Patents by Inventor Jason Clevenger

Jason Clevenger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9744353
    Abstract: A system is provided for testing whether an iontophoretic drug delivery device is in an appropriate state for administering a therapeutic agent into an animal body. An electrical characteristic of at least one electrical path associated with an electrode test point is used to determine whether the iontophoretic device is in an appropriate state. The measured electrical characteristic indicates that the iontophoretic device is in an appropriate state for administering the therapeutic agent into the animal body when the therapeutic agent is properly disposed with respect to the electrodes of the iontophoretic device.
    Type: Grant
    Filed: November 14, 2012
    Date of Patent: August 29, 2017
    Assignee: Teva Pharmaceuticals International GmbH
    Inventors: Ronalee Lo Mann, Jason Clevenger, David Saar
  • Publication number: 20140135679
    Abstract: A system is provided for testing whether an iontophoretic drug delivery device is in an appropriate state for administering a therapeutic agent into an animal body. An electrical characteristic of at least one electrical path associated with an electrode test point is used to determine whether the iontophoretic device is in an appropriate state. The measured electrical characteristic indicates that the iontophoretic device is in an appropriate state for administering the therapeutic agent into the animal body when the therapeutic agent is properly disposed with respect to the electrodes of the iontophoretic device.
    Type: Application
    Filed: November 14, 2012
    Publication date: May 15, 2014
    Applicant: NUPATHE, INC.
    Inventors: Ronalee Lo Mann, Jason Clevenger, David Saar
  • Publication number: 20060102597
    Abstract: Electron beam welding of a thin layer to a substrate is accomplished using controlled volumetric heating of the respective substrate layers, thus minimizing gradients due to heat conduction. Electron beam penetration of the layers and velocity across the surface creates a rapidly translating weld pool within the substrates. The control parameters for the electron beam source are dependent on the heat characteristics of the substrate materials, their thickness, available electron beam power and speed, and desired finished weld geometry. The Peclet number maintained during the process is greater than about 1 and less than about 10.
    Type: Application
    Filed: November 16, 2004
    Publication date: May 18, 2006
    Inventors: Stuart Brown, Jason Clevenger, Patricio Mendez