Abstract: Compositions comprising are provided wherein RF is a fluorine containing moiety comprising (CF3)2CFCH2(CF3)CH—, (CF3)2CFCH2((CF3)2CF)CH—, (CF3)2CFCH2((CF3)2CH)CH—, (CF3)2CHCH2((CF3)2CF)CH—, ((CF3)2CFCH2)2CH—, (CF3)2CFCH2CF—, (CF3)2CF—, (CF3)2CH—, CF3—, or CnF2n+1—, n being an integer from 2 to 20; R1 is F or H; R2 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H; and R3 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H, such compositions can produced according to processes, and utilized to prevent combustion utilizing systems.

Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups, RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and or RF-foam stabilizers. The RF portion can include at least two groups —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2 groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the Rf-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover.

Abstract: Compositions comprising are provided wherein RF is a fluorine containing moiety comprising (CF3)2CFCH2(CF3)CH—, (CF3)2CFCH2((CF3)2CF)CH—, (CF3)2CFCH2((CF3)2CH)CH—, (CF3)2CHCH2((CF3)2CF)CH—, ((CF3)2CFCH2)2CH—, (CF3)2CFCH2CF—, (CF3)2CF—, (CF3)2CH—, CF3—, or CnF2n+1—, n being an integer from 2 to 20; R1 is F or H; R2 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H; and R3 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H, such compositions can produced according to processes, and utilized to prevent combustion utilizing systems.

Abstract: Compositions comprising are provided wherein RF is a fluorine containing moiety comprising (CF3)2CFCH2(CF3)CH—, (CF3)2CFCH2((CF3)2CF)CH—, (CF3)2CFCH2((CF3)2CH)CH—, (CF3)2CHCH2((CF3)2CF)CH—, ((CF3)2CFCH2)2CH—, (CF3)2CFCH2CF—, (CF3)2CF—, (CF3)2CH—, CF3—, or CnF2n+1—, n being an integer from 2 to 20; R1 is F or H; R2 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H; and R3 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H, such compositions can produced according to processes, and utilized to prevent combustion utilizing systems.

Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups, RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and or RF-foam stabilizers. The RF portion can include at least two groups —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2 groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover.

Abstract: RF-compositions including surfactants, foam stabilizers, monomers, polymers, urethanes, intermediates, metal complexes, phosphate esters as well as telomerization methods are provided.

Abstract: RF-compositions including surfactants, foam stabilizers, monomers, polymers, urethanes, intermediates, metal complexes, phosphate esters as well as telomerization methods are provided.

Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover.

Abstract: Compositions and methods for making compositions such as RF(R?)nQ are provided. The RF group can include at least two —CF3 groups, the R? group can be a group having at least two carbons, n can be at least 1, and the Q group can include one or more atoms of the periodic table of elements. RF-intermediates (RF(RT)nQg); Surfactants (RF(RT)nQs); Foam stabilizers (RF(RT)IIQFS); Metal complexes (RF(RT)IIQMC); Phosphate ester (RF(RT)HQPE); Polymers (RF(RT)IIQMU); Monomers (RF(RT)IIQM); Urethanes (RF(R?)nQu); and/or Glycols (RF(RT)IIQH) and methods for making the same are provided.

Abstract: Chemical production processes are provided that include reacting a metal comprising olefin to form a conjugated olefin; reacting a heterohalogenated olefin to form a conjugated olefin; reacting a halogenated alkane to form a conjugated olefin; and/or reacting a hydrohalogenated olefin to form a conjugated olefin. Chemical production systems are also provided that can include: a first reactant reservoir configured to house a perhalogenated olefin; a second reactant reservoir configured to house a catalyst mixture; a first reactor coupled to both the first and second reservoirs, the first reactor configured to house a metal-comprising mixture and receive both the perhalogenated olefin form the first reactant reservoir and the reactant mixture from the second reactant reservoir; and a product collection reservoir coupled to the first reactor and configured to house a conjugated olefin.

Abstract: RF-compositions including surfactants, foam stabilizers, monomers, polymers, urethanes, intermediates, metal complexes, phosphate esters as well as telomerization methods are provided.

Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover.

Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover.

Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RFmonomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover.

Abstract: Compositions comprising are provided wherein RF is a fluorine containing moiety comprising (CF3)2CFCH2(CF3)CH—, (CF3)2CFCH2((CF3)2CF)CH—, (CF3)2CFCH2((CF3)2CH)CH—, (CF3)2CHCH2((CF3)2CF)CH—, ((CF3)2CFCH2)2CH—, (CF3)2CFCH2CF—, (CF3)2CF—, (CF3)2CH—, CF3—, or CnF2n+1—, n being an integer from 2 to 20; R1 is F or H; R2 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H; and R3 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H, such compositions can produced according to processes, and utilized to prevent combustion utilizing systems.

Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF urethanes, and/or RF-foam stabilizers. The RF portion can include at least two —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit Compositions are provided that include a substrate having a RF-composition thereover.

Abstract: Reactors including a chamber having a mixing apparatus within the chamber are provided. Reactors are also provided that include a chamber with a separation apparatus and/or a catalyst apparatus within the chamber. Reactor assemblies are provided that can include: a base configured to define at least a portion of a reaction chamber volume, a separation apparatus within the reaction chamber volume, a catalyst apparatus within the reaction chamber volume, and a lid coupled to both the separation and catalyst apparatuses. Production processes are provided that can include combining at least two reactants within a chamber to form a gas-phase reaction mixture and mechanically mixing the mixture within the chamber to form a product.

Abstract: Systems and methods for producing fluorocarbons are provided that include contacting a saturated halogenated fluorocarbon with hydrogen and catalyst to produce a saturated hydrofluorocarbon and an unsaturated fluorocarbon. Aspects of the present invention describe systems and methods for contacting saturated halogenated fluorocarbons such as CF3CClFCF3 and/or CF3CCl2CF3 with hydrogen and catalyst. Systems and methods of the present invention also describe contacting saturated halogenated fluorocarbons with catalysts having one or more of K, Zr, Na, Ni, Cu, Ni, Zn, Fe, Mn, Co, Ti, and Pd. Aspects of the present invention also describe contacting saturated halogenated fluorocarbons with hydrogen under pressure. Saturated hydroflourocarbons and unsaturated fluorocarbons produced in accordance with the systems and methods of the present invention can include one or more of CF3CFHCF3, CF3CH2CF3, CF3CHClCF3, CF3CF?CF2, CF3CH?CF2, and CF3CCl?CF2.

Abstract: Systems and methods for producing fluorocarbons are provided that include contacting a saturated halogenated fluorocarbon with hydrogen and catalyst to produce a saturated hydrofluorocarbon and an unsaturated fluorocarbon. Aspects of the present invention describe systems and methods for contacting saturated halogenated fluorocarbons such as CF3CClFCF3 and/or CF3CCl2CF3 with hydrogen and catalyst. Systems and methods of the present invention also describe contacting saturated halogenated fluorocarbons with catalysts having one or more of K, Zr, Na, Ni, Cu, Ni, Zn, Fe, Mn, Co, Ti, and Pd. Aspects of the present invention also describe contacting saturated halogenated fluorocarbons with hydrogen under pressure. Saturated hydroflourocarbons and unsaturated fluorocarbons produced in accordance with the systems and methods of the present invention can include one or more of CF3CFHCF3, CF3CH2CF3, CF3CHClCF3, CF3CF?CF2, CF3CH?CF2, and CF3CCl?CF2.

Abstract: Highly fluorinated, saturated, and unsaturated fluoroethers are efficient, economical, non-ozone-depleting fire extinguishing agents used alone or in blends with other fire extinguishing agents in total flooding and portable systems. Methods for producing ethers, halogenated ether intermediates, and fluoroethers are disclosed. Novel fluoroether compositions are disclosed. Fluoroether extinguishing mixtures, methods, and systems are disclosed.