Patents by Inventor Jang-Hyun Seok

Jang-Hyun Seok has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RARE EARTH PRECURSOR, METHOD OF PREPARING THE SAME, AND METHOD OF FORMING THIN FILM USING THE SAME
    Publication number: 20220145461
    Abstract: The present disclosure relates to a compound capable of implementing thin film deposition through vapor deposition, and more particularly, to a rare earth compound which is applicable to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and has excellent thermal stability and reactivity, a rare earth precursor containing the same, a method of preparing the same, and a method of forming a thin film using the same.
    Type: Application
    Filed: November 11, 2021
    Publication date: May 12, 2022
    Inventors: Mi-Ra PARK, Kyu-Hyun YEOM, Hyun-Kyung LEE, Jang-Hyun SEOK, Jung-Woo PARK
  • SILICON PRECURSOR AND METHOD OF FABRICATING SILICON-CONTAINING THIN FILM USING THE SAME
    Publication number: 20210348026
    Abstract: The present disclosure relates to a vapor deposition compound which may be deposited as a thin film by vapor deposition, and specifically, to a silicon precursor which is applicable to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and may be deposited at high rate, particularly by high-temperature ALD, and a method for fabricating a silicon-containing thin film using the same.
    Type: Application
    Filed: May 7, 2021
    Publication date: November 11, 2021
    Inventors: Jae-Seok An, Yeong-Eun Kim, Jang-Hyun Seok, Jung-Woo Park