Patents by Inventor Janet Tesfai

Janet Tesfai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chemical mechanical polishing pad with window
    Patent number: 9446498
    Abstract: A chemical mechanical polishing pad is provided having a polishing layer; an endpoint detection window; subpad; and, a stack adhesive; wherein the subpad includes plurality of apertures in optical communication with the endpoint detection window; and, wherein the polishing surface of the polishing layer is adapted for polishing of a substrate.
    Type: Grant
    Filed: March 13, 2015
    Date of Patent: September 20, 2016
    Assignee: Rohm and Hass Electronic Materials CMP Holdings, Inc.
    Inventors: Joseph So, Bainian Qian, Janet Tesfai
  • CHEMICAL MECHANICAL PLISHING PAD WITH WINDOW
    Publication number: 20160263721
    Abstract: A chemical mechanical polishing pad is provided having a polishing layer; an endpoint detection window; subpad; and, a stack adhesive; wherein the subpad includes plurality of apertures in optical communication with the endpoint detection window; and, wherein the polishing surface of the polishing layer is adapted for polishing of a substrate.
    Type: Application
    Filed: March 13, 2015
    Publication date: September 15, 2016
    Inventors: Joseph So, Bainian Qian, Janet Tesfai