Patents by Inventor Jang-hyun Yun

Jang-hyun Yun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Focus and level control method for projection lens unit by comparing intensities of measurement light and reference light
    Patent number: 8102509
    Abstract: A projection lens unit, related exposure apparatus and control method are disclosed in which measurement light irradiates a semiconductor substrate after passing through lenses in the projection lens unit and reference light irradiates the semiconductor substrate without passing through the lenses in the projection lens unit are used to derive a control signal adapted to adjust the position of the semiconductor substrate under the projection lens unit.
    Type: Grant
    Filed: April 8, 2009
    Date of Patent: January 24, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Jang-hyun Yun
  • Semiconductor wafer flatness correction apparatus and method
    Patent number: 7671969
    Abstract: There are provided a wafer stage, an exposure apparatus having the same, and a wafer flatness correction method using the same. The wafer stage includes a chuck having first and second vacuum holes, a first vacuum pump applying a vacuum suction force to the first vacuum holes and a second vacuum pump applying a vacuum suction force to the second vacuum holes. Further, the exposure apparatus and the wafer flatness correction method using the same are disclosed.
    Type: Grant
    Filed: February 16, 2007
    Date of Patent: March 2, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Jang-Hyun Yun
  • PROJECTION LENS UNIT WITH FOCUS AND LEVEL CONTROL, RELATED EXPOSURE APPARATUS AND METHOD
    Publication number: 20090195765
    Abstract: A projection lens unit, related exposure apparatus and control method are disclosed in which measurement light irradiates a semiconductor substrate after passing through lenses in the projection lens unit and reference light irradiates the semiconductor substrate without passing through the lenses in the projection lens unit are used to derive a control signal adapted to adjust the position of the semiconductor substrate under the projection lens unit.
    Type: Application
    Filed: April 8, 2009
    Publication date: August 6, 2009
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventor: Jang-hyun YUN
  • Projection lens unit with focus and level control, related exposure apparatus and method
    Patent number: 7535551
    Abstract: A projection lens unit, related exposure apparatus and control method are described in which measurement light irradiating a semiconductor substrate after passing through lenses in the projection lens unit and reference light irradiating the semiconductor substrate without passing through the lenses in the projection lens unit are used to derive a control signal adapted to adjust the position of the semiconductor substrate under the projection lens unit.
    Type: Grant
    Filed: September 1, 2005
    Date of Patent: May 19, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Jang-hyun Yun
  • Semiconductor wafer flatness correction apparatus and method
    Publication number: 20070195306
    Abstract: There are provided a wafer stage, an exposure apparatus having the same, and a wafer flatness correction method using the same. The wafer stage includes a chuck having first and second vacuum holes, a first vacuum pump applying a vacuum suction force to the first vacuum holes and a second vacuum pump applying a vacuum suction force to the second vacuum holes. Further, the exposure apparatus and the wafer flatness correction method using the same are disclosed.
    Type: Application
    Filed: February 16, 2007
    Publication date: August 23, 2007
    Inventor: Jang-Hyun Yun
  • Projection lens unit with focus and level control, related exposure apparatus and method
    Publication number: 20060044540
    Abstract: A projection lens unit, related exposure apparatus and control method are disclosed in which measurement light irradiates a semiconductor substrate after passing through lenses in the projection lens unit and reference light irradiates the semiconductor substrate without passing through the lenses in the projection lens unit are used to derive a control signal adapted to adjust the position of the semiconductor substrate under the projection lens unit.
    Type: Application
    Filed: September 1, 2005
    Publication date: March 2, 2006
    Inventor: Jang-hyun Yun