Patents by Inventor Jane Elizabeth Frommer
Jane Elizabeth Frommer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20110128840Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone polymers, each of the one or more polyaryletherketone polymers having two terminal ends, each terminal end having two or more phenylethynyl moieties. The one or more polyaryletherketone polymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layers in atomic force data storage devices.Type: ApplicationFiled: January 28, 2011Publication date: June 2, 2011Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
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Patent number: 7939620Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone polymers, each of the one or more polyaryletherketone polymers having two terminal ends, each terminal end having two or more phenylethynyl moieties. The one or more polyaryletherketone polymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layers in atomic force data storage devices.Type: GrantFiled: March 27, 2008Date of Patent: May 10, 2011Assignee: International Business Machines CorporationInventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
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Publication number: 20100284264Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone copolymers, each of the one or more polyaryletherketone copolymers comprising (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a first phenylethynyl moiety, each of the one or more polyaryletherketone copolymers having two terminal ends, each terminal end having a phenylethynyl moiety the same as or different from the first phenylethynyl moiety. The one or more polyaryletherketone copolymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layer in an atomic force data storage device.Type: ApplicationFiled: July 14, 2010Publication date: November 11, 2010Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
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Patent number: 7811499Abstract: An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyaryletherketone polymers are used as the recording layers in atomic force data storage devices, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyaryletherketone polymers may be tuned to match thermal and force parameters required in read-write-erase cycles.Type: GrantFiled: June 26, 2006Date of Patent: October 12, 2010Assignee: International Business Machines CorporationInventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
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Patent number: 7749915Abstract: A method of protecting a polymeric layer from contamination by a photoresist layer. The method includes: (a) forming a polymeric layer over a substrate; (b) forming a non-photoactive protection layer over the polymeric layer; (c) forming a photoresist layer over the protection layer; (d) exposing the photoresist layer to actinic radiation and developing the photoresist layer to form a patterned photoresist layer, thereby exposing regions of the protection layer; (e) etching through the protection layer and the polymeric layer where the protection layer is not protected by the patterned photoresist layer; (f) removing the patterned photoresist layer in a first removal process; and (g) removing the protection layer in a second removal process different from the first removal process.Type: GrantFiled: March 31, 2008Date of Patent: July 6, 2010Assignee: International Business Machines CorporationInventors: Ute Drechsler, Urs T. Duerig, Jane Elizabeth Frommer, Bernd W. Gotsmann, James Lupton Hedrick, Armin W. Knoll, Tobias Kraus, Robert Dennis Miller
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Patent number: 7723458Abstract: An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyaryletherketone polymers are used as the recording layers in atomic force data storage devices, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyaryletherketone polymers may be tuned to match thermal and force parameters required in read-write-erase cycles.Type: GrantFiled: March 25, 2008Date of Patent: May 25, 2010Assignee: International Business Machines CorporationInventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
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Patent number: 7558186Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone polymers, each of the one or more polyaryletherketone polymers having two terminal ends, each terminal end having two or more phenylethynyl moieties. The one or more polyaryletherketone polymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layers in atomic force data storage devices.Type: GrantFiled: January 2, 2007Date of Patent: July 7, 2009Assignee: International Business Machines CorporationInventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
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Publication number: 20080220613Abstract: A method of protecting a polymeric layer from contamination by a photoresist layer. The method includes: (a) forming a polymeric layer over a substrate; (b) forming a non-photoactive protection layer over the polymeric layer; (c) forming a photoresist layer over the protection layer; (d) exposing the photoresist layer to actinic radiation and developing the photoresist layer to form a patterned photoresist layer, thereby exposing regions of the protection layer; (e) etching through the protection layer and the polymeric layer where the protection layer is not protected by the patterned photoresist layer; (f) removing the patterned photoresist layer in a first removal process; and (g) removing the protection layer in a second removal process different from the first removal process.Type: ApplicationFiled: March 31, 2008Publication date: September 11, 2008Inventors: Ute Drechsler, Urs T. Duerig, Jane Elizabeth Frommer, Bernd W. Gotsmann, James Lupton Hedrick, Armin W. Knoll, Tobias Kraus, Robert Dennis Miller
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Publication number: 20080219135Abstract: An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyimide oligomers are used as the recording layers in atomic force data storage device, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyimide oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles. Additionally, the cross-linked polyimide oligomers are suitable for use in nano-scale imaging.Type: ApplicationFiled: March 27, 2008Publication date: September 11, 2008Inventors: Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade, Johannes Windeln
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Publication number: 20080220612Abstract: A method of protecting a polymeric layer from contamination by a photoresist layer. The method includes: (a) forming a polymeric layer over a substrate; (b) forming a non-photoactive protection layer over the polymeric layer; (c) forming a photoresist layer over the protection layer; (d) exposing the photoresist layer to actinic radiation and developing the photoresist layer to form a patterned photoresist layer, thereby exposing regions of the protection layer; (e) etching through the protection layer and the polymeric layer where the protection layer is not protected by the patterned photoresist layer; (f) removing the patterned photoresist layer in a first removal process; and (g) removing the protection layer in a second removal process different from the first removal process.Type: ApplicationFiled: March 6, 2007Publication date: September 11, 2008Inventors: Ute Drechsler, Urs T. Duerig, Jane Elizabeth Frommer, Bernd W. Gotsmann, James Lupton Hedrick, Armin W. Knoll, Tobias Kraus, Robert Dennis Miller
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Publication number: 20080205253Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone copolymers, each of the one or more polyaryletherketone copolymers comprising (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a first phenylethynyl moiety, each of the one or more polyaryletherketone copolymers having two terminal ends, each terminal end having a phenylethynyl moiety the same as or different from the first phenylethynyl moiety. The one or more polyaryletherketone copolymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layer in an atomic force data storage device.Type: ApplicationFiled: March 19, 2008Publication date: August 28, 2008Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
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Publication number: 20080186612Abstract: A composition of matter for a recording medium in atomic force data storage devices. The composition includes one or more poly(aryl ether ketone) copolymers, each of the one or more poly(aryl ether ketone) copolymers including (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a hydrogen bonding cross-linking moiety, the moiety capable of forming two or more hydrogen bonds at room temperature, each of the one or more poly(aryl ether ketone) copolymers having two terminal ends, each terminal end having a phenylethynyl moiety. The covalent and hydrogen bonding cross-linking of the poly(aryl ether ketone) oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles.Type: ApplicationFiled: March 31, 2008Publication date: August 7, 2008Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt
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Publication number: 20080175139Abstract: A composition of matter for a recording medium in atomic force data storage devices. The composition includes one or more poly(aryl ether ketone) copolymers, each of the one or more poly(aryl ether ketone) copolymers including (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a hydrogen bonding cross-linking moiety, the moiety capable of forming two or more hydrogen bonds at room temperature, each of the one or more poly(aryl ether ketone) copolymers having two terminal ends, each terminal end having a phenylethynyl moiety. The covalent and hydrogen bonding cross-linking of the poly(aryl ether ketone) oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles.Type: ApplicationFiled: January 24, 2007Publication date: July 24, 2008Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt
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Publication number: 20080175134Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone polymers, each of the one or more polyaryletherketone polymers having two terminal ends, each terminal end having two or more phenylethynyl moieties. The one or more polyaryletherketone polymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layers in atomic force data storage devices.Type: ApplicationFiled: March 27, 2008Publication date: July 24, 2008Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
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Publication number: 20080175135Abstract: A composition of matter for a recording medium in atomic force data storage devices. The composition includes polyimide oligomers having covalently bonded monomers forming a backbone, the oligomer thermally stable to at least 400° C.; one or more covalent bonding cross-linking moieties incorporated into the polyimide oligomer; and one or more hydrogen bonding cross-linking moieties incorporated into the polyimide oligomer. The covalent and hydrogen bonding cross-linking of the polyimide oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles.Type: ApplicationFiled: March 27, 2008Publication date: July 24, 2008Inventors: Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsman, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
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Publication number: 20080165663Abstract: An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyaryletherketone polymers are used as the recording layers in atomic force data storage devices, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyaryletherketone polymers may be tuned to match thermal and force parameters required in read-write-erase cycles.Type: ApplicationFiled: March 25, 2008Publication date: July 10, 2008Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
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Publication number: 20080161527Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone polymers, each of the one or more polyaryletherketone polymers having two terminal ends, each terminal end having two or more phenylethynyl moieties. The one or more polyaryletherketone polymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layers in atomic force data storage devices.Type: ApplicationFiled: January 2, 2007Publication date: July 3, 2008Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
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Publication number: 20080159114Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone copolymers, each of the one or more polyaryletherketone copolymers comprising (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a first phenylethynyl moiety, each of the one or more polyaryletherketone copolymers having two terminal ends, each terminal end having a phenylethynyl moiety the same as or different from the first phenylethynyl moiety. The one or more polyaryletherketone copolymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layer in an atomic force data storage device.Type: ApplicationFiled: January 2, 2007Publication date: July 3, 2008Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
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Publication number: 20080076903Abstract: A composition of matter for a recording medium in atomic force data storage devices. The composition includes polyimide oligomers having covalently bonded monomers forming a backbone, the oligomer thermally stable to at least 400° C.; one or more covalent bonding cross-linking moieties incorporated into the polyimide oligomer; and one or more hydrogen bonding cross-linking moieties incorporated into the polyimide oligomer. The covalent and hydrogen bonding cross-linking of the polyimide oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles.Type: ApplicationFiled: August 31, 2006Publication date: March 27, 2008Inventors: Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
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Publication number: 20070296101Abstract: An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyaryletherketone polymers are used as the recording layers in atomic force data storage devices, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyaryletherketone polymers may be tuned to match thermal and force parameters required in read-write-erase cycles.Type: ApplicationFiled: June 26, 2006Publication date: December 27, 2007Applicant: International Business Machines CorporationInventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade