Abstract: The present application describes methods and systems for setting up and characterizing fluid dispensing systems. The methods and systems characterize the fluid dispensing systems and associate the characterizations with the corresponding fluid dispensing systems.

Abstract: Systems and methods for locating and eliminating and/or minimizing non-functional nozzles of dispense systems are described.

Abstract: A dispense controller and a tool controller may aid in providing a drop pattern of fluid on a substrate. The dispense controller may provide dispense coordinates to a fluid dispense system based on the drop pattern. The tool controller may control movement of a stage and also provide synchronization pulses to the fluid dispense system. The fluid dispense system may provide the drop pattern of fluid on the substrate using the dispense coordinates and the synchronization pulses.

Abstract: Generating a fluid drop pattern for an imprint lithography process includes selecting an imprinting surface and generating a fluid drop pattern including drop locations for placement of a multiplicity of drops of substantially equal volume on an imprint lithography substrate. The fluid drop pattern is generated through one or more modified Lloyd's method iterations. The fluid drop pattern allows substantially complete filling of imprinting surface features and formation of a substantially uniform residual layer during the imprint lithography process.