Patents by Inventor Janglin Chen

Janglin Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5576164
    Abstract: The present invention is a polyester film base which has a surface approximately 5 nm thick. The surface of the film base has been altered to include about 6 to 15 atomic percent nitrogen in the form of imines, secondary amines and primary amines in the ratio of about 1:1:2. The invention also includes a film base whose surface includes oxygen in the form of hydroxyl, ether, epoxy, carbonyl or carboxyl groups wherein the oxygen is about 4 to 10 atomic percent above the original surface content of the base. The polyester film base can be either polyethylene terephthalate or polyethylene naphthalate.
    Type: Grant
    Filed: May 15, 1995
    Date of Patent: November 19, 1996
    Assignee: Eastman Kodak Company
    Inventors: Jeremy M. Grace, Janglin Chen, Louis J. Gerenser, David A. Glocker
  • Patent number: 5563029
    Abstract: The present invention is a biaxially oriented polyester film support in which the surface has been subjected to an energetic treatment to produce amine groups on the polyester surface. The treated surface is then coated with a dilute amine reactive hardener solution. After drying the hardener solution a photographic emulsion is coated to the surface. The resulting film element has better adhesion of the photographic emulsion after photoprocessing than previous known methods.
    Type: Grant
    Filed: April 3, 1995
    Date of Patent: October 8, 1996
    Assignee: Eastman Kodak Company
    Inventors: Jeremy Grace, Louis J. Gerenser, Janglin Chen, Edgar E. Riecke
  • Patent number: 5538841
    Abstract: The present invention is a polyester film base which has a surface approximately 5 nm thick. The surface of the film base has been altered to include about 6 to 15 atomic percent nitrogen in the form of imines, secondary amines and primary amines in the ratio of about 1:1:2. The invention also includes a film base whose surface includes oxygen in the form of hydroxyl, ether, epoxy, carbonyl or carboxyl groups wherein the oxygen is about 4 to 10 atomic percent above the original surface content of the base. The polyester film base can be either polyethylene terephthalate or polyethylene naphthalate.
    Type: Grant
    Filed: March 1, 1995
    Date of Patent: July 23, 1996
    Assignee: Eastman Kodak Company
    Inventors: Jeremy M. Grace, Janglin Chen, Louis J. Gerenser, David A. Glocker
  • Patent number: 5514528
    Abstract: A photographic element comprising a polyester support and at least one light-sensitive layer on one side of the polyester support, an antistatic layer on the other side of the support, the antistatic layer including a conductive metal oxide in a hydrophilic binder, the antistatic layer being overcoated with a layer containing a cellulose ester binder, and a solvent cast subbing layer disposed between the antistatic layer and the polyester support.
    Type: Grant
    Filed: February 17, 1995
    Date of Patent: May 7, 1996
    Assignee: Eastman Kodak Company
    Inventors: Janglin Chen, John F. DeCory
  • Patent number: 5425980
    Abstract: The present invention is a polyester film base which has a surface approximately 5 nm thick. The surface of the film base has been altered to include about 6 to 15 atomic percent nitrogen in the form of imines, secondary amines and primary amines in the ratio of about 1:1:2. The invention also includes a film base whose surface includes oxygen in the form of hydroxyl, ether, epoxy, carbonyl or carboxyl groups wherein the oxygen is about 4 to 10 atomic percent above the original surface content of the base. The polyester film base can be either polyethylene terephthalate or polyethylene naphthalate.
    Type: Grant
    Filed: February 22, 1994
    Date of Patent: June 20, 1995
    Assignee: Eastman Kodak Company
    Inventors: Jeremy M. Grace, Janglin Chen, Louis J. Gerenser, David A. Glocker
  • Patent number: 5174923
    Abstract: The present invention provides an antistatic composition comprising a binder, a cyclic phosphazene, and a salt that complexes with the cyclic phosphazene. The cyclic phosphazene has the general formula ##STR1## wherein x is 3 or 4.
    Type: Grant
    Filed: August 27, 1990
    Date of Patent: December 29, 1992
    Assignee: Eastman Kodak Company
    Inventors: Janglin Chen, Wayne T. Ferrar, Hans R. Grashof, Akemi S. Marshall
  • Patent number: 4971897
    Abstract: The present invention provides an antistatic composition comprising a binder, a cyclic phosphazene, and a salt that complexes with the cyclic phosphazene. The cyclic phosphazene has the general formula ##STR1## wherein x is 3 or 4.
    Type: Grant
    Filed: February 3, 1989
    Date of Patent: November 20, 1990
    Assignee: Eastman Kodak Company
    Inventors: Janglin Chen, Wayne T. Ferrar, Hans R. Grashof, Akemi S. Marshall
  • Patent number: 4957947
    Abstract: A radiation-curable composition useful in forming an abrasion-resistant antistatic layer is comprised of a salt, such as an alkali metal fluoroborate, dissolved in a mixture of (1) a poly(alkylene glycol)diacrylate and (2) an acrylic monomer containing at least three acrylic ester groups. The composition can be coated in the form of a thin layer and cured by suitable means, such as an electron beam accelerator or a source of ultraviolet radiation, to form an antistatic layer of particular utility as a component of a photographic material.
    Type: Grant
    Filed: June 17, 1988
    Date of Patent: September 18, 1990
    Assignee: Eastman Kodak Company
    Inventors: Janglin Chen, Billy R. Dotson
  • Patent number: 4948720
    Abstract: The present invention provides a photographic element that includes an antistatic composition comprising a polyphosphazene comprising repeating units of the formula: ##STR1## and a salt that complexes with the polyphosphazene. In the above formula, x, y, R.sub.1, R.sub.4, R.sub.5, W, X, Y, and Z are as defined herein.
    Type: Grant
    Filed: January 6, 1989
    Date of Patent: August 14, 1990
    Assignee: Eastman Kodak Company
    Inventors: Janglin Chen, Wayne T. Ferrar, James E. Kelly, Akemi S. Marshall
  • Patent number: 4610955
    Abstract: Antistatic compositions are disclosed comprising a hydrophilic binder, surface-active polymer having polymerized oxyalkylene monomers and an inorganic salt characterized in that the salt is selected from the group consisting of inorganic tetrafluoroborates, perfluoroalkyl carboxylates, hexafluorophosphates and perfluoroalkyl sulfonates.
    Type: Grant
    Filed: December 24, 1985
    Date of Patent: September 9, 1986
    Assignee: Eastman Kodak Company
    Inventors: Janglin Chen, James E. Kelly, James Plakunov
  • Patent number: 4582781
    Abstract: Antistatic compositions are disclosed comprising a hydrophilic binder, surface-active polymer having polymerized oxyalkylene monomers and an inorganic salt characterized in that the salt is selected from the group consisting of inorganic tetrafluoroborates, perfluoroalkyl carboxylates, hexafluorophosphates and perfluoroalkyl sulfonates.
    Type: Grant
    Filed: August 1, 1984
    Date of Patent: April 15, 1986
    Assignee: Eastman Kodak Company
    Inventors: Janglin Chen, James E. Kelly, James Plakunov