Patents by Inventor Jarmo Ilmari Maula

Jarmo Ilmari Maula has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7294360
    Abstract: A micro-optical element is produced through vapor deposition techniques, such as atomic layer deposition. An optical structure having a surface with uneven structures is exposed to one or more precursor vapors to create a self-limiting film growth on the surface of the optical structure. The film thickness may be increased and controlled by subsequent exposures. The resulting film conforms to surface structures having varying complex dimensions.
    Type: Grant
    Filed: March 31, 2003
    Date of Patent: November 13, 2007
    Assignee: Planar Systems, Inc.
    Inventors: Jarmo Ilmari Maula, Runar Olof Ivar Törnqvist
  • Patent number: 7191793
    Abstract: A shut-off type diaphragm valve adapted for use in an atomic layer deposition system includes a flexible diaphragm operable to flex between an open position whereby a valve passage is at least partially open and a closed position whereby a substantial portion of a first side of the diaphragm is pressed against a valve seat to thereby block the valve passage and facilitate heat transfer between the valve seat and the diaphragm. In some embodiments, a heating body thermally contacts the valve body and extends proximal to a second side of the diaphragm opposite the first side thereof to form a thermally conductive pathway that facilitates maintaining an operating temperature at the diaphragm. A thermally resistive member may be interposed between the valve passage and an actuator, such as a solenoid, for attenuating heat transfer between the valve passage and the actuator.
    Type: Grant
    Filed: April 3, 2006
    Date of Patent: March 20, 2007
    Assignee: Planar Systems, Inc.
    Inventors: Jarmo Ilmari Maula, Hannu Leskinen, Teemu Lang, Pekka Kuosmanen, Kari Härkönen, Bradley J. Aitchison
  • Patent number: 7021330
    Abstract: A shut-off type diaphragm valve adapted for use in an atomic layer deposition system includes a valve seat having an annular seating surface that surrounds an inlet of the valve and extends radially therefrom. The seating surface contacts a substantial portion of the first side of a flexible diaphragm when the diaphragm is closed, to facilitate heat transfer and counteract dissipative cooling of the diaphragm, thereby inhibiting condensation of a medium flowing through the valve passage. The seating surface is preferably flat and smooth, to prevent shearing of an elastomeric diaphragm. For a plastic diaphragm, a ring-shaped seating ridge may extend from the seating surface to cause localized permanent deformation of the diaphragm and enhanced sealing, while still allowing a substantial portion of the diaphragm to contact the seating surface for enhanced heat transfer. Valve speed enhancements and other reliability enhancing features are also described.
    Type: Grant
    Filed: June 26, 2003
    Date of Patent: April 4, 2006
    Assignee: Planar Systems, Inc.
    Inventors: Jarmo Ilmari Maula, Hannu Leskinen, Teemu Lang, Pekka Kuosmanen, Kari Härkönen, Bradley J. Aitchison
  • Patent number: 6941963
    Abstract: A diaphragm valve includes a pressure vent communicating with an enclosed space behind the diaphragm for reducing resistance to transitioning of the diaphragm between the open and closed positions. In some implementations, a pump or other source of suction is coupled to the pressure vent to reduce fluid pressure in the enclosed space. When used in an atomic layer deposition (ALD) system, the venting and suction improves the thin film deposition process and prevents leakage through the valve of potentially toxic ALD precursor vapors. Features for thermal management and reliability enhancement are also described.
    Type: Grant
    Filed: June 26, 2003
    Date of Patent: September 13, 2005
    Assignee: Planar Systems, Inc.
    Inventors: Jarmo Ilmari Maula, Hannu Leskinen, Teemu Lang, Pekka Kuosmanen, Kari Härkönen, Bradley J. Aitchison
  • Patent number: 6907897
    Abstract: A diaphragm valve includes a heating body that thermally contacts a valve body of the valve and extends proximal to a diaphragm of the valve opposite a valve passage through which medium flows. The heating body forms a thermally conductive pathway between the valve body and the diaphragm that facilitates maintaining an operating temperature at the diaphragm. When used in an atomic layer deposition (ALD) system, the diaphragm valve inhibits condensation or freezing of high-temperature ALD precursor gases in the valve passage. A plunger including thermally insulating features preferably extends through a central opening in the heating body to operably couple a valve actuator to the diaphragm. In some embodiments, a thermally resistive member may be interposed between the valve passage and the actuator for attenuating heat transfer between the valve passage and the actuator.
    Type: Grant
    Filed: June 26, 2003
    Date of Patent: June 21, 2005
    Assignee: Planar Systems, Inc.
    Inventors: Jarmo Ilmari Maula, Hannu Leskinen, Teemu Lang, Pekka Kuosmanen, Kari Härkönen, Bradley J. Aitchison
  • Publication number: 20040262562
    Abstract: A shut-off type diaphragm valve adapted for use in an atomic layer deposition system includes a valve seat having an annular seating surface that surrounds an inlet of the valve and extends radially therefrom. The seating surface contacts a substantial portion of the first side of a flexible diaphragm when the diaphragm is closed, to facilitate heat transfer and counteract dissipative cooling of the diaphragm, thereby inhibiting condensation of a medium flowing through the valve passage. The seating surface is preferably flat and smooth, to prevent shearing of an elastomeric diaphragm. For a plastic diaphragm, a ring-shaped seating ridge may extend from the seating surface to cause localized permanent deformation of the diaphragm and enhanced sealing, while still allowing a substantial portion of the diaphragm to contact the seating surface for enhanced heat transfer. Valve speed enhancements and other reliability enhancing features are also described.
    Type: Application
    Filed: June 26, 2003
    Publication date: December 30, 2004
    Inventors: Jarmo Ilmari Maula, Hannu Leskinen, Teemu Lang, Pekka Kuosmanen, Kari Harkonen, Bradley J. Aitchison
  • Publication number: 20040261850
    Abstract: A diaphragm valve includes a heating body that thermally contacts a valve body of the valve and extends proximal to a diaphragm of the valve opposite a valve passage through which medium flows. The heating body forms a thermally conductive pathway between the valve body and the diaphragm that facilitates maintaining an operating temperature at the diaphragm. When used in an atomic layer deposition (ALD) system, the diaphragm valve inhibits condensation or freezing of high-temperature ALD precursor gases in the valve passage. A plunger including thermally insulating features preferably extends through a central opening in the heating body to operably couple a valve actuator to the diaphragm. In some embodiments, a thermally resistive member may be interposed between the valve passage and the actuator for attenuating heat transfer between the valve passage and the actuator.
    Type: Application
    Filed: June 26, 2003
    Publication date: December 30, 2004
    Inventors: Jarmo Ilmari Maula, Hannu Leskinen, Teemu Lang, Pekka Kuosmanen, Kari Harkonen, Bradley J. Aitchison
  • Publication number: 20040197527
    Abstract: A micro-optical element is produced through vapor deposition techniques, such as atomic layer deposition. An optical structure having a surface with uneven structures is exposed one or more precursor vapors to create a self-limiting film growth on the surface of the optical structure. The film thickness may be increased and controlled by subsequent exposures. The resulting film conforms to surface structures having varying complex dimensions.
    Type: Application
    Filed: March 31, 2003
    Publication date: October 7, 2004
    Inventors: Jarmo Ilmari Maula, Runar Olof Ivar Tornqvist