Patents by Inventor Jason D. Suhr

Jason D. Suhr has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Rapid hydrosilylation cure composition
    Patent number: 11492449
    Abstract: A composition contains a blend of linear and resinous alkenyl functionalized polyorganosiloxanes, a blend of linear and resinous silyl hydride functionalized polyorganosiloxanes, and a hydrosilylation catalyst where the linear silyl hydride functionalized polyorganosiloxanes has a ratio of D/DH that is greater than 2.0 and less than 14, the molar and the ratio of silyl hydride hydrogens to the sum of terminal alkenyl functionality on the alkenyl functionalized polyorganosiloxane is 1.2-2.2.
    Type: Grant
    Filed: December 2, 2020
    Date of Patent: November 8, 2022
    Assignees: Dow Silicones Corporation, Dow Global Technologies LLC
    Inventors: Michelle Cummings, Joel P. McDonald, Jason D. Suhr, Bradley W. Tuft, Brian Clark, Rachel Rademacher
  • RAPID HYDROSILYLATION CURE COMPOSITION
    Publication number: 20220348723
    Abstract: A composition contains a blend of linear and resinous alkenyl functionalized polyorganosiloxanes, a blend of linear and resinous silyl hydride functionalized polyorganosiloxanes, and a hydrosilylation catalyst where the linear silyl hydride functionalized polyorganosiloxanes has a ratio of D/DH that is greater than 2.0 and less than 14, the molar and the ratio of silyl hydride hydrogens to the sum of terminal alkenyl functionality on the alkenyl functionalized polyorganosiloxane is 1.2-2.2.
    Type: Application
    Filed: December 2, 2020
    Publication date: November 3, 2022
    Inventors: Michelle Cummings, Joel P. McDonald, Jason D. Suhr, Bradley W. Tuft, Brian Clark, Rachel Rademacher
  • Method and materials for double patterning
    Patent number: 8728335
    Abstract: A silsesquioxane resin is applied over the patterned photo-resist and cured at the pattern surface to produce a cured silsesquioxane resin on the pattern surface. The uncured silsesquioxane resin layer is then removed leaving the cured silsesquioxane resin on the pattern surface. The cured silsesquioxane resin on horizontal surfaces is removed to expose the underlying photo-resist. This photo-resist is removed leaving a pattern of cured silsesquioxane. Optionally, the new pattern can be transferred into the underlying layer(s).
    Type: Grant
    Filed: June 22, 2010
    Date of Patent: May 20, 2014
    Assignee: Dow Corning Corporation
    Inventors: Peng-Fei Fu, Eric Scott Moyer, Jason D. Suhr
  • Method And Materials For Double Patterning
    Publication number: 20120118856
    Abstract: A silsesquioxane resin is applied over the patterned photo-resist and cured at the pattern surface to produce a cured silsesquioxane resin on the pattern surface. The uncured silsesquioxane resin layer is then removed leaving the cured silsesquioxane resin on the pattern surface. The cured silsesquioxane resin on horizontal surfaces is removed to expose the underlying photo-resist. This photo-resist is removed leaving a pattern of cured silsesquioxane. Optionally, the new pattern can be transferred into the underlying layer(s).
    Type: Application
    Filed: June 22, 2010
    Publication date: May 17, 2012
    Inventors: Peng-Fei Fu, Eric Scott Moyer, Jason D. Suhr