Patents by Inventor Jang-dong You

Jang-dong You has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pellicle film including graphite-containing thin film for extreme ultraviolet lithography
    Patent number: 10394117
    Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.
    Type: Grant
    Filed: May 11, 2018
    Date of Patent: August 27, 2019
    Assignees: Samsung Electronics Co., Ltd., Research & Business Foundation Sungkyunkwan University, Fine Semitech Co., Ltd.
    Inventors: Mun Ja Kim, Ji-beom Yoo, Seul-gi Kim, Sang-jin Cho, Myung-shik Chang, Jang-dong You
  • PELLICLE FILM INCLUDING GRAPHITE-CONTAINING THIN FILM FOR EXTREME ULTRAVIOLET LITHOGRAPHY
    Publication number: 20180259847
    Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.
    Type: Application
    Filed: May 11, 2018
    Publication date: September 13, 2018
    Applicants: Samsung Electronics Co., Ltd., Research & Business Foundation SUNGKYUNKWAN UNIVERSITY, Fine Semitech Co., Ltd.
    Inventors: Mun Ja KIM, Ji-beom YOO, Seul-gi KIM, Sang-jin CHO, Myung-shik CHANG, Jang-dong YOU
  • Pellicle film including graphite-containing thin film for extreme ultraviolet lithography
    Patent number: 10001700
    Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.
    Type: Grant
    Filed: June 3, 2014
    Date of Patent: June 19, 2018
    Assignees: Samsung Electronics Co., Ltd., Research & Business Foundation Sungkyunkwan University, Fine Semitech Co., Ltd.
    Inventors: Mun Ja Kim, Ji-beom Yoo, Seul-gi Kim, Sang-jin Cho, Myung-shik Chang, Jang-dong You
  • PELLICLE FILM INCLUDING GRAPHITE-CONTAINING THIN FILM FOR EXTREME ULTRAVIOLET LITHOGRAPHY
    Publication number: 20160282712
    Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes graphite-containing thin film.
    Type: Application
    Filed: June 3, 2014
    Publication date: September 29, 2016
    Applicants: Research & Business Foundation SUNGKYUNKWAN UNIVER SITY, Fine Semitech Co., Ltd.
    Inventors: Mun Ja KIM, Ji-beom YOO, Seul-gi KIM, Sang-jin CHO, Myung-shik CHANG, Jang-dong YOU
  • Method of fabricating a pellicle frame
    Patent number: 9436077
    Abstract: A pellicle frame, including aluminum, aluminum oxide, and a transition metal.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: September 6, 2016
    Assignees: SAMSUNG ELECTRONICS CO., LTD., FINE SEMITECH CORP.
    Inventors: Jeong jin Kim, Bum hyun An, Chan uk Jeon, Han shin Lee, Jae hyuck Choi, Seung wan Kim, Ik jun Kim, Jang dong You
  • Pellicle frame, pellicle, lithography apparatus, and method of fabricating the pellicle frame
    Patent number: 8404405
    Abstract: A pellicle frame, including aluminum, aluminum oxide, and a transition metal.
    Type: Grant
    Filed: September 10, 2010
    Date of Patent: March 26, 2013
    Assignees: Samsung Electronics Co., Ltd., Fine Semitech Corp.
    Inventors: Jung-jin Kim, Bum-hyun An, Chan-uk Jeon, Jang-dong You, Sung-wan Kim, Ik-jun Kim, Jae-hyuck Choi, Han-shin Lee
  • PELLICLE FRAME, PELLICLE, LITHOGRAPHY APPARATUS, AND METHOD OF FABRICATING THE PELLICLE FRAME
    Publication number: 20110063601
    Abstract: A pellicle frame, including aluminum, aluminum oxide, and a transition metal.
    Type: Application
    Filed: September 10, 2010
    Publication date: March 17, 2011
    Inventors: Jung-jin KIM, Bum-hyun An, Chan-uk Jeon, Jang-dong You, Sung-wan Kim, Ik-jun Kim, Jae-hyuck Choi, Han-shin Lee