Abstract: A method includes capturing a first image of the sample via a detector, wherein the particles of the primary particle beam have a first average energy so that the interaction products detected by the detector predominantly contain sample information from a sample layer lying below the sample surface. The method also includes removing the outermost sample layer with the aid of the cutting device, and capturing a second image of the sample via the detector, wherein the particles of the primary particle beam have a second average energy so that the interaction products detected by the detector predominantly contain sample information from the surface layer of the sample. The method further includes calculating the lateral shift/lateral offset of the sample from a comparison of the first and second images, and compensating for the lateral offset.

Abstract: A method for operating a particle beam device and/or for analyzing an object in a particle beam device are provided. For example, the particle beam device is an electron beam device, an ion beam device, or a combination device having an electron beam device and an ion beam device. In various embodiments, the method steps of a so-called stereoscopy method and a multi-detector method may be combined with one another in such a manner that simple and rapid analysis of the object is made possible.

Abstract: A method of processing of an object comprises scanning a particle beam across a surface of the object and detecting electrons emerging from the object due to the scanning; determining a height difference between the surface of the object and a predetermined surface for each of plural of locations on the surface of the object based on the detected electrons; determining a processing intensity for each of the plural locations on the surface of the object based on the determined height differences; and directing a particle beam to the plural locations based on the determined processing intensities, in order to remove material from or deposit material on the object at the plural locations.

Abstract: A method of operating a particle beam microscopy. A particle beam is scanned across a scanning region of a surface of the object. Particles are detected by a detector system for a plurality of impingement locations of the primary beam within the scanning region. A detector system generates detector signals which represent for each of the impingement locations an intensity of the detected particles. Material data of the interaction regions are calculated depending on the detector signals and depending on topography data, which represent a topography of the object surface in the scanning region.

Abstract: A method for operating a particle beam device and/or for analyzing an object in a particle beam device are provided. For example, the particle beam device is an electron beam device, an ion beam device, or a combination device having an electron beam device and an ion beam device. In various embodiments, the method steps of a so-called stereoscopy method and a multi-detector method may be combined with one another in such a manner that simple and rapid analysis of the object is made possible.

Abstract: A method includes capturing a first image of the sample via a detector, wherein the particles of the primary particle beam have a first average energy so that the interaction products detected by the detector predominantly contain sample information from a sample layer lying below the sample surface. The method also includes removing the outermost sample layer with the aid of the cutting device, and capturing a second image of the sample via the detector, wherein the particles of the primary particle beam have a second average energy so that the interaction products detected by the detector predominantly contain sample information from the surface layer of the sample. The method further includes calculating the lateral shift/lateral offset of the sample from a comparison of the first and second images, and compensating for the lateral offset.

Abstract: A method of operating a particle beam microscopy. A particle beam is scanned across a scanning region of a surface of the object. Particles are detected by a detector system for a plurality of impingement locations of the primary beam within the scanning region. A detector system generates detector signals which represent for each of the impingement locations an intensity of the detected particles. Material data of the interaction regions are calculated depending on the detector signals and depending on topography data, which represent a topography of the object surface in the scanning region.

Abstract: A method for operating a particle beam microscope comprising detecting light rays or particles which emanate from a structure, wherein the structure comprises at least one of: at least a portion of a surface of an object and at least a portion of a surface of an object holder of the particle beam microscope; generating a surface model of the structure depending on the at least one of the detected light rays and the particles; determining a position and an orientation of the surface model of the structure relative to the object region; determining a measurement location relative to the surface model of the structure; and positioning the object depending on the generated surface model of the structure, depending on the determined position and orientation of the surface model of the structure, and depending on the determined measurement location.

Abstract: A method of inspecting an object using a scanning particle beam microscope, the method comprising: operating the microscope in a high-resolution mode by laterally scanning a particle beam of the high-resolution mode; operating the microscope in a 3D-mode for acquiring a three-dimensional representation of the object by laterally scanning a particle beam of the 3D-mode; wherein the particle beam of the high-resolution mode and the particle beam of the 3D-mode have a same beam energy and a same focus distance; and wherein an aperture angle of the particle beam of the 3D-mode is at least 2 times greater, or at least 5 times greater, or at least 10 times greater, or at least 100 times greater than an aperture angle of the particle beam of the high-resolution mode.

Abstract: A method of processing of an object comprises scanning a particle beam across a surface of the object and detecting electrons emerging from the object due to the scanning; determining a height difference between the surface of the object and a predetermined surface for each of plural of locations on the surface of the object based on the detected electrons; determining a processing intensity for each of the plural locations on the surface of the object based on the determined height differences; and directing a particle beam to the plural locations based on the determined processing intensities, in order to remove material from or deposit material on the object at the plural locations.

Abstract: A method for operating a particle beam microscope comprising detecting light rays or particles which emanate from a structure, wherein the structure comprises at least one of: at least a portion of a surface of an object and at least a portion of a surface of an object holder of the particle beam microscope; generating a surface model of the structure depending on the at least one of the detected light rays and the particles; determining a position and an orientation of the surface model of the structure relative to the object region; determining a measurement location relative to the surface model of the structure; and positioning the object depending on the generated surface model of the structure, depending on the determined position and orientation of the surface model of the structure, and depending on the determined measurement location.