Patents by Inventor Jannes C. Jagt

Jannes C. Jagt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of applying a layer in accordance with a pattern on a substrate, a negative resist material and a substrate coated with the resist
    Patent number: 4348472
    Abstract: A method of providing a negative electron and/or X-ray resist material on a substrate comprising applying a layer of resist material to the substrate, exposing the layer to a pattern of electrons and/or X-rays and removing the unexposed portions of the layer of resist material in which method the resist material comprises a polyvinylcarbazole compound which (a) contains a polymer and/or a copolymer of the formula ##STR1## in which n exceeds 30 which is halogenated in the nucleus or (b) contains a mixture of the copolymer optionally halogenated in the nucleus with a bisazide of the formulaN.sub.3 RN.sub.3in which R represents an organic residue.
    Type: Grant
    Filed: September 2, 1980
    Date of Patent: September 7, 1982
    Assignee: U.S. Philips Corporation
    Inventor: Jannes C. Jagt