Patents by Inventor Jason E. Meiring
Jason E. Meiring has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9317922Abstract: A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.Type: GrantFiled: January 31, 2011Date of Patent: April 19, 2016Assignee: Board of Regents The University of Texas SystemInventors: Jason E. Meiring, Timothy B. Michaelson, C. Grant Willson
-
Patent number: 9223911Abstract: Optical simulation can be performed employing a calibrated printing model, in which a unique phase transmission value is assigned to each type of sub-resolution assist features (SRAFs). The printing model can be calibrated employing a mask including multiple test patterns. Each test pattern is defined by a combination of a main feature, at least one SRAF applied to the main feature, and the geometrical relationship between the main feature and the at least one SRAF. Generation of the phase transmission values for each SRAF can be performed by fitting a printing model employing phase shift values and/or transmission values for SRAFs with measured printed feature dimensions as a function of defocus and/or with measured SRAF printing behavior on a printed photoresist layer. A properly calibrated printing model can predict the printed feature dimensions, shift in the best focus, and presence or absence of printed SRAFs.Type: GrantFiled: January 30, 2014Date of Patent: December 29, 2015Assignee: GLOBALFOUNDRIES INC.Inventors: Jason E. Meiring, Mohamed Talbi, Ramya Viswanathan
-
Publication number: 20150213161Abstract: Optical simulation can be performed employing a calibrated printing model, in which a unique phase transmission value is assigned to each type of sub-resolution assist features (SRAFs). The printing model can be calibrated employing a mask including multiple test patterns. Each test pattern is defined by a combination of a main feature, at least one SRAF applied to the main feature, and the geometrical relationship between the main feature and the at least one SRAF. Generation of the phase transmission values for each SRAF can be performed by fitting a printing model employing phase shift values and/or transmission values for SRAFs with measured printed feature dimensions as a function of defocus and/or with measured SRAF printing behavior on a printed photoresist layer. A properly calibrated printing model can predict the printed feature dimensions, shift in the best focus, and presence or absence of printed SRAFs.Type: ApplicationFiled: January 30, 2014Publication date: July 30, 2015Applicant: International Business Machines CorporationInventors: Jason E. Meiring, Mohamed Talbi, Ramya Viswanathan
-
Publication number: 20120194671Abstract: A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.Type: ApplicationFiled: January 31, 2011Publication date: August 2, 2012Inventors: Jason E. Meiring, Timothy B. Michaelson, C. Grant Willson
-
Patent number: 8099684Abstract: Embodiments of the present invention provide a method of placing printing assist features in a mask layout. The method includes providing a design layout having one or more designed features; generating a set of parameters, the set of parameters being associated with one or more printing assist features (PrAFs); adding the one or more PrAFs of the set of parameters to the design layout to produce a modified design layout; performing simulation of the one or more PrAFs and the one or more designed features on the modified design layout; verifying whether the one or more PrAFs are removable based on results of the simulation; and creating a set of PrAF placement rules based on the set of parameters, if the one or more PrAFs are verified as removable. The set of PrAF placement rules may be used in creating a final set of PrAF features to be used for creating the mask layout.Type: GrantFiled: January 8, 2009Date of Patent: January 17, 2012Assignees: International Business Machines Corporation, Infineon Technologies North America CorporationInventors: Jason E Meiring, Henning Haffner
-
Patent number: 8039203Abstract: Integrated circuits and methods of manufacture and design thereof are disclosed. For example, a method of manufacturing includes depositing a gate material over a semiconductor substrate, and depositing a first resist layer over the gate material. A first mask is used to pattern the first resist layer to form first and second resist features. The first resist features include pattern for gate lines of the semiconductor device and the second resist features include printing assist features. A second mask is used to form a resist template; the second mask removes the second resist features.Type: GrantFiled: May 23, 2008Date of Patent: October 18, 2011Assignees: Infineon Technologies AG, International Business Machines CorporationInventors: Helen Wang, Scott D. Halle, Henning Haffner, Haoren Zhuang, Klaus Herold, Matthew E. Colburn, Allen H. Gabor, Zachary Baum, Scott M. Mansfield, Jason E. Meiring
-
Patent number: 8017174Abstract: A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.Type: GrantFiled: October 31, 2007Date of Patent: September 13, 2011Assignee: Board of Regents The University of Texas SystemInventors: Jason E. Meiring, Timothy B. Michaelson, C. Grant Willson
-
Patent number: 7901945Abstract: A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.Type: GrantFiled: July 16, 2008Date of Patent: March 8, 2011Assignee: Board of Regents the University of Texas SystemInventors: Jason E. Meiring, Timothy B. Michaelson, C. Grant Willson
-
Patent number: 7895547Abstract: Embodiments of the present invention provide a method for performing lumped-process model calibration. The method includes creating a plurality of sub-process models for a set of sub-processes; creating a lumped-process-model incorporating said set of sub-processes; calculating a first set of output patterns from a set of test patterns by using said plurality of sub-process models; calculating a second set of output patterns from said set of test patterns by using said lumped-process-model; and adjusting process parameters used in said lumped-process-model to calculate said second set of output patterns to match said first set of output patterns. A computer system for performing the lumped-process model calibration is also provided.Type: GrantFiled: May 1, 2008Date of Patent: February 22, 2011Assignee: International Business Machines CorporationInventors: Scott M Mansfield, Geng Han, Jason E Meiring, Dario Gil
-
Publication number: 20100175040Abstract: Embodiments of the present invention provide a method of placing printing assist features in a mask layout. The method includes providing a design layout having one or more designed features; generating a set of parameters, the set of parameters being associated with one or more printing assist features (PrAFs); adding the one or more PrAFs of the set of parameters to the design layout to produce a modified design layout; performing simulation of the one or more PrAFs and the one or more designed features on the modified design layout; verifying whether the one or more PrAFs are removable based on results of the simulation; and creating a set of PrAF placement rules based on the set of parameters, if the one or more PrAFs are verified as removable. The set of PrAF placement rules may be used in creating a final set of PrAF features to be used for creating the mask layout.Type: ApplicationFiled: January 8, 2009Publication date: July 8, 2010Applicants: International Business Machines Corporation, Infineon Technologies North America Corp.Inventors: Jason E. Meiring, Henning Haffner
-
Publication number: 20100092089Abstract: A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.Type: ApplicationFiled: December 15, 2009Publication date: April 15, 2010Inventors: Jason E. Meiring, Timothy B. Michaelson, C. Grant Wilson
-
Patent number: 7651850Abstract: A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.Type: GrantFiled: May 17, 2004Date of Patent: January 26, 2010Assignee: Board of Regents, The University of Texas SystemInventors: Jason E. Meiring, Timothy B. Michaelson, C. Grant Willson
-
Publication number: 20090276736Abstract: Embodiments of the present invention provide a method for performing lumped-process model calibration. The method includes creating a plurality of sub-process models for a set of sub-processes; creating a lumped-process-model incorporating said set of sub-processes; calculating a first set of output patterns from a set of test patterns by using said plurality of sub-process models; calculating a second set of output patterns from said set of test patterns by using said lumped-process-model; and adjusting process parameters used in said lumped-process-model to calculate said second set of output patterns to match said first set of output patterns. A computer system for performing the lumped-process model calibration is also provided.Type: ApplicationFiled: May 1, 2008Publication date: November 5, 2009Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Scott M. Mansfield, Geng Han, Jason E. Meiring, Dario Gil
-
Publication number: 20090081563Abstract: Integrated circuits and methods of manufacture and design thereof are disclosed. For example, a method of manufacturing includes depositing a gate material over a semiconductor substrate, and depositing a first resist layer over the gate material. A first mask is used to pattern the first resist layer to form first and second resist features. The first resist features include pattern for gate lines of the semiconductor device and the second resist features include printing assist features. A second mask is used to form a resist template; the second mask removes the second resist features.Type: ApplicationFiled: May 23, 2008Publication date: March 26, 2009Inventors: Helen Wang, Scott D. Halle, Henning Haffner, Haoren Zhuang, Klaus Herold, Matthew E. Colburn, Allen H. Gabor, Zachary Baum, Scott M. Mansfield, Jason E. Meiring
-
Publication number: 20090017271Abstract: A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.Type: ApplicationFiled: October 31, 2007Publication date: January 15, 2009Inventors: Jason E. Meiring, Timothy B. Michaelson, C. Grant Willson
-
Publication number: 20080273748Abstract: A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.Type: ApplicationFiled: July 16, 2008Publication date: November 6, 2008Inventors: Jason E. Meiring, Timothy B. Michaelson, C. Grant Willson