Patents by Inventor Jaroslav Pjencak
Jaroslav Pjencak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11552193Abstract: An embodiment of a semiconductor device may include a transistor having a first doped region and a second doped region that extend laterally underlying the source, body, and drain of the transistor. The transistor may have an embodiment that includes an additional bias contact to apply a bias potential to the first doped region and or alternately the second doped region.Type: GrantFiled: December 31, 2020Date of Patent: January 10, 2023Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLCInventors: Weize Chen, Mark Griswold, Jaroslav Pjencak
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Publication number: 20220209008Abstract: An embodiment of a semiconductor device may include a transistor having a first doped region and a second doped region that extend laterally underlying the source, body, and drain of the transistor. The transistor may have an embodiment that includes an additional bias contact to apply a bias potential to the first doped region and or alternately the second doped region.Type: ApplicationFiled: December 31, 2020Publication date: June 30, 2022Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLCInventors: Weize CHEN, Mark GRISWOLD, Jaroslav PJENCAK
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Patent number: 11289570Abstract: Systems and methods of the disclosed embodiments include a semiconductor device having a semiconductor substrate. The semiconductor substrate has a first major surface, an opposing second major surface, a first doped region of a first conductivity type disposed beneath the first major surface, and a semiconductor region of the first conductivity type disposed between the first doped region and the second major surface. The semiconductor device may also include a trench isolation structure, comprising a conductive trench filling enclosed by an insulating trench liner. The trench isolation structure extends from the first major surface through the first doped region and into the semiconductor region. The semiconductor device may also include a semiconductor device structure disposed with a drain structure, and a connection structure formed between the conductive trench filling of the trench isolation structure and the drain region.Type: GrantFiled: August 24, 2018Date of Patent: March 29, 2022Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLCInventors: Johan Camiel Julia Janssens, Jaroslav Pjencak, Moshe Agam
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Patent number: 11251263Abstract: An electronic device can include a substrate defining a trench. In an embodiment, a semiconductor body can be within the trench, wherein the semiconductor body has a resistivity of at least 0.05 ohm-cm and is electrically isolated from the substrate. In an embodiment, an electronic component can be within the semiconductor body. The electronic component can be a resistor or a diode. In a particular embodiment, the semiconductor body has an upper surface, the electronic component is within and along an upper surface and spaced apart from a bottom of the semiconductor body. In a further embodiment, the electronic device can further include a first electronic component within an active region of the substrate, an isolation structure within the trench, and a second electronic component within the isolation structure.Type: GrantFiled: July 18, 2019Date of Patent: February 15, 2022Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLCInventors: Moshe Agam, Jaroslav Pjencák, Johan Camiel Julia Janssens
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Publication number: 20210193847Abstract: A semiconductor device may include a Silicon on Insulator (SOI) substrate, and a diode formed on the SOI substrate, the diode including a cathode region and an anode region. The semiconductor device may include at least one breakdown voltage trench disposed at an edge of the cathode region, and between the cathode region and the anode region.Type: ApplicationFiled: March 3, 2021Publication date: June 24, 2021Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLCInventors: Jaroslav PJENCAK, Moshe AGAM, Johan Camiel Julia JANSSENS
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Patent number: 10971632Abstract: A semiconductor device may include a Silicon on Insulator (SOI) substrate, and a diode formed on the SOI substrate, the diode including a cathode region and an anode region. The semiconductor device may include at least one breakdown voltage trench disposed at an edge of the cathode region, and between the cathode region and the anode region.Type: GrantFiled: June 24, 2019Date of Patent: April 6, 2021Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLCInventors: Jaroslav Pjencak, Moshe Agam, Johan Camiel Julia Janssens
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Publication number: 20200403103Abstract: A semiconductor device may include a Silicon on Insulator (SOI) substrate, and a diode formed on the SOI substrate, the diode including a cathode region and an anode region. The semiconductor device may include at least one breakdown voltage trench disposed at an edge of the cathode region, and between the cathode region and the anode region.Type: ApplicationFiled: June 24, 2019Publication date: December 24, 2020Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLCInventors: Jaroslav PJENCAK, Moshe AGAM, Johan Camiel Julia JANSSENS
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Publication number: 20200295126Abstract: An electronic device can include a substrate defining a trench. In an embodiment, a semiconductor body can be within the trench, wherein the semiconductor body has a resistivity of at least 0.05 ohm-cm and is electrically isolated from the substrate. In an embodiment, an electronic component can be within the semiconductor body. The electronic component can be a resistor or a diode. In a particular embodiment, the semiconductor body has an upper surface, the electronic component is within and along an upper surface and spaced apart from a bottom of the semiconductor body. In a further embodiment, the electronic device can further include a first electronic component within an active region of the substrate, an isolation structure within the trench, and a second electronic component within the isolation structure.Type: ApplicationFiled: July 18, 2019Publication date: September 17, 2020Applicant: Semiconductor Components Industries, LLCInventors: Moshe Agam, Jaroslav Pjencák, Johan Camiel Julia Janssens
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Publication number: 20200066838Abstract: Systems and methods of the disclosed embodiments include a semiconductor device structure having a semiconductor substrate. The semiconductor substrate has a first major surface, an opposing second major surface, a first doped region of a first conductivity type disposed beneath the first major surface, and a semiconductor region of the first conductivity type disposed between the first doped region and the second major surface. The semiconductor device may also include a trench isolation structure, comprising a conductive trench filling enclosed by an insulating trench liner. The trench isolation structure extends from the first major surface through the first doped region and into the semiconductor region. The semiconductor device may also include a semiconductor device disposed with a drain structure, and a connection structure formed between the conductive trench filling of the trench isolation structure and the drain region.Type: ApplicationFiled: August 24, 2018Publication date: February 27, 2020Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLCInventors: Johan Camiel Julia JANSSENS, Jaroslav PJENCAK, Moshe AGAM
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Patent number: 10490549Abstract: A semiconductor device includes a floating buried doped region, a first doped region disposed between the floating buried doped region and a first major surface, and a semiconductor region disposed between the floating buried doped region and a second major surface. A trench isolation structure extends from the first major surface and terminates within the semiconductor region and the floating buried doped region abuts the trench isolation structure. A second doped region is disposed in the first doped region has an opposite conductivity type to the first doped region. A first isolation device is disposed in the first doped region and is configured to divert current injected into the semiconductor device from other regions thereby delaying the triggering of an internal SCR structure. In one embodiment, a second isolation structure is disposed within the first doped region and is configured to disrupt a leakage path along a sidewall surface of the trench isolation structure.Type: GrantFiled: January 10, 2019Date of Patent: November 26, 2019Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLCInventors: Moshe Agam, Johan Camiel Julia Janssens, Jaroslav Pjencak, Thierry Yao, Mark Griswold, Weize Chen
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Publication number: 20190148368Abstract: A semiconductor device includes a floating buried doped region, a first doped region disposed between the floating buried doped region and a first major surface, and a semiconductor region disposed between the floating buried doped region and a second major surface. A trench isolation structure extends from the first major surface and terminates within the semiconductor region and the floating buried doped region abuts the trench isolation structure. A second doped region is disposed in the first doped region has an opposite conductivity type to the first doped region. A first isolation device is disposed in the first doped region and is configured to divert current injected into the semiconductor device from other regions thereby delaying the triggering of an internal SCR structure. In one embodiment, a second isolation structure is disposed within the first doped region and is configured to disrupt a leakage path along a sidewall surface of the trench isolation structure.Type: ApplicationFiled: January 10, 2019Publication date: May 16, 2019Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLCInventors: Moshe AGAM, Johan Camiel Julia JANSSENS, Jaroslav PJENCAK, Thierry YAO, Mark GRISWOLD, Weize CHEN
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Publication number: 20190088554Abstract: An electronic device can include a semiconductor layer having a primary surface, a drift region adjacent to the primary surface, a drain region adjacent to the drift region and extending deeper into the semiconductor layer as compared to the drift region, a resurf region spaced apart from the primary surface, an insulating layer overlying the drain region, and a contact extending through the insulating layer to the drain region. In an embodiment, the drain region can include a sinker region that allows a bulk breakdown to the resurf region to occur during an overvoltage event where the bulk breakdown occurs outside of the drift region, and in a particular embodiment, away from a shallow trench isolation structure or other sensitive structure.Type: ApplicationFiled: November 5, 2018Publication date: March 21, 2019Applicant: Semiconductor Components Industries, LLCInventors: Moshe AGAM, Ladislav Seliga, Thierry Coffi Herve Yao, Jaroslav Pjencák, Gary H. Loechelt
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Patent number: 10224323Abstract: A semiconductor device includes a floating buried doped region, a first doped region disposed between the floating buried doped region and a first major surface, and a semiconductor region disposed between the floating buried doped region and a second major surface. A trench isolation structure extends from the first major surface and terminates within the semiconductor region and the floating buried doped region abuts the trench isolation structure. A second doped region is disposed in the first doped region has an opposite conductivity type to the first doped region. A first isolation device is disposed in the first doped region and is configured to divert current injected into the semiconductor device from other regions thereby delaying the triggering of an internal SCR structure. In one embodiment, a second isolation structure is disposed within the first doped region and is configured to disrupt a leakage path along a sidewall surface of the trench isolation structure.Type: GrantFiled: August 4, 2017Date of Patent: March 5, 2019Assignee: Semiconductor Components Industries, LLCInventors: Moshe Agam, Johan Camiel Julia Janssens, Jaroslav Pjencak, Thierry Yao, Mark Griswold, Weize Chen
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Publication number: 20190043856Abstract: A semiconductor device includes a floating buried doped region, a first doped region disposed between the floating buried doped region and a first major surface, and a semiconductor region disposed between the floating buried doped region and a second major surface. A trench isolation structure extends from the first major surface and terminates within the semiconductor region and the floating buried doped region abuts the trench isolation structure. A second doped region is disposed in the first doped region has an opposite conductivity type to the first doped region. A first isolation device is disposed in the first doped region and is configured to divert current injected into the semiconductor device from other regions thereby delaying the triggering of an internal SCR structure. In one embodiment, a second isolation structure is disposed within the first doped region and is configured to disrupt a leakage path along a sidewall surface of the trench isolation structure.Type: ApplicationFiled: August 4, 2017Publication date: February 7, 2019Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLCInventors: Moshe AGAM, Johan Camiel Julia JANSSENS, Jaroslav PJENCAK, Thierry YAO, Mark GRISWOLD, Weize CHEN
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Publication number: 20170062610Abstract: An electronic device can include a semiconductor layer having a primary surface, a drift region adjacent to the primary surface, a drain region adjacent to the drift region and extending deeper into the semiconductor layer as compared to the drift region, a resurf region spaced apart from the primary surface, an insulating layer overlying the drain region, and a contact extending through the insulating layer to the drain region. In an embodiment, the drain region can include a sinker region that allows a bulk breakdown to the resurf region to occur during an overvoltage event where the bulk breakdown occurs outside of the drift region, and in a particular embodiment, away from a shallow trench isolation structure or other sensitive structure.Type: ApplicationFiled: August 27, 2015Publication date: March 2, 2017Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLCInventors: Moshe AGAM, Ladislav SELIGA, Thierry Coffi Herve YAO, Jaroslav PJENCÁK, Gary H. LOECHELT
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Patent number: 9425266Abstract: In one embodiment, a floating diode structure includes a p-type semiconductor substrate. An n-type doped region is disposed between the semiconductor substrate and a p-type doped region of the first conductivity type adjacent the first doped region. An n-type cathode region is disposed within the p-type doped region and a p-type anode region is disposed within the cathode region. An anode electrode is connected to the anode region and a cathode electrode is connected to the cathode region. In one embodiment, the cathode electrode is further connected to the p-type doped region. The n-type doped region is configured as a floating region that facilitates the diode operating in both a forward and reverse bias mode and both below ground and above ground with respect to the p-type semiconductor substrate.Type: GrantFiled: October 13, 2014Date of Patent: August 23, 2016Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLCInventors: Johan Camiel Julia Janssens, Jaroslav Pjencak
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Publication number: 20160104781Abstract: In one embodiment, a floating diode structure includes a p-type semiconductor substrate. An n-type doped region is disposed between the semiconductor substrate and a p-type doped region of the first conductivity type adjacent the first doped region. An n-type cathode region is disposed within the p-type doped region and a p-type anode region is disposed within the cathode region. An anode electrode is connected to the anode region and a cathode electrode is connected to the cathode region. In one embodiment, the cathode electrode is further connected to the p-type doped region. The n-type doped region is configured as a floating region that facilitates the diode operating in both a forward and reverse bias mode and both below ground and above ground with respect to the p-type semiconductor substrate.Type: ApplicationFiled: October 13, 2014Publication date: April 14, 2016Inventors: Johan Camiel Julia Janssens, Jaroslav Pjencak