: A printer including: a frame, a bearing assembly mounted to said frame, a platen rotatably supported in the bearing assembly for advancing a sheet of a recording medium, a guide rail mounted to the frame and extending in parallel with an axial direction (Y) of the platen, a ruler extending in parallel with the guide rail, a carriage driven to reciprocate along the guide rail and carrying a printhead, and a detector arranged to detect the position of the carriage relative to the ruler, wherein, in said axial direction (Y), the ruler is rigidly fixed at a location of the bearing assembly independently of the guide rail.
    Type: Grant
    Filed: December 21, 2005
    Date of Patent: August 4, 2009
    Assignee: OCE' -Technologies B.V.
    Inventors: Frank J. H. Nottelman, Barry B. Goeree, Henk-Jan Zwiers, Bas W. J. J. A. Van Dorp, Luc G. T. Dircks
  • Patent number: 7438488
    Abstract: A printer including: a frame composed of a lower frame and an upper frame supported on the lower frame, a platen rotatably supported in the upper frame for advancing a recording medium, a guide rail extending in parallel with an axial direction (Y) of the platen, a carriage guided at the guide rail and carrying a printhead, and a drive mechanism adapted to drive the carriage reciprocatingly along the guide rail, wherein the drive mechanism is directly supported in said axial direction (Y) by the lower frame.
    Type: Grant
    Filed: December 21, 2005
    Date of Patent: October 21, 2008
    Assignee: OCE-Technologies B.V.
    Inventors: Barry B. Goeree, Henk-Jan Zwiers, Frank J. H. Nottelman, Luc G. T. Dircks, Bas W. J. J. A. Van Dorp
  • Patent number: 7401991
    Abstract: A printer including a frame, a feed roller rotatably supported in the frame for advancing a recording medium, a sheet support plate for supporting said recording medium, a guide rail extending in parallel with an axial direction (Y) of the feed roller, and a carriage guided at the guide rail and carrying a printhead facing the recording medium on the sheet support plate, the frame being composed of a support structure and two plate-like function blocks, which are supported on said support structure at both ends of the feed roller so as to extend in respective planes (X-Z) normal to said axial direction (Y), and which support the guide rail and the sheet support plate, wherein the feed roller is rotatably supported in two bearings, each of which has a bearing case, each bearing case being supported on a member of the support structure, each of the function blocks defining a downwardly open V-shaped notch which is supported on the peripheral surface of one of the bearing cases at exactly two points, and the gui
    Type: Grant
    Filed: December 21, 2005
    Date of Patent: July 22, 2008
    Assignee: Oce-Technologies B.V.
    Inventors: Barry B. Goeree, Henk-Jan Zwiers, Frank J. H. Nottelman, Luc G. T. Dircks
  • Publication number: 20060133880
    Abstract: A printer including: a frame composed of a lower frame and an upper frame supported on the lower frame, a platen rotatably supported in the upper frame for advancing a recording medium, a guide rail extending in parallel with an axial direction (Y) of the platen, a carriage guided at the guide rail and carrying a printhead, and a drive mechanism adapted to drive the carriage reciprocatingly along the guide rail, wherein the drive mechanism is directly supported in said axial direction (Y) by the lower frame.
    Type: Application
    Filed: December 21, 2005
    Publication date: June 22, 2006
    Inventors: Barry Goeree, Henk-Jan Zwiers, Frank Nottelman
  • Publication number: 20060133883
    Abstract: A printer including a frame, a feed roller rotatably supported in the frame for advancing a recording medium, a sheet support plate for supporting said recording medium, a guide rail extending in parallel with an axial direction (Y) of the feed roller, and a carriage guided at the guide rail and carrying a printhead facing the recording medium on the sheet support plate, the frame being composed of a support structure and two plate-like function blocks, which are supported on said support structure at both ends of the feed roller so as to extend in respective planes (X-Z) normal to said axial direction (Y), and which support the guide rail and the sheet support plate, wherein the feed roller is rotatably supported in two bearings, each of which has a bearing case, each bearing case being supported on a member of the support structure, each of the function blocks defining a downwardly open V-shaped notch which is supported on the peripheral surface of one of the bearing cases at exactly two points, and the gui
    Type: Application
    Filed: December 21, 2005
    Publication date: June 22, 2006
    Inventors: Barry Goeree, Henk-Jan Zwiers, Frank Nottelman
  • Publication number: 20060120789
    Abstract: A printer including: a frame, a bearing assembly mounted to said frame, a platen rotatably supported in the bearing assembly for advancing a sheet of a recording medium, a guide rail mounted to the frame and extending in parallel with an axial direction (Y) of the platen, a ruler extending in parallel with the guide rail, a carriage driven to reciprocate along the guide rail and carrying a printhead, and a detector arranged to detect the position of the carriage relative to the ruler, wherein, in said axial direction (Y), the ruler is rigidly fixed at a location of the bearing assembly independently of the guide rail.
    Type: Application
    Filed: December 21, 2005
    Publication date: June 8, 2006
    Inventors: Frank Nottelman, Barry Goeree, Henk-Jan Zwiers, Bas Van Dorp
  • Patent number: 5013384
    Abstract: An inlet opening in an evacuatable vacuum system is substantially enlarged and closed off by a porous plate so that the ingress of dust is avoided and a very uniform inflow of gas is realized. A similar plate can be used for closing off a gas outlet opening of the vacuum chamber.
    Type: Grant
    Filed: June 22, 1990
    Date of Patent: May 7, 1991
    Assignee: U.S. Philips Corporation
    Inventors: Willem F. Mellink, Peter J. G. M. Janssen, Jan Zwier, Harm Lotterman
  • Patent number: 4890031
    Abstract: The stability of semiconductor cathodes is improved by reducing the effective emitting surface area. This is effected by producing emission patterns by means of separate emission regions, whose overall surface area is much smaller than that of the actual emission patter. Due to the higher emission current and adjustment current, adsorbed particles, which adversely affect the stability of the emission, are rapidly drained.
    Type: Grant
    Filed: January 18, 1989
    Date of Patent: December 26, 1989
    Assignee: U.S. Philips Corp.
    Inventor: Jan Zwier
  • Patent number: 4766350
    Abstract: The invention relates to an electric arrangement for operating a an electric discharge lamp (13) which is connected in series with a coil (14) and a switch (15) to a pulsatory direct voltage source. The combination of the lamp and the coil is shunted by a rectifier. The lamp is shunted by a capacitor (18) and the switch is periodically rendered conductive at an instant when the instantaneous voltage of the pulsatory direct voltage source is between 0.5 and 0.8 times the then required re-ignition voltage of the lamp. The voltage build up across the capacitor (18) after the switch has become conducting causes the lamp to reignite. The luminous efficacy of the lamp is comparatively high.
    Type: Grant
    Filed: September 10, 1982
    Date of Patent: August 23, 1988
    Assignee: U.S. Philips Corporation
    Inventors: Theo Husgen, Hubert Raets, Gerd Schiefer, Jan Zwier
  • Patent number: 4743794
    Abstract: Positive ions which are generated in a vacuum tube (1) and can adversely affect the electron emission of a cathode (3) are collected for the major part by a screen grid or diaphragm (5), which forms part of a positive electron lens (4,5). In the case of a semiconductor cathode having a circular emission region (13) having a diameter larger than that of the opening in the screen grid (5), this emission region (13) is struck only by positive ions generated in a small region between the cathode (3) and a first grid (4). These ions moreover have a comparatively low energy so that the emission behavior is to only a limited extent adversely affected by sputtering by positive ions which would remove cathode material (33), such as cesium.
    Type: Grant
    Filed: May 26, 1987
    Date of Patent: May 10, 1988
    Assignee: U.S. Philips Corporation
    Inventors: Martinus H. L. M. Van Den Broek, Jan Zwier
  • Patent number: 4736135
    Abstract: In order to improve the stability of a cold cathode (5) of the reverse biased junction type, a vacuum space (2) is coupled with a reservoir (10), within which a source (21) of material reducing the work function, for example caesium, is present. By influencing the vapor pressure and the temperature in component parts (13, 16) of the reservoir (10) and in the source (21), loss of caesium due to adsorption or other phenomena occurring at the emitting surface (8) of the cathode (5) can be compensated for by an incident flow of caesium (25).
    Type: Grant
    Filed: June 18, 1986
    Date of Patent: April 5, 1988
    Assignee: U.S. Philips Corporation
    Inventors: Jan Zwier, Johannes H. A. Vasterink, Johannes Van Esdonk
  • Patent number: 4717855
    Abstract: The efficiency of a semiconductor cathode can be increased by bombarding the electron-emitting regions (8) with an electron beam (8), which frees the surface from adhered oxygen particles. The electron beam preferably originates from a second semiconductor cathode (42), which has an opening (42) for passing the electron beam (20) of the first semiconductor cathode (20). Alternatively, both semiconductor cathodes can be realized in one semiconductor body.
    Type: Grant
    Filed: February 26, 1986
    Date of Patent: January 5, 1988
    Assignee: U.S. Philips Corporation
    Inventors: Jan Zwier, Johannes H. A. Vasterink