Patents by Inventor Janay Camp

Janay Camp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Analyzing root causes of process variation in scatterometry metrology
    Patent number: 10203200
    Abstract: Method, metrology modules and RCA tool are provided, which use the behavior of resonance region(s) in measurement landscapes to evaluate and characterize process variation with respect to symmetric and asymmetric factors, and provide root cause analysis of the process variation with respect to process steps. Simulations of modeled stacks with different layer thicknesses and process variation factors may be used to enhance the analysis and provide improved target designs, improved algorithms and correctables for metrology measurements. Specific targets that exhibit sensitive resonance regions may be utilize to enhance the evaluation of process variation.
    Type: Grant
    Filed: November 1, 2016
    Date of Patent: February 12, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Tal Marciano, Michael E. Adel, Mark Ghinovker, Barak Bringoltz, Dana Klein, Tal Itzkovich, Vidya Ramanathan, Janay Camp
  • Feed forward of metrology data in a metrology system
    Patent number: 9903711
    Abstract: A metrology performance analysis system includes a metrology tool including one or more detectors and a controller communicatively coupled to the one or more detectors. The controller is configured to receive one or more metrology data sets associated with a metrology target from the metrology tool in which the one or more metrology data sets include one or more measured metrology metrics and the one or more measured metrology metrics indicate deviations from nominal values. The controller is further configured to determine relationships between the deviations from the nominal values and one or more selected semiconductor process variations, and determine one or more root causes of the deviations from the nominal values based on the relationships between values of the one or more metrology metrics and the one or more selected semiconductor process variations.
    Type: Grant
    Filed: April 4, 2016
    Date of Patent: February 27, 2018
    Assignee: KLA—Tencor Corporation
    Inventors: Ady Levy, Daniel Kandel, Michael E. Adel, Leonid Poslavsky, John Robinson, Tal Marciano, Barak Bringoltz, Tzahi Grunzweig, Dana Klein, Tal Itzkovich, Nadav Carmel, Nuriel Amir, Vidya Ramanathan, Janay Camp, Mark Wagner
  • Analyzing Root Causes of Process Variation in Scatterometry Metrology
    Publication number: 20180023950
    Abstract: Method, metrology modules and RCA tool are provided, which use the behavior of resonance region(s) in measurement landscapes to evaluate and characterize process variation with respect to symmetric and asymmetric factors, and provide root cause analysis of the process variation with respect to process steps. Simulations of modeled stacks with different layer thicknesses and process variation factors may be used to enhance the analysis and provide improved target designs, improved algorithms and correctables for metrology measurements. Specific targets that exhibit sensitive resonance regions may be utilize to enhance the evaluation of process variation.
    Type: Application
    Filed: November 1, 2016
    Publication date: January 25, 2018
    Inventors: Tal Marciano, Michael E. Adel, Mark Ghinovker, Barak Bringoltz, Dana Klein, Tal Itzkovich, Vidya Ramanathan, Janay Camp
  • Feed Forward of Metrology Data in a Metrology System
    Publication number: 20160290796
    Abstract: A metrology performance analysis system includes a metrology tool including one or more detectors and a controller communicatively coupled to the one or more detectors. The controller is configured to receive one or more metrology data sets associated with a metrology target from the metrology tool in which the one or more metrology data sets include one or more measured metrology metrics and the one or more measured metrology metrics indicate deviations from nominal values. The controller is further configured to determine relationships between the deviations from the nominal values and one or more selected semiconductor process variations, and determine one or more root causes of the deviations from the nominal values based on the relationships between values of the one or more metrology metrics and the one or more selected semiconductor process variations.
    Type: Application
    Filed: April 4, 2016
    Publication date: October 6, 2016
    Inventors: Ady Levy, Daniel Kandel, Michael E. Adel, Leonid Poslavsky, John Robinson, Tal Marciano, Barak Bringoltz, Tzahi Grunzweig, Dana Klein, Tal Itzkovich, Nadav Carmel, Nuriel Amir, Vidya Ramanathan, Janay Camp, Mark Wagner