Abstract: Devices, systems, and method for high resolution photolithography can include a mounting stage for receiving a substrate in position to receive projected light for photolithography, a light processing system for projecting light onto the mounting stage for photolithography on the substrate, and a positioning system for adjusting relative positioning between the light processing system and the mounting stage. A control system for conducting operations for high resolution photolithography, can be configured to determine relative positioning between the light processing system and the mounting stage and for governing operation of the positioning system for adjusting relative positioning.

Abstract: Cantilever-Free Scanning Probe Lithography (CF-SPL) techniques are used to enable generation of 1-, 2-, 3-, and 4-D information containing patterns in a mask-free manner that, in turn, enables instantaneous change of pattern design.

Abstract: Disclosed embodiments provide an electrical contact alignment strategy for leveling an array of probes, pens, tips, etc., in relationship to a substrate, for example, wherein a plurality of independent electrical circuits are formed by configuring regions of the array and substrate regions to be partially conductive and connected to opposite electrodes or vice versa.