Abstract: The present invention refers to a homogeneous nanostructured thin film manufacture method provided with self-cleaning properties against organic substances to be applied directly on transparent materials surfaces used on optical components, especially in glasses or, on thin films with anti-reflex function previously deposited on this materials. More specifically, said method comprises a combination of hydrolytic and non-hydrolytic reactions. The self-cleaning action is activated by means of oxidation catalytic activity promoted in presence of titan dioxide (TiO2) and exposition to electromagnetic radiation.