Patents by Inventor Jang Won KANG

Jang Won KANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240127470
    Abstract: In a method of predicting a position of an object at a future time point for a vehicle, video image information at a current time point and at a plurality of time points before the current time point acquired through a camera of the vehicle may be extracted as semantic segmentation image. A mask image imaging an attribute and position information of an object present in each of the video images may be extracted. A position distribution of the object may be predicted by deriving a plurality of hypotheses for a position of the object at a future time point through deep learning by receiving video images at the current time point and the time points before the current time point, a plurality of semantic segmentation images, a plurality of mask images, and ego-motion information of the vehicle, and calculating the plurality of hypotheses as a Gaussian mixture probability distribution.
    Type: Application
    Filed: March 23, 2023
    Publication date: April 18, 2024
    Applicants: HYUNDAI MOTOR COMPANY, KIA CORPORATION, Ewha University - Industry Collaboration Foundation
    Inventors: Hyung-Wook Park, Jang-Ho Shin, Seo-Young Jo, Je-Won Kang, Jung-Kyung Lee
  • Publication number: 20160268479
    Abstract: The present invention relates to a multi-layered transparent electrode having a metal nano hole pattern layer. The multi-layered transparent electrode may include a lower oxide layer, a metal nano hole pattern layer disposed on the lower oxide layer, and an upper oxide layer disposed on the metal nano hole pattern layer. By adjusting the pattern period and nano hole size of the metal nano hole pattern layer, transmittance of the multi-layered transparent electrode may be enhanced in a specific wavelength region through surface plasmon, which is a phenomena caused by the metal nanohole pattern layer. In addition, optimized sheet resistance may be implemented in a multi-layered transparent electrode having the metal nano hole pattern layer by adjusting the hole size. Thereby, electrical characteristics of a device employed the multi-layered transparent electrode may be enhanced.
    Type: Application
    Filed: December 29, 2015
    Publication date: September 15, 2016
    Inventors: Seong-Ju Park, Sun-hye Song, Sang-Hyun Hong, Hyo-Ju Lee, Jang-Won Kang, Chang-Hee Cho, Bo-Kyung Song
  • Patent number: 9018626
    Abstract: Disclosed herein are a ZnO film structure and a method of forming the same. Dislocation density of a ZnO film grown through epitaxial lateral overgrowth (ELOG) is minimized. In order to block a chemical reaction between the ZnO film and a mask layer at the time of performing the ELOG, a material of the mask layer is AlF3, NaF2, SrF, or MgF2. Therefore, the chemical reaction between ZnO and the mask layer is blocked and a transfer of dislocation from a substrate is also blocked.
    Type: Grant
    Filed: December 26, 2013
    Date of Patent: April 28, 2015
    Assignee: Gwangju Institute of Science and Technology
    Inventors: Seong-Ju Park, Yong Seok Choi, Jang-Won Kang, Byeong Hyeok Kim
  • Publication number: 20140361288
    Abstract: Disclosed herein are a ZnO film structure and a method of forming the same. Dislocation density of a ZnO film grown through epitaxial lateral overgrowth (ELOG) is minimized. In order to block a chemical reaction between the ZnO film and a mask layer at the time of performing the ELOG, a material of the mask layer is AlF3, NaF2, SrF, or MgF2. Therefore, the chemical reaction between ZnO and the mask layer is blocked and a transfer of dislocation from a substrate is also blocked.
    Type: Application
    Filed: December 26, 2013
    Publication date: December 11, 2014
    Applicant: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Seong-Ju PARK, Yong Seok CHOI, Jang-Won KANG, Byeong Hyeok KIM
  • Patent number: 8772150
    Abstract: Disclosed herein is a method of forming a p-type zinc oxide thin film. A zinc oxide layer and an antimony oxide layer are alternately stacked one above another on a substrate, forming a superlattice layer. The superlattice layer is modified into a p-type zinc oxide thin film by annealing. Upon annealing, zinc atoms of the zinc oxide layer are diffused into the antimony oxide layer and antimony atoms of the antimony oxide layer are diffused into the zinc oxide layer.
    Type: Grant
    Filed: December 12, 2012
    Date of Patent: July 8, 2014
    Assignee: Gwangju Institute of Science and Technology
    Inventors: Seong Ju Park, Yong Seok Choi, Jang Won Kang
  • Publication number: 20130256654
    Abstract: Disclosed herein is a method of forming a p-type zinc oxide thin film. A zinc oxide layer and an antimony oxide layer are alternately stacked one above another on a substrate, forming a superlattice layer. The superlattice layer is modified into a p-type zinc oxide thin film by annealing. Upon annealing, zinc atoms of the zinc oxide layer are diffused into the antimony oxide layer and antimony atoms of the antimony oxide layer are diffused into the zinc oxide layer.
    Type: Application
    Filed: December 12, 2012
    Publication date: October 3, 2013
    Applicant: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Seong Ju PARK, Yong Seok CHOI, Jang Won KANG