Patents by Inventor Jaroslav Pjencak

Jaroslav Pjencak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210193847
    Abstract: A semiconductor device may include a Silicon on Insulator (SOI) substrate, and a diode formed on the SOI substrate, the diode including a cathode region and an anode region. The semiconductor device may include at least one breakdown voltage trench disposed at an edge of the cathode region, and between the cathode region and the anode region.
    Type: Application
    Filed: March 3, 2021
    Publication date: June 24, 2021
    Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
    Inventors: Jaroslav PJENCAK, Moshe AGAM, Johan Camiel Julia JANSSENS
  • Patent number: 10971632
    Abstract: A semiconductor device may include a Silicon on Insulator (SOI) substrate, and a diode formed on the SOI substrate, the diode including a cathode region and an anode region. The semiconductor device may include at least one breakdown voltage trench disposed at an edge of the cathode region, and between the cathode region and the anode region.
    Type: Grant
    Filed: June 24, 2019
    Date of Patent: April 6, 2021
    Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
    Inventors: Jaroslav Pjencak, Moshe Agam, Johan Camiel Julia Janssens
  • Publication number: 20200403103
    Abstract: A semiconductor device may include a Silicon on Insulator (SOI) substrate, and a diode formed on the SOI substrate, the diode including a cathode region and an anode region. The semiconductor device may include at least one breakdown voltage trench disposed at an edge of the cathode region, and between the cathode region and the anode region.
    Type: Application
    Filed: June 24, 2019
    Publication date: December 24, 2020
    Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
    Inventors: Jaroslav PJENCAK, Moshe AGAM, Johan Camiel Julia JANSSENS
  • Publication number: 20200295126
    Abstract: An electronic device can include a substrate defining a trench. In an embodiment, a semiconductor body can be within the trench, wherein the semiconductor body has a resistivity of at least 0.05 ohm-cm and is electrically isolated from the substrate. In an embodiment, an electronic component can be within the semiconductor body. The electronic component can be a resistor or a diode. In a particular embodiment, the semiconductor body has an upper surface, the electronic component is within and along an upper surface and spaced apart from a bottom of the semiconductor body. In a further embodiment, the electronic device can further include a first electronic component within an active region of the substrate, an isolation structure within the trench, and a second electronic component within the isolation structure.
    Type: Application
    Filed: July 18, 2019
    Publication date: September 17, 2020
    Applicant: Semiconductor Components Industries, LLC
    Inventors: Moshe Agam, Jaroslav Pjencák, Johan Camiel Julia Janssens
  • Publication number: 20200066838
    Abstract: Systems and methods of the disclosed embodiments include a semiconductor device structure having a semiconductor substrate. The semiconductor substrate has a first major surface, an opposing second major surface, a first doped region of a first conductivity type disposed beneath the first major surface, and a semiconductor region of the first conductivity type disposed between the first doped region and the second major surface. The semiconductor device may also include a trench isolation structure, comprising a conductive trench filling enclosed by an insulating trench liner. The trench isolation structure extends from the first major surface through the first doped region and into the semiconductor region. The semiconductor device may also include a semiconductor device disposed with a drain structure, and a connection structure formed between the conductive trench filling of the trench isolation structure and the drain region.
    Type: Application
    Filed: August 24, 2018
    Publication date: February 27, 2020
    Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
    Inventors: Johan Camiel Julia JANSSENS, Jaroslav PJENCAK, Moshe AGAM
  • Patent number: 10490549
    Abstract: A semiconductor device includes a floating buried doped region, a first doped region disposed between the floating buried doped region and a first major surface, and a semiconductor region disposed between the floating buried doped region and a second major surface. A trench isolation structure extends from the first major surface and terminates within the semiconductor region and the floating buried doped region abuts the trench isolation structure. A second doped region is disposed in the first doped region has an opposite conductivity type to the first doped region. A first isolation device is disposed in the first doped region and is configured to divert current injected into the semiconductor device from other regions thereby delaying the triggering of an internal SCR structure. In one embodiment, a second isolation structure is disposed within the first doped region and is configured to disrupt a leakage path along a sidewall surface of the trench isolation structure.
    Type: Grant
    Filed: January 10, 2019
    Date of Patent: November 26, 2019
    Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
    Inventors: Moshe Agam, Johan Camiel Julia Janssens, Jaroslav Pjencak, Thierry Yao, Mark Griswold, Weize Chen
  • Publication number: 20190148368
    Abstract: A semiconductor device includes a floating buried doped region, a first doped region disposed between the floating buried doped region and a first major surface, and a semiconductor region disposed between the floating buried doped region and a second major surface. A trench isolation structure extends from the first major surface and terminates within the semiconductor region and the floating buried doped region abuts the trench isolation structure. A second doped region is disposed in the first doped region has an opposite conductivity type to the first doped region. A first isolation device is disposed in the first doped region and is configured to divert current injected into the semiconductor device from other regions thereby delaying the triggering of an internal SCR structure. In one embodiment, a second isolation structure is disposed within the first doped region and is configured to disrupt a leakage path along a sidewall surface of the trench isolation structure.
    Type: Application
    Filed: January 10, 2019
    Publication date: May 16, 2019
    Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
    Inventors: Moshe AGAM, Johan Camiel Julia JANSSENS, Jaroslav PJENCAK, Thierry YAO, Mark GRISWOLD, Weize CHEN
  • Publication number: 20190088554
    Abstract: An electronic device can include a semiconductor layer having a primary surface, a drift region adjacent to the primary surface, a drain region adjacent to the drift region and extending deeper into the semiconductor layer as compared to the drift region, a resurf region spaced apart from the primary surface, an insulating layer overlying the drain region, and a contact extending through the insulating layer to the drain region. In an embodiment, the drain region can include a sinker region that allows a bulk breakdown to the resurf region to occur during an overvoltage event where the bulk breakdown occurs outside of the drift region, and in a particular embodiment, away from a shallow trench isolation structure or other sensitive structure.
    Type: Application
    Filed: November 5, 2018
    Publication date: March 21, 2019
    Applicant: Semiconductor Components Industries, LLC
    Inventors: Moshe AGAM, Ladislav Seliga, Thierry Coffi Herve Yao, Jaroslav Pjencák, Gary H. Loechelt
  • Patent number: 10224323
    Abstract: A semiconductor device includes a floating buried doped region, a first doped region disposed between the floating buried doped region and a first major surface, and a semiconductor region disposed between the floating buried doped region and a second major surface. A trench isolation structure extends from the first major surface and terminates within the semiconductor region and the floating buried doped region abuts the trench isolation structure. A second doped region is disposed in the first doped region has an opposite conductivity type to the first doped region. A first isolation device is disposed in the first doped region and is configured to divert current injected into the semiconductor device from other regions thereby delaying the triggering of an internal SCR structure. In one embodiment, a second isolation structure is disposed within the first doped region and is configured to disrupt a leakage path along a sidewall surface of the trench isolation structure.
    Type: Grant
    Filed: August 4, 2017
    Date of Patent: March 5, 2019
    Assignee: Semiconductor Components Industries, LLC
    Inventors: Moshe Agam, Johan Camiel Julia Janssens, Jaroslav Pjencak, Thierry Yao, Mark Griswold, Weize Chen
  • Publication number: 20190043856
    Abstract: A semiconductor device includes a floating buried doped region, a first doped region disposed between the floating buried doped region and a first major surface, and a semiconductor region disposed between the floating buried doped region and a second major surface. A trench isolation structure extends from the first major surface and terminates within the semiconductor region and the floating buried doped region abuts the trench isolation structure. A second doped region is disposed in the first doped region has an opposite conductivity type to the first doped region. A first isolation device is disposed in the first doped region and is configured to divert current injected into the semiconductor device from other regions thereby delaying the triggering of an internal SCR structure. In one embodiment, a second isolation structure is disposed within the first doped region and is configured to disrupt a leakage path along a sidewall surface of the trench isolation structure.
    Type: Application
    Filed: August 4, 2017
    Publication date: February 7, 2019
    Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
    Inventors: Moshe AGAM, Johan Camiel Julia JANSSENS, Jaroslav PJENCAK, Thierry YAO, Mark GRISWOLD, Weize CHEN
  • Publication number: 20170062610
    Abstract: An electronic device can include a semiconductor layer having a primary surface, a drift region adjacent to the primary surface, a drain region adjacent to the drift region and extending deeper into the semiconductor layer as compared to the drift region, a resurf region spaced apart from the primary surface, an insulating layer overlying the drain region, and a contact extending through the insulating layer to the drain region. In an embodiment, the drain region can include a sinker region that allows a bulk breakdown to the resurf region to occur during an overvoltage event where the bulk breakdown occurs outside of the drift region, and in a particular embodiment, away from a shallow trench isolation structure or other sensitive structure.
    Type: Application
    Filed: August 27, 2015
    Publication date: March 2, 2017
    Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
    Inventors: Moshe AGAM, Ladislav SELIGA, Thierry Coffi Herve YAO, Jaroslav PJENCÁK, Gary H. LOECHELT
  • Patent number: 9425266
    Abstract: In one embodiment, a floating diode structure includes a p-type semiconductor substrate. An n-type doped region is disposed between the semiconductor substrate and a p-type doped region of the first conductivity type adjacent the first doped region. An n-type cathode region is disposed within the p-type doped region and a p-type anode region is disposed within the cathode region. An anode electrode is connected to the anode region and a cathode electrode is connected to the cathode region. In one embodiment, the cathode electrode is further connected to the p-type doped region. The n-type doped region is configured as a floating region that facilitates the diode operating in both a forward and reverse bias mode and both below ground and above ground with respect to the p-type semiconductor substrate.
    Type: Grant
    Filed: October 13, 2014
    Date of Patent: August 23, 2016
    Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
    Inventors: Johan Camiel Julia Janssens, Jaroslav Pjencak
  • Publication number: 20160104781
    Abstract: In one embodiment, a floating diode structure includes a p-type semiconductor substrate. An n-type doped region is disposed between the semiconductor substrate and a p-type doped region of the first conductivity type adjacent the first doped region. An n-type cathode region is disposed within the p-type doped region and a p-type anode region is disposed within the cathode region. An anode electrode is connected to the anode region and a cathode electrode is connected to the cathode region. In one embodiment, the cathode electrode is further connected to the p-type doped region. The n-type doped region is configured as a floating region that facilitates the diode operating in both a forward and reverse bias mode and both below ground and above ground with respect to the p-type semiconductor substrate.
    Type: Application
    Filed: October 13, 2014
    Publication date: April 14, 2016
    Inventors: Johan Camiel Julia Janssens, Jaroslav Pjencak